| Patent application number | Description | Published |
|---|
| 20100055624 | METHOD OF PATTERNING A SUBSTRATE USING DUAL TONE DEVELOPMENT - A method for patterning a substrate is described. In particular, the invention relates to a method for double patterning a substrate using dual tone development. Further, the invention relates to optimizing a dual tone development process. | 03-04-2010 |
| 20100055625 | METHOD OF PROCESS OPTIMIZATION FOR DUAL TONE DEVELOPMENT - A method for patterning a substrate is described. In particular, the invention relates to a method for double patterning a substrate using dual tone development. Further, the invention relates to optimizing a dual tone development process. | 03-04-2010 |
| 20100068654 | METHOD FOR CREATING GRAY-SCALE FEATURES FOR DUAL TONE DEVELOPMENT PROCESSES - A method of patterning a substrate using a dual-tone development process is described. The patterning method comprises forming a layer of radiation-sensitive material on a substrate, wherein the layer of radiation-sensitive material comprises a dual tone resist. Thereafter, the patterning method comprises performing one or more exposures of the layer of radiation-sensitive material to one or more patterns of radiation, wherein at least one of the one or more exposures comprises using a mask having a dual-tone mask pattern region configured for printing dual tone features and a half-tone mask pattern region configured for printing half-tone features. Furthermore, the half-tone mask pattern region is optimized for use with the dual tone resist. | 03-18-2010 |
| 20100075238 | Variable Resist Protecting Groups - A method and system for patterning a substrate using a dual-tone development process is described. The method and system comprise using a resist material having a polymer backbone with a plurality of protecting groups attached thereto to improve process latitude and critical dimension uniformity for the dual-tone development process. | 03-25-2010 |
| 20100119960 | Dual Tone Development Processes - A method and system for patterning a substrate using a dual-tone development process is described. The method and system comprise using a resist material having a polymer backbone with a plurality of protecting groups attached thereto to improve process latitude and critical dimension uniformity for the dual-tone development process. | 05-13-2010 |
| 20100273099 | Flood exposure process for dual tone development in lithographic applications - A method and system for patterning a substrate using a dual tone development process is described. The method and system comprise a flood exposure of the substrate to improve process latitude for the dual tone development process. | 10-28-2010 |
| 20100273107 | Dual tone development with a photo-activated acid enhancement component in lithographic applications - A method and system for patterning a substrate using a lithographic process, such as a dual tone development process, is described. The method comprises use of at least one photo-activated acid enhancement component to improve process latitude for the dual tone development process. | 10-28-2010 |
| 20100273111 | Dual tone development with plural photo-acid generators in lithographic applications - A method and system for patterning a substrate using a dual tone development process is described. The method comprises use of plural photo-acid generators with or without a flood exposure of the substrate to improve process latitude for the dual tone development process. | 10-28-2010 |
