| Patent application number | Description | Published |
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| 20100206028 | LOCK-ACTUATING KEY WITH IMPROVED IMPACT RESISTANCE - A key having one end secured to a yoke mounted between in a casing to turn about a pivot axis between a position in which the key is retracted inside the casing and a position in which the key is extended, and a control pushbutton mounted in a housing of the yoke so as to be constrained to pivot therewith and so as to slide between a position for holding the yoke at least in the retracted position, and a position for releasing the yoke for pivoting, the control pushbutton having at least one stud received in a groove of the housing, the groove including an inlet segment that opens out via a first end in an outer face of the yoke and that opens out via a second end in a terminal segment, forming an angle therewith, the terminal segment extending along the pivot axis. | 08-19-2010 |
| 20110134535 | DISPLAY DEVICE, NOTABLY FOR A MOTOR VEHICLE - A display device for a motor vehicle includes a projection module for generating an image for projection in a normal direction of looking of a user long an optical path. The display device comprises a reflection element capable of being moved between a first rest position and a second display position. The reflection element in its display position is provided in the normal direction of looking of the user. When the reflection element moves between its first rest position and its second display position, it is subjected to rotary movement about a fixed axis of rotation. | 06-09-2011 |
| 20110141572 | DISPLAY DEVICE, NOTABLY FOR A MOTOR VEHICLE - The present invention relates to a display device, notably for a motor vehicle, comprising a projection module for generating an image for the purpose of a projection in the normal direction of looking of a user of the display device on an optical path, the display device comprising a reflection element, the reflection element being capable of being moved between a multitude of different display positions, the different display positions corresponding to different viewing positions of a user of the display device. | 06-16-2011 |
| 20120060572 | PIVOTABLE KEY WITH REINFORCED POSITION LATCHING FOR ACTUATING A LOCK | 03-15-2012 |
| Patent application number | Description | Published |
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| 20090068273 | Inhalation devices for delivering phenethanolamine derivatives for the treatment of respiratory diseases - The invention provides inhalation devices comprising a compound which is 4-{(1R)-2-[(6-{2-[(2,6-dichlorobenzyl)oxy]ethoxy}hexyl)amino]-1-hydroxyethyl}-2-(hydroxymethyl)phenol; or a salt or solvate thereof, inhalation devices comprising formulations and combinations of the compound or a salt or solvate thereof, and methods for the treatment or prophylaxis of a clinical condition in a mammal by employing the inhalation devices | 03-12-2009 |
| 20110009631 | Phenethanolamine Derivatives for Treatment of Respiratory Diseases - Compounds of the formula (II) and (IV) are provided, which may be employed as intermediates for making compounds useful in treating respiratory diseases. | 01-13-2011 |
| 20110269970 | Phenethanolamine Derivatives for Treatment of Respiratory Diseases - (1R)-2-[(6-{2-[(2,6-dichlorobenzyl)oxy]ethoxy}hexyl)amino]-1-(2,2-dimethyl-4H-1,3-benzodioxin-6-yl)ethanol and (5R)-3-(6-{2-[(2,6-dichlorobenzyl)oxy]ethoxy}hexyl)-5-(2,2-dimethyl-4H-1,3-benzodioxin-6-yl)-1,3-oxazolidin-2-one are claimed | 11-03-2011 |
| Patent application number | Description | Published |
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| 20080212053 | Device manufacturing method, lithographic apparatus and device manufactured thereby - A device manufacturing method is disclosed. The method includes patterning a beam of radiation, projecting the patterned beam of radiation onto a plurality of outer target portions of a substrate in a sequence in which each subsequent outer target portion is spaced-apart from a preceding outer target portion, and subsequent to projecting the patterned beam of radiation on the plurality of outer target portions, projecting the patterned beam of radiation onto an inner target portion of the substrate. | 09-04-2008 |
| 20080291413 | Lithographic apparatus having encoder type position sensor system - A lithographic apparatus is disclosed that includes an encoder type sensor system configured to measure a position of a substrate table of the lithographic apparatus relative to a reference structure. The encoder type sensor system includes an encoder sensor head and an encoder sensor target and the lithographic apparatus comprises a recess to accommodate the encoder sensor target. | 11-27-2008 |
| 20090002653 | Lithographic apparatus having encoder type position sensor system - A lithographic apparatus is disclosed that includes an encoder type sensor system configured to measure a position of a substrate table of the lithographic apparatus relative to a reference structure. The encoder type sensor system includes an encoder sensor head and an encoder sensor target and the lithographic apparatus comprises a recess to accommodate the encoder sensor target. | 01-01-2009 |
| 20090061361 | Integrated Circuit Manufacturing Methods with Patterning Device Position Determination - Methods of manufacturing an integrated circuit by a lithographic apparatus are disclosed. The methods include patterning a radiation beam with a patterning device, projecting the patterned beam onto a substrate using a projection system, and determining the position of the patterning device. In one example, the patterning device's position relative to the projection system is determined by measuring the position of the patterning device's support structure. In another example, the position can be determined by measuring a position of the patterning device relative to its support and by measuring a position of the support. In another example, a Z-position of the patterning device is determined by directing at least one beam of radiation onto a part of the patterning device located outside a pattern area. This can be done by directing a pair of laser beams from sensors on the projection system to reflecting strips on the patterning device. | 03-05-2009 |
| 20100200772 | RADIATION SYSTEM WITH CONTAMINATION BARRIER - A radiation system includes a contamination barrier configured to permit radiation from a radiation source to pass through and to capture debris coming from the radiation source. The contamination barrier includes a plurality of lamellas. The surface of the lamellas includes a material. The radiation system also includes a collector configured to collect radiation from the contamination barrier. An optical surface of the collector includes a material that is the same as the material of the surface of the lamellas. | 08-12-2010 |
