Inventors list |
Assignees list |
Classification tree browser |
Top 100 Inventors |
Top 100 Assignees |
Buff
James Buff, Brookline, NH US
| Patent application number | Description | Published |
|---|---|---|
| 20100200768 | TECHNIQUES FOR IMPROVING EXTRACTED ION BEAM QUALITY USING HIGH-TRANSPARENCY ELECTRODES - Techniques for improving extracted ion beam quality using high-transparency electrodes are disclosed. In one particular exemplary embodiment, the techniques may be realized as an apparatus for ion implantation. The apparatus may comprise an ion source for generating an ion beam, wherein the ion source comprises a faceplate with an aperture for the ion beam to travel therethrough. The apparatus may also comprise a set of extraction electrodes comprising at least a suppression electrode and a high-transparency ground electrode, wherein the set of extraction electrodes may extract the ion beam from the ion source via the faceplate, and wherein the high-transparency ground electrode may be configured to optimize gas conductance between the suppression electrode and the high-transparency ground electrode for improved extracted ion beam quality. | 08-12-2010 |
James S. Buff, Brookline, NH US
| Patent application number | Description | Published |
|---|---|---|
| 20100116983 | MASS ANALYSIS MAGNET FOR A RIBBON BEAM - A ribbon beam mass analyzer having a first and second solenoid coils and steel yoke arrangement. Each of the solenoid coils have a substantially “racetrack” configuration defining a space through which an ion ribbon beam travels. The solenoid coils are spaced apart along the direction of travel of the ribbon beam. Each of the solenoid coils generates a uniform magnetic field to accommodate mass resolution of wide ribbon beams to produce a desired image of ions generated from an ion source. | 05-13-2010 |
| 20110114849 | SYSTEM AND METHOD FOR MANIPULATING AN ION BEAM - A system for manipulating an ion beam having a principal axis includes an upper member having a first and a second coil generally disposed in different regions of the upper member and configured to conduct, independently of each other, a first and a second current, respectively. A lower member includes a third and a fourth coil that are generally disposed opposite to respective first and second coils and are configured to conduct, independently of each other, a third and a fourth current, respectively. A lens gap is defined between the upper and lower members, and configured to transmit the ion beam, wherein the first through fourth currents produce a 45 degree quadrupole field that exerts a rotational force on the ion beam about its principal axis. | 05-19-2011 |
James Steve Buff, Brookline, NH US
| Patent application number | Description | Published |
|---|---|---|
| 20080317968 | TILTED PLASMA DOPING - A plasma doping apparatus includes a chamber and a plasma source that generates ions in the chamber from a dopant gas. A grating is positioned in the chamber. A platen for supporting a target is positioned in the chamber. At least one of the grating and the target are oriented so that dopant ions extracted from the grating impact the target at a non-normal angle of incidence. | 12-25-2008 |
Roman Buff, St. Gallen CH
| Patent application number | Description | Published |
|---|---|---|
| 20100330838 | MULTIPLE COAXIAL CABLE PLUG CONNECTION AND METHOD FOR INSTALLING SUCH A MULTIPLE COAXIAL CABLE PLUG CONNECTION - A multiple coaxial cable plug connection ( | 12-30-2010 |