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Bonser
Douglas Bonser, Hopewell Junction, NY US
| Patent application number | Description | Published |
|---|---|---|
| 20100267238 | METHODS FOR FABRICATING FINFET SEMICONDUCTOR DEVICES USING PLANARIZED SPACERS - Methods of fabricating a semiconductor device on and in a semiconductor substrate are provided. In accordance with an exemplary embodiment of the invention, one method comprises forming a sacrificial mandrel overlying the substrate, wherein the sacrificial mandrel has sidewalls. Sidewall spacers are formed adjacent the sidewalls of the sacrificial mandrel, the sidewall spacers having an upper portion and a lower portion. The upper portion of the sidewall spacers is removed. The sacrificial mandrel is removed and the semiconductor substrate is etched using the lower portion of the sidewall spacers as an etch mask. | 10-21-2010 |
| 20110070712 | METHOD FOR FABRICATING A SEMICONDUCTOR DEVICE HAVING A SEMICONDUCTIVE RESISTOR STRUCTURE - Methods are provided for fabricating a semiconductor device. A method comprises forming a conductive fin arrangement on a first region of a semiconductor substrate. The method further comprises forming a semiconductive resistor structure on a second region of the semiconductor substrate after forming the conductive fin arrangement, and forming a gate stack foundation structure overlying the conductive fin arrangement after forming the semiconductive resistor structure. The method further comprises removing portions of the gate stack foundation structure overlying the first region of the semiconductor substrate to define a gate structure for the semiconductor device. | 03-24-2011 |
Douglas J. Bonser, Hopewell Junction, NY US
| Patent application number | Description | Published |
|---|---|---|
| 20100267237 | METHODS FOR FABRICATING FINFET SEMICONDUCTOR DEVICES USING ASHABLE SACRIFICIAL MANDRELS - Methods are provided for fabricating a semiconductor device on and in a semiconductor substrate. In accordance with an exemplary embodiment of the invention, one method comprises forming a sacrificial mandrel overlying the substrate, the sacrificial mandrel having sidewalls. Sidewall spacers are formed adjacent the sidewalls of the sacrificial mandrel. The sacrificial mandrel is removed using an ashing process, and the substrate is etched using the sidewall spacers as an etch mask after removal of the sacrificial mandrel. | 10-21-2010 |
Geoffrey Bonser, Bellevue, WA US
| Patent application number | Description | Published |
|---|---|---|
| 20100077362 | SERVER-CONTROLLED USER INTERFACE - A distributed computational system, with local and remote processing components, is configured to provide a user interface of the local component that is stored in the local component but is controlled and updated by the remote component. | 03-25-2010 |