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Brouk, US

Lev Brouk, San Francisco, CA US

Patent application numberDescriptionPublished
20100217820METHOD, SYSTEM, AND COMPUTER PROGRAM PRODUCT FOR SENDING AND RECEIVING MESSAGES - A system and method for enabling the interchange of enterprise data through an open platform is disclosed. This open platform can be based on a standardized interface that enables parties to easily connect to and use the network. Services operating as senders, recipients, and in-transit parties can therefore leverage a framework that overlays a public network.08-26-2010
20100218245METHOD, SYSTEM, AND COMPUTER PROGRAM PRODUCT FOR MANAGING INTERCHANGE OF ENTERPRISE DATA MESSAGES - A system and method for enabling the interchange of enterprise data through an open platform is disclosed. This open platform can be based on a standardized interface that enables parties to easily connect to and use the network. Services operating as senders, recipients, and in-transit parties can therefore leverage a framework that overlays a public network.08-26-2010
20100306536SYSTEM AND METHOD FOR ROUTING MESSAGES BETWEEN APPLICATIONS - A system and method for enabling the interchange of enterprise data through an open platform is disclosed. This open platform can be based on a standardized interface that enables parties to easily connect to and use the network. Services operating as senders, recipients, and in-transit parties can therefore leverage a framework that overlays a public network.12-02-2010

Roman Brouk, San Jose, CA US

Patent application numberDescriptionPublished
20090287685METHOD AND APPARATUS FOR SOCIOLOGICAL DATA ANALYSIS - A method to enable improved analysis and use of sociological data, the method comprising identifying causal relationships between a plurality of documents, identifying a plurality of characteristics of a communication, including a modality used, actors involved, proximate events of relevance, and enabling a user to query based on available characteristics.11-19-2009

Victor Brouk, Fort Collins, CO US

Patent application numberDescriptionPublished
20090167290SYSTEM, METHOD, AND APPARATUS FOR MONITORING CHARACTERISTICS OF RF POWER - A system and method for monitoring RF power is described. In one embodiment the system samples RF power that is generated by an RF generator to obtain RF signals that include information indicative of electrical characteristics at a plurality of particular frequencies that fall within a frequency range. The RF signals are digitized to obtain a stream of digital RF signals that include information indicative of electrical characteristics at the plurality of particular frequencies, and the information indicative of electrical characteristics is successively transformed, for each of the plurality of particular frequencies, from a time domain into a frequency domain.07-02-2009
20100270141Detecting and Preventing Instabilities in Plasma Processes - Systems, methods and apparatus for reducing instabilities in a plasma-based processing system are disclosed. An exemplary method includes applying power to a plasma with a power amplifier; determining whether low frequency instability oscillations are present or high frequency instability oscillations are present in the plasma; and altering, based upon whether high or low frequency instability oscillations are present, an impedance of a load that is experienced by the power amplifier, the load experienced by the power amplifier including at least an impedance of the plasma.10-28-2010
20100276273METHOD AND APPARATUS FOR CONTROLLING ION ENERGY DISTRIBUTION - Systems, methods and apparatus for regulating ion energies in a plasma chamber are disclosed. An exemplary system includes an ion-energy control portion, and the ion-energy control portion provides at least one ion-energy control signal responsive to at least one ion-energy setting that is indicative of a desired distribution of energies of ions bombarding a surface of a substrate. A controller is coupled to the switch-mode power supply, and the controller provides at least two drive-control signals. In addition, a switch-mode power supply is coupled to the substrate support, the ion-energy control portion and the controller. The switch-mode power supply includes switching components configured to apply power to the substrate responsive to the drive signals and the ion-energy control signal so as to effectuate the desired distribution of the energies of ions bombarding the surface of the substrate.11-04-2010

Victor L. Brouk, Fort Collins, CO US

Patent application numberDescriptionPublished
20090249128PREDICTIVE DIAGNOSTICS SYSTEM, APPARATUS, AND METHOD FOR IMPROVED RELIABILITY - A system for managing a processing system and/or a processing system component is described. The system may include a wear-out module configured to provide a wear-out signal, the wear-out signal indicating a remaining amount of useful life of the component; a health module configured to provide a health signal, the health signal indicating an extent to which operational and environmental factors affect a failure rate of the component during a useful life of the component; and a mission module configured to provide a mission signal, the mission signal indicative of whether an operating condition is approaching a threshold that would adversely affect the system's ability to meet at least one performance objective.10-01-2009
20100194281Passive Power Distribution for Multiple Electrode Inductive Plasma Source - Systems, methods, and Apparatus for controlling the spatial distribution of a plasma in a processing chamber are disclosed. An exemplary system includes a primary inductor disposed to excite the plasma when power is actively applied to the primary inductor; at least one secondary inductor located in proximity to the primary inductor such that substantially all current that passes through the secondary inductor results from mutual inductance through the plasma with the primary inductor. In addition, at least one terminating element is coupled to the at least one secondary inductor, the at least one terminating element affecting the current through the at least one secondary inductor so as to affect the spatial distribution of the plasma.08-05-2010

Patent applications by Victor L. Brouk, Fort Collins, CO US