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Byung-Woo

Byung Woo Kang, Seoul KR

Patent application numberDescriptionPublished
20100045140Piezoelectric ultrasonic motor - A piezoelectric ultrasonic motor includes a piezoelectric stator including a hollow metal tube having a quadrangular cross section and four piezoelectric elements each installed in each outer face of the metal tube; a rotary shaft including a rotation bar inserted into an inner space of the metal tube, an upper rotation member provided around the rotation bar in contact with an upper surface of the piezoelectric stator, the rotation member rotating in response to the strain of the piezoelectric stator, a lower rotation member adapted to restrain the rotation of the rotation bar and contacting a lower surface of the piezoelectric stator and a power transmission member provided at one portion of the rotation bar to transmit the rotation of the rotation member to an object to be transported; and a power supply to apply a supply voltage necessary for the actuation of the piezoelectric stator.02-25-2010
20110194199TWO-AXIS STAGE AND CAMERA MODULE HAVING THE SAME - A camera module in accordance with an embodiment of the present invention includes a housing, a first shaft, which is disposed in a first axis direction and coupled to the housing in such a way that the other end part can be tilted against one end part, a moving guide, which is mounted on the first shaft in such a way that the moving guide can slide in the first axis direction, a second shaft, which is disposed in a second axis direction and supported by the housing in such a way that the second shaft can be tilted against the housing, a lens module, which is mounted on the second shaft in such a way that the lens module can slide in the second axis direction, and a driver, which moves the lens module in the first axis direction and the second axis direction.08-11-2011

Patent applications by Byung Woo Kang, Seoul KR

Byung Woo Kim, Cheonan-Si KR

Patent application numberDescriptionPublished
20090312514RETARDATION FILM HAVING UNIFORM IN-PLANE PHASE-DIFFERENCE VALUE AND LAMINATED OPTICAL FILM HAVING POSITIVE DISPERSIBILITY IN WAVELENGTH - The present invention relates to a retardation film having a zero wavelength dispersibility and a uniform retardation, and an optical laminated film having a positive wavelength dispersibility. Here, in the retardation film, a homo polypropylene resin has an isotactic index more than 85 percents and having, and a value subtracting an average in-plain retardation value of the retardation film from the in-plain retardation value at the retardation film is in a range of ±5 nm. In the optical laminated film, another retardation film having a negative wavelength dispersibility is laminated on the above retardation film having a zero wavelength dispersibility.12-17-2009

Byung Woo Park, Seoul KR

Patent application numberDescriptionPublished
20080205595Method of Measuring Thickness of Thin Film Using Microwave - The present invention relates to a thickness measurement method for thin films using microwaves. In the method, the Q-factors of a dielectric resonator are measured. The effective surface resistance (R08-28-2008

Byung-Woo Jeon, Daejeon KR

Patent application numberDescriptionPublished
20120039682ONE-TOUCH CHAMFERING-AMOUNT ADJUSTMENT DEVICE FOR A CHAMFERING MACHINE - The present invention relates to a one-touch chamfering-amount adjustment device for a chamfering machine which specifically carries out a chamfering process on the welding bead surfaces of objects to be processed (such as metal sheet materials and pipes). In the present invention, the moment after a chamfering-amount-adjustment piece has been manipulated so as to rotate, a position-setting pin is inserted into a securing recess in the chamfering-amount-adjustment piece and as this happens the chamfering amount is precisely adjusted in units and at the same time locking to the predetermined chamfering amount is automatically maintained, yet nevertheless the adjustment of the chamfering amount is achieved in a straightforward fashion with one touch, and, when the chamfering-amount-adjustment piece is manipulated, a cutter shaft moves vertically and as it does so the chamfering amount is adjusted in such a way that the chamfering amount can be immediately and rapidly adjusted even during working regardless of any cutter rotating action.02-16-2012

Byung-Woo Kim, Seoul KR

Patent application numberDescriptionPublished
20100294646PHOTOCATALYST, PREPARATION METHOD THEREOF, PHOTO REACTOR, AND PHOTOLYSIS PROCESS - The present invention relates to a photocatalyst comprising a core part containing titanium dioxide, and a doped part formed on surfaces of said core part, containing a ruthenium-based dye and a platinum compound, a preparation method thereof, a photoreactor and a photolysis process. In accordance with the present invention, a photocatalyst having excellent light resistance and photosensitivity capable of removing volatile organic compounds even in poor ultraviolet light conditions, and a preparation method thereof is provided, and a photoreactor comprising said photocatalyst and an efficient photolysis process using the same are also provided.11-25-2010

Byung-Woo Lee, Suwon-Si KR

Patent application numberDescriptionPublished
20100213593STACKED SEMICONDUCTOR PACKAGE - A stacked semiconductor package includes an upper unit package and a lower unit package. The lower unit package includes a substrate, a semiconductor chip disposed on an upper surface of the substrate, terminal pads arranged on an upper surface of the semiconductor chip, protrusions formed on the terminal pads, a protective layer formed on the substrate and covering the semiconductor chip and the protrusions, and openings formed in the protective layer and exposing the protrusions. The upper unit package includes a substrate, ball lands provided on a lower surface of the substrate, and solder balls formed on the ball lands. The solder balls of the upper unit package are inserted into the openings of the lower unit package to be connected to the protrusions of the lower unit package.08-26-2010

Byung-Woo Yoon, Seoul KR

Patent application numberDescriptionPublished
20100218729Movement Analysis Device for Rodents - A movement analysis device for rodents capable of variably adjusting a space where a rodent is placed in order to stimulate the behavior of the rodent so that motor functions of the rodent can be analyzed more effectively, The movement analysis device for rodents includes a body including a pair of side plates distanced from each other with a predetermined gap and a connector plate connecting one ends of the side plates together, the connector plate having a slit extending from one to the other one of the side plates; and an adjustment unit including an adjustment plate configured insertable between the side plates of the body and into the slit of the connector plate of the body and a support plate extending to a height reaching from a bottom to the slit to support the adjustment plate at one portion thereof. The support plate is semi-cylindrically shaped to form a cylindrical space together with the connector plate.09-02-2010