Patent application number | Description | Published |
20080245737 | METHOD AND SYSTEM FOR PROVIDING ULTRAPURE WATER - A method and system of providing ultrapure water for semiconductor fabrication operations is provided. The ultrapure water is treated by utilizing a free radical scavenging system and a particulate removal system. The free radical scavenging system can utilize actinic radiation with a free radical precursor compound, such as ammonium persulfate. The particulate removal system can comprise one or more ultrafiltration apparatus. The ultrapure water may be further treated by utilizing ion exchange media and degasification apparatus. A control system can be utilized in feedforward or feedback mode to regulate addition of the precursor compound and the actinic radiation source, and to maintain a temperature of the ultrapure water product. | 10-09-2008 |
20080245738 | METHOD AND SYSTEM FOR PROVIDING ULTRAPURE WATER - A method and system of providing ultrapure water for semiconductor fabrication operations is provided. The ultrapure water is treated by utilizing a free radical scavenging system and a particulate removal system. The free radical scavenging system can utilize actinic radiation with a free radical precursor compound, such as ammonium persulfate. The particulate removal system can comprise one or more ultrafiltration apparatus. The ultrapure water may be further treated by utilizing ion exchange media and degasification apparatus. A control system can be utilized in feedforward or feedback mode to regulate addition of the precursor compound and the actinic radiation source, and to maintain a temperature of the ultrapure water product. | 10-09-2008 |
20110024365 | BAFFLE PLATES FOR AN ULTRAVIOLET REACTOR - An ultraviolet reactor for treating a fluid. The reactor includes a vessel having an inlet for receiving fluid and an outlet for discharging fluid. The reactor further includes an ultraviolet light source and baffle plates. The baffle plates include holes arranged in a predetermined pattern for providing plug flow in areas in the reactor near the ultraviolet light source. | 02-03-2011 |
20110209530 | METHOD FOR MEASURING A CONCENTRATION OF A COMPOUND IN A LIQUID STREAM - A method and system of providing ultrapure water for semiconductor fabrication operations is provided. The water is treated by utilizing a free radical scavenging system and a free radical removal system. The free radical scavenging system can utilize actinic radiation with a free radical precursor compound, such as ammonium persulfate. The free radical removal system can comprise use of a reducing agent. The ultrapure water may be further treated by utilizing ion exchange media and degasification apparatus. A control system can be utilized to regulate addition of the precursor compound, the intensity of the actinic radiation, and addition of the reducing agent to the water. | 09-01-2011 |
20110210048 | SYSTEM FOR CONTROLLING INTRODUCTION OF A REDUCING AGENT TO A LIQUID STREAM - A method and system of providing ultrapure water for semiconductor fabrication operations is provided. The water is treated by utilizing a free radical scavenging system and a free radical removal system. The free radical scavenging system can utilize actinic radiation with a free radical precursor compound, such as ammonium persulfate. The free radical removal system can comprise use of a reducing agent. The ultrapure water may be further treated by utilizing ion exchange media and degasification apparatus. A control system can be utilized to regulate addition of the precursor compound, the intensity of the actinic radiation, and addition of the reducing agent to the water. | 09-01-2011 |
20110210077 | METHOD AND SYSTEM FOR PROVIDING ULTRAPURE WATER - A method and system of providing ultrapure water for semiconductor fabrication operations is provided. The water is treated by utilizing a free radical scavenging system and a free radical removal system. The free radical scavenging system can utilize actinic radiation with a free radical precursor compound, such as ammonium persulfate. The free radical removal system can comprise use of a reducing agent. The ultrapure water may be further treated by utilizing ion exchange media and degasification apparatus. A control system can be utilized to regulate addition of the precursor compound, the to intensity of the actinic radiation, and addition of the reducing agent to the water. | 09-01-2011 |
20110210266 | METHOD OF IRRADIATING A LIQUID - A method and system of providing ultrapure water for semiconductor fabrication operations is provided. The water is treated by utilizing a free radical scavenging system and a free radical removal system. The free radical scavenging system can utilize actinic radiation with a free radical precursor compound, such as ammonium persulfate. The free radical removal system can comprise use of a reducing agent. The ultrapure water may be further treated by utilizing ion exchange media and degasification apparatus. A to control system can be utilized to regulate addition of the precursor compound, the intensity of the actinic radiation, and addition of the reducing agent to the water. | 09-01-2011 |
20110210267 | ACTINIC RADIATION REACTOR - A method and system of providing ultrapure water for semiconductor fabrication operations is provided. The water is treated by utilizing a free radical scavenging system and a free radical removal system. The free radical scavenging system can utilize actinic radiation with a free radical precursor compound, such as ammonium persulfate. The free radical removal system can comprise use of a reducing agent. The ultrapure water may be further treated by utilizing ion exchange media and degasification apparatus. A control system can be utilized to regulate addition of the precursor compound, the intensity of the actinic radiation, and addition of the reducing agent to the water. | 09-01-2011 |
20130186835 | METHOD AND SYSTEM FOR PROVIDING ULTRAPURE WATER - A method and system of providing ultrapure water for semiconductor fabrication operations is provided. The water is treated by utilizing a free radical scavenging system and a free radical removal system. The free radical scavenging system can utilize actinic radiation with a free radical precursor compound, such as ammonium persulfate. The free radical removal system can comprise use of a reducing agent. The ultrapure water may be further treated by utilizing ion exchange media and degasification apparatus. A control system can be utilized to regulate addition of the precursor compound, the intensity of the actinic radiation, and addition of the reducing agent to the water. | 07-25-2013 |
20140291253 | SYSTEM AND METHOD FOR MEASURING AND TREATING A LIQUID STREAM - A method and system of treating a liquid stream is provided. The water is treated by utilizing a free radical scavenging system and a free radical removal system. The free radical scavenging system can utilize actinic radiation with a free radical precursor compound, such as ammonium persulfate. The free radical removal system can comprise use of a reducing agent. The water may be further treated by utilizing ion exchange media and degasification apparatus. A control system may be utilized to measure and regulate addition of the precursor compound, the intensity of the actinic radiation, and addition of the reducing agent to the water. | 10-02-2014 |