Patent application number | Description | Published |
20120064326 | POLYURETHANE RESIN COMPOSITION FOR MOUNTING PAD AND POLYURETHANE MOUNTING PAD USING THE SAME - This disclosure relates to a polyurethane resin composition for a mounting pad, including a polyurethane resin, C9-15 alkyl benzene sulfonic acid or a salt thereof, and a DMF solvent, and a polyurethane mounting pad using the same, whereby long and large pores may be uniformly formed thereinside to provide a mounting pad having low hardness, excellent compressibility, and a high compression modulus. | 03-15-2012 |
20120071068 | POLISHING PAD FOR CHEMICAL MECHANICAL POLISHING APPARATUS - This disclosure relates to a polishing pad for chemical mechanical polishing, having a shape where 3 or more semi-oval or semicircular curves that connect 2 valleys neighboring on the plane are connected, and including 2 or more modified patterns that are formed to a determined thickness on the polishing pad, wherein a peak of one modified pattern and a valley of another modified pattern neighboring thereto are sequentially located on the same line. The polishing pad may uniformly disperse slurry over the whole area during a polishing process to provide improved polishing uniformity, and appropriately control residence time of the slurry to increase polishing rate. | 03-22-2012 |
20120085038 | METHOD FOR MANUFACTURING POROUS SHEET AND POROUS SHEET MANUFACTURED BY THE METHOD - The present invention provides a method for producing a porous sheet, including the steps of a) producing a polymer resin sheet containing an object to be processed by supercritical fluid extraction which is dissolved in supercritical fluid; and b) injecting the supercritical fluid into the polymer resin sheet to extract the object to be processed by supercritical fluid extraction that is contained in the polymer resin sheet, thereby forming pores in the polymer resin sheet, and a porous sheet produced by the same. | 04-12-2012 |
20130018118 | POLY-URETHANE RESIN AND POLY-URETHANE ABSORBING PAD USING THE SAMEAANM CHOI; Sang-SoonAACI DaejeonAACO KRAAGP CHOI; Sang-Soon Daejeon KRAANM TAE; Young-JiAACI Gwacheon-siAACO KRAAGP TAE; Young-Ji Gwacheon-si KRAANM SHIN; Dong-MokAACI DaejeonAACO KRAAGP SHIN; Dong-Mok Daejeon KRAANM YOON; Keong-YeonAACI SeoulAACO KRAAGP YOON; Keong-Yeon Seoul KRAANM KIM; Na-RiAACI SeoulAACO KRAAGP KIM; Na-Ri Seoul KRAANM AHN; Byeong-InAACI DaejeonAACO KRAAGP AHN; Byeong-In Daejeon KR - The present invention relates to a polyurethane resin composition including a first polyurethane resin and a second polyurethane resin that are different from each other in their compositions, an organic solvent, and a surfactant, and a polyurethane mounting pad manufactured from the resin composition. | 01-17-2013 |
20140206784 | POLYURETHANE RESIN COMPOSITION FOR SUPPORT PAD AND POLYURETHANE SUPPORT PAD USING THE SAME - The present invention relates to a polyurethane resin composition for a support pad including a polyurethane resin, a DMF solvent, an anionic surfactant, and polyethylene glycol (PEG), and a polyurethane support pad including the polyurethane resin composition for a support pad. According to the present invention, long and large pores may be uniformly formed therein, and thus a support pad having an excellent compression rate and compression recovery rate may be provided. | 07-24-2014 |