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Caizhong Tian
Caizhong Tian, Hyogo JP
| Patent application number | Description | Published |
|---|---|---|
| 20090183677 | TEMPERATURE CONTROL DEVICE AND PROCESSING APPARATUS USING THE SAME - Provided are a temperature control device capable of performing a temperature control of, e.g., a chamber wall of a processing apparatus with a high precision; and a processing apparatus using the same. The temperature control device | 07-23-2009 |
| 20100032094 | CEILING PLATE AND PLASMA PROCESS APPARATUS - A ceiling plate provided at a ceiling portion of a process chamber that may be evacuated to a vacuum is disclosed. The ceiling plate allows microwaves emitted from a slot of a planar antenna member provided along with the ceiling plate to pass through the ceiling plate into the process chamber, and includes plural protrusion portions provided in a radial pattern on a surface of the ceiling plate, the surface facing toward an inside of the process chamber. | 02-11-2010 |
| 20100307685 | MICROWAVE PLASMA PROCESSING APPARATUS - In a microwave plasma processing apparatus, when a surface of a planar antenna | 12-09-2010 |
| 20110000780 | TOP PLATE OF MICROWAVE PLASMA PROCESSING APPARATUS, PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD - A plasma generation chamber of a plasma processing apparatus is closed by a top plate | 01-06-2011 |
Caizhong Tian, Amagasaki-Shi JP
| Patent application number | Description | Published |
|---|---|---|
| 20100252412 | PLASMA PROCESSING APPARATUS AND METHOD FOR ADJUSTING PLASMA DENSITY DISTRIBUTION - In the plasma processing apparatus | 10-07-2010 |
Caizhong Tian, Amagasaki JP
| Patent application number | Description | Published |
|---|---|---|
| 20090266487 | MICROWAVE INTRODUCTION DEVICE - A microwave introduction device includes a microwave generator for generating a microwave of a predetermined frequency, a mode converter for converting the microwave into a predetermined oscillation mode, a planar antenna member arranged toward a predetermined space, and a coaxial waveguide connecting the mode converter with the planar antenna member to propagate the microwave. A central conductor of the coaxial waveguide is formed in a cylindrical shape, an inner diameter D | 10-29-2009 |
Caizhong Tian, Tokyo JP
| Patent application number | Description | Published |
|---|---|---|
| 20090050052 | PLASMA PROCESSING APPARATUS - Provided is a plasma processing apparatus capable of preventing an unnecessary adhesion film from being deposited in a processing chamber using plasma. The plasma processing apparatus | 02-26-2009 |
| 20090242130 | PLASMA PROCESSING APPARATUS - The present invention relates to a plasma processing apparatus including: a processing chamber whose ceiling portion is opened and the inside thereof can be evacuated to vacuum; a ceiling plate which is made of dielectric material and is airtightly mounted to an opening of the ceiling portion; a planar antenna member which is installed on a top surface of the ceiling plate, for introducing a microwave into the processing chamber; and a coaxial waveguide, which has a central conductor connected to the planar antenna member, for supplying the microwave, wherein a gas passage is formed to pass through the central conductor, the planar antenna member, and the ceiling plate, and an electric field attenuating recess for attenuating an electric field intensity of the center portion of the ceiling plate is installed on a top surface of a center area of the ceiling plate. | 10-01-2009 |
Caizhong Tian, Amagasaki City JP
| Patent application number | Description | Published |
|---|---|---|
| 20080254220 | Plasma processing apparatus - A plasma processing apparatus includes a vacuum processing container, and a placing table for placing an object which is arranged in the container and is to be processed. The processing container includes a tubular container body having an upper opening, and a dielectric top plate attached hermetically to the upper opening of the body and transmitting an electromagnetic wave. The plasma processing apparatus further includes an electromagnetic wave supplying system for supplying an electromagnetic wave for generating plasma into the container through the top plate, and a gas supplying system for supplying a gas containing a processing gas into the container. A gas ejecting hole for ejecting the gas supplied from the gas supplying system into the container is formed on the top plate. A discharge prevention member having a permeability is arranged in each ejection hole. | 10-16-2008 |
Caizhong Tian, Hyogo-Ken JP
| Patent application number | Description | Published |
|---|---|---|
| 20110114021 | PLANAR ANTENNA MEMBER AND PLASMA PROCESSING APPARATUS INCLUDING THE SAME - The present invention is a planar antenna member configured to introduce electromagnetic waves generated by an electromagnetic-wave generating source into a processing vessel of a plasma processing apparatus, the planar antenna member comprising: a base member of a circular plate shape, made of a conductive material; and a plurality of through-holes formed in the base member of a circular plate shape, the through-holes being configured to radiate the electromagnetic waves; wherein: the through-holes include a plurality of first through-holes which are arranged on a circumference of a circle whose center corresponds to a center of the planar antenna member, and a plurality of second through-holes which are arranged concentrically with the circle outside the first through-holes; a ratio L | 05-19-2011 |