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Brinkhof
Eugene Maria Brinkhof, Weert NL
| Patent application number | Description | Published |
|---|---|---|
| 20080207011 | Board-To-Board Connector - The invention relates to a board-to board connector ( | 08-28-2008 |
| 20110007288 | HEAT TRANSFER ASSEMBLY, LITHOGRAPHIC APPARATUS AND MANUFACTURING METHOD - A lithographic apparatus includes a heat transfer assembly configured to temperature control at least a portion of the lithographic apparatus. The heat transfer assembly includes a printed circuit board, and a plurality of heat transfer elements. The printed circuit board and the plurality of heat transfer elements are configured to be attached to the portion of the lithographic apparatus. The plurality of heat transfer elements are separate from and are electrically coupled to the printed circuit board. | 01-13-2011 |
| 20110134399 | Lithographic Projection Apparatus - A lithographic apparatus arranged to transfer a pattern onto a substrate is disclosed. The lithographic apparatus comprises a power supply and an electrical connector. The electrical connector electrically connects the power supply to another component of the lithographic apparatus. The electrical connector comprises a laminate that comprises, in order, a first conducting layer, a first flexible insulating layer, a conductor configured to carry an electrical current, a second flexible insulating layer and a second conducting layer. | 06-09-2011 |
Ralph Brinkhof, Eindhoven NL
| Patent application number | Description | Published |
|---|---|---|
| 20100245798 | METHOD FOR POSITIONING A TARGET PORTION OF A SUBSTRATE WITH RESPECT TO A FOCAL PLANE OF A PROJECTION SYSTEM - A method is provided for positioning at least one target portion of a substrate with respect to a focal plane of a projection system. The method comprises performing height measurements of at least part of the substrate to generate height data, using predetermined correction heights to compute corrected height data for the height data. The method further comprises positioning the target portion of the substrate with respect to the focal plane of the projection system at least partially based on the corrected height data. | 09-30-2010 |
Ralph Brinkhof, 'S-Hertogenbosch NL
| Patent application number | Description | Published |
|---|---|---|
| 20090201473 | Method for Determining Exposure Settings, Lithographic Exposure Apparatus, Computer Program and Data Carrier - Embodiments of the invention relate to a method for determining exposure settings for a target field on a substrate in a lithographic exposure process, including providing calibration data by determining the position of a calibration field in a first direction at a plurality of calibration positions in a second and third direction relative to the position of the calibration field. The method also includes providing production data by establishing the position on the substrate of the target field in the second and third direction and by measuring the position of the exposure field in the first direction at least one measurement position relative to the position of the exposure field in the second and third direction. | 08-13-2009 |
| 20100233600 | LEVEL SENSOR ARRANGEMENT FOR LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - A level sensor arrangement is useable for measuring a height of a surface of a substrate in a lithographic apparatus. The level sensor arrangement is provided with a light source emitting detection radiation towards the substrate, and a detector unit for measuring radiation reflected from the substrate in operation. The light source is arranged to emit detection radiation in a wavelength range in which a resist to be used for processing the substrate in the lithographic apparatus is sensitive. | 09-16-2010 |
| 20110109889 | METHOD FOR POSITIONING A TARGET PORTION OF A SUBSTRATE WITH RESPECT TO A FOCAL PLANE OF A PROJECTION SYSTEM - A method is provided for positioning at least one target portion of a substrate with respect to a focal plane of a projection system. The method comprises performing height measurements of at least part of the substrate to generate height data, using predetermined correction heights to compute corrected height data for the height data. The method further comprises positioning the target portion of the substrate with respect to the focal plane of the projection system at least partially based on the corrected height data. | 05-12-2011 |