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Brown, Los Gatos
Daniel S. Brown, Los Gatos, CA US
| Patent application number | Description | Published |
|---|---|---|
| 20090148339 | APPARATUS AND METHODS FOR REDUCING RESTRICTIONS TO AIR FLOW IN AN ABATEMENT SYSTEM - An abatement system is provided, including an abatement unit adapted to abate effluent using ambient air; and an ambient air delivery system in fluid communication with the abatement unit and adapted to deliver ambient air to the abatement unit; wherein the ambient air delivery system allows sufficient ambient air to flow into the abatement unit to abate the effluent without compressed air. Numerous other aspects are provided. | 06-11-2009 |
Daniel Stephan Brown, Los Gatos, CA US
| Patent application number | Description | Published |
|---|---|---|
| 20100192773 | ABATEMENT APPARATUS WITH SCRUBBER CONDUIT - Embodiments of an abatement apparatus are disclosed herein. In some embodiments, an abatement apparatus may include a scrubber configured to receive an effluent stream from a process chamber and further configured to remove first particles from the effluent stream; a scrubber conduit coupled to the scrubber to receive the effluent stream therefrom and configured to remove second particles from the effluent stream, the scrubber conduit having one or more inlets configured to provide a fluid to sufficiently wet an interior surface of the scrubber conduit to trap the second particles thereon and to wash the second particles therealong; and a central scrubber coupled to the scrubber via the scrubber conduit. In some embodiments, the scrubber conduit is downward sloping from the scrubber to the central scrubber. In some embodiments, a plurality of scrubbers may be coupled to the central scrubber via a plurality of scrubber conduits. | 08-05-2010 |
Dan S. Brown, Los Gatos, CA US
| Patent application number | Description | Published |
|---|---|---|
| 20100119420 | ABATEMENT SYSTEM HAVING ENHANCED EFFLUENT SCRUB AND MOISTURE CONTROL - Apparatus for improved treatment of effluents are provided herein. In some embodiments, an abatement system may include an exhaust conduit to flow an effluent stream therethrough; a plurality of packed beds disposed in the exhaust conduit to remove non-exhaustible effluents from the effluent stream; one or more spray jets to provide an effluent treating agent between adjacent packed beds, the effluent treating agent to remove non-exhaustible effluents from the effluent stream; and a dripper disposed in the exhaust conduit above an uppermost packed bed to provide the effluent treating agent in large droplets to wet and rinse particulate from an upper surface of the uppermost packed bed substantially without forming fine droplets. | 05-13-2010 |
David Alan Brown, Los Gatos, CA US
| Patent application number | Description | Published |
|---|---|---|
| 20110202787 | Single Wire Serial Interface - A single wire serial interface for power ICs and other devices is provided. To use the interface, a device is configured to include an EN/SET input pin. A counter within the device counts clock pulses sent to the EN/SET input pin. The output of the counter is passed to a ROM or other decoder circuit. The ROM selects an operational state for the device that corresponds to the value of the counter. In this way, control states may be selected for the device by sending corresponding clock pulses to the EN/SET pin. Holding the EN/SET pin high causes the device to maintain its operational state. Holding the EN/SET pin low for a predetermined timeout period resets the counter and causes the device to adopt a predetermined configuration (such as off) until new clock pulses are received at the EN/SET pin. | 08-18-2011 |
James E. Brown, Los Gatos, CA US
| Patent application number | Description | Published |
|---|---|---|
| 20080254086 | Controlled Release Compositions - Controlled release compositions for controlling release of a GnRH molecule or a GnRH analog are provided. The compositions include a GnRH molecule or GnRH analog as an active agent, and a controlled release component for controlling release of the GnRH molecule or GnRH analog from the composition. The compositions provide a sustained mean steady state plasma concentration (C | 10-16-2008 |
| 20090060986 | Transdermal delivery systems - Disclosed are bupivacaine transdermal delivery systems, and related methods. | 03-05-2009 |
Karl Brown, Los Gatos, CA US
| Patent application number | Description | Published |
|---|---|---|
| 20100071625 | SHUTTER DISK HAVING A TUNED COEFFICIENT OF THERMAL EXPANSION - A shutter disk having a tuned coefficient of thermal expansion is provided herein. In some embodiments, a shutter disk having a tuned coefficient of thermal expansion may include a body formed from a first material comprising at least two components, wherein a ratio of each of the at least two components to one another is selected to provide a coefficient of thermal expansion of the body that is substantially similar to a coefficient of thermal expansion of a second material to be deposited atop the body. | 03-25-2010 |
| 20100314244 | Ionized Physical Vapor Deposition for Microstructure Controlled Thin Film Deposition - Methods of processing a substrate in a PVD chamber comprising a target, a substrate and a process gas at a pressure sufficient to cause ionization of a substantial portion of species sputtered from the target are described. A capacitively coupled high density plasma is maintained by applying very high frequency power to the target. Sputtered material is ionized in the plasma and accelerated toward the substrate by a high frequency bias power applied to the substrate. The microstructure of the resultant film is controlled by modifying one or more of the pressure and the high frequency bias power. | 12-16-2010 |
| 20100314245 | Ionized Physical Vapor Deposition for Microstructure Controlled Thin Film Deposition - Methods of processing a substrate in a PVD chamber comprising a target, a substrate and a process gas at a pressure sufficient to cause ionization of a substantial portion of species sputtered from the target are described. A capacitively coupled high density plasma is maintained by applying very high frequency power to the target. Sputtered material is ionized in the plasma and accelerated toward the substrate by a high frequency bias power applied to the substrate. The microstructure of the resultant film is controlled by modifying one or more of the pressure and the high frequency bias power. | 12-16-2010 |