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Brands, DE
Angela Brands, Meerbusch DE
| Patent application number | Description | Published |
|---|---|---|
| 20120201776 | Hair Relaxer - The invention relates to a hair smoothing agent characterized by a content of sodium silicate. | 08-09-2012 |
Mario Brands, Ludwigshafen DE
| Patent application number | Description | Published |
|---|---|---|
| 20100122379 | Active Ingredient Compositions for Plant Protection - The present invention relates to novel active substance compositions for plant protection in the form of finely divided active-substance-containing particles which compositions comprise | 05-13-2010 |
| 20100278883 | USE OF AMPHIPHILIC SELF-ASSEMBLING PROTEINS FOR FORMULATING POORLY WATER-SOLUBLE EFFECT SUBSTANCES - The invention relates to the use of amphiphilic self-assembling proteins for formulating poorly water-soluble effect substances. | 11-04-2010 |
| 20120058641 | AQUEOUS POLISHING AGENT COMPRISING SOLID POLYMER PARTICLES AND TWO COMPLEXING AGENTS AND ITS USE IN A PROCESS FOR POLISHING PATTERNED AND UNSTRUCTURED METAL SURFACES - An aqueous CMP agent, comprising (A) solid polymer particles interacting and forming strong complexes with the metal of the surfaces to be polished; (B) a dissolved organic non-polymeric compound interacting and forming strong, water-soluble complexes with the metal and causing an increase of the material removal rate MRR and the static etch rate SER with increasing concentration of the compound (B); and (C) a dissolved organic non-polymeric compound interacting and forming slightly soluble or insoluble complexes with the metal, which complexes are capable of being adsorbed by the metal surfaces, and causing a lower increase of the MRR than the compound (B) and a lower increase of the SER than the compound (B) or no increase of the SER with increasing concentration of the compound (C); a CMP process comprising selecting the components (A) to (C) and the use of the CMP agent and process for polishing wafers with ICs. | 03-08-2012 |
| 20120058643 | AQUEOUS METAL POLISHING AGENT COMPRISING A POLYMERIC ABRASIV CONTAINING PENDANT FUNCTIONAL GROUPS AND ITS USE IN A CMP PROCESS - (A) solid polymer particles being finely dispersed in the aqueous phase and containing pendant functional groups (a1) capable of strongly interacting and forming strong complexes with the metal of the surfaces to be polished, and pendant functional groups (a2) capable of interacting less strongly with the metal of the surfaces to be polished than the functional groups (a1); and (B) an organic non-polymeric compound dissolved in the aqueous phase and capable of interacting and forming strong, water-soluble complexes with the metal of the surfaces to be polished and causing an increase of the material removal rate MRR and the static etch rate SER of the metal surfaces to be polished with increasing concentration of the compound (B); a CMP process comprising selecting (A) and (B) and the use of the CMP agent and process for polishing wafers with ICs. | 03-08-2012 |
Mario Brands, Frankenthal DE
| Patent application number | Description | Published |
|---|---|---|
| 20120083188 | DISPERSION COMPRISING CERIUM OXIDE AND SILICON DIOXIDE - Aqueous dispersion comprising cerium oxide and silicon dioxide, obtainable by first mixing a cerium oxide starting dispersion and a silicon dioxide starting dispersion while stirring, and then dispersing at a shear rate of 10000 to 30000 s | 04-05-2012 |
Michael Brands, Wuppertal DE
| Patent application number | Description | Published |
|---|---|---|
| 20090258888 | Pyrimidine Derivatives - This invention relates to novel compounds and processes for their preparation, methods of treating diseases, particularly cancer, comprising administering said compounds, and methods of making pharmaceutical compositions for the treatment or prevention of disorders, particularly cancer. | 10-15-2009 |
| 20090286785 | Pyrimidine Derivatives - This invention relates to novel compounds (I) and processes for their preparation, methods of treating diseases, particularly cancer, comprising administering said compounds, and methods of making pharmaceutical compositions for the treatment or prevention of disorders, particularly cancer. | 11-19-2009 |
| 20100075958 | PYRROLOTRIAZINE DERIVATIVES USEFUL FOR TREATING HYPER-PROLIFERATIVE DISORDERS AND DISEASES ASSOCIATED WITH ANGIOGENESIS - This invention relates to pyrrozolotriazine compounds, pharmaceutical compositions containing such compounds and the use of those compounds and compositions for the prevention and/or treatment of hyper-proliferative disorders and diseases associated with angiogenesis. | 03-25-2010 |
| 20100075967 | PYRIMIDINE DERIVATIVES FOR TREATMENT OF HYPERPROLIFERATIVE DISORDERS - Pyrimidine derivatives of formula (I) | 03-25-2010 |
| 20110098301 | Pyrimidine Derivatives for Treatment of Hyperproliferative Disorders - Pyrimidine derivatives of formula | 04-28-2011 |
Michael Brands, Berlin DE
| Patent application number | Description | Published |
|---|---|---|
| 20110021493 | SUBSTITUTED TRICYCLIC COMPOUNDS AND METHODS OF USE THEREOF - This invention relates to novel compounds and processes for their preparation, methods of treating diseases, particularly cancer, comprising administering said compounds, and methods of making pharmaceutical compositions for the treatment or prevention of disorders, particularly cancer. | 01-27-2011 |
Robert Brands, Eching DE
| Patent application number | Description | Published |
|---|---|---|
| 20110101968 | INDUCTIVE POSITION SENSOR - In an inductive position sensor for determining the position, particularly the rotation angle, of a movable element, at least two subsystems are provided, which each have second transmitting units with an actuating unit, an oscillating circuit on the movable element, and a receiving unit with an evaluating unit. According to the invention, it is provided that the operation of the individual subsystems is carried out alternately. Thus, if one subsystem is operating, all other subsystems are deactivated. In this way, all subsystems are individually operated in a consecutive manner. The synchronization required to do so is provided by a non-galvanic coupling of the subsystems, and in particular by an inductive coupling by way of preferably existing inductances of the subsystems. | 05-05-2011 |