| Patent application number | Description | Published |
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| 20080227296 | SLURRY COMPOSITIONS, METHODS OF PREPARING SLURRY COMPOSITIONS, AND METHODS OF POLISHING AN OBJECT USING SLURRY COMPOSITIONS - A slurry composition includes an acidic aqueous solution and one or both of, an amphoteric surfactant and a glycol compound. Examples of the amphoteric surfactant include a betaine compound and an amino acid compound, and examples of the amino acid compound include lysine, proline and arginine. Examples of the glycol compound include diethylene glycol, ethylene glycol and polyethylene glycol. | 09-18-2008 |
| 20090042494 | PAD CONDITIONER OF SEMICONDUCTOR WAFER POLISHING APPARATUS AND MANUFACTURING METHOD THEREOF - A pad conditioner of semiconductor wafer polishing apparatus and a pad conditioner manufacturing method thereof are provided with a uniform conditioning for a polishing pad of a polishing apparatus, the polishing apparatus being for evenly planarizing a metal layer formed on the surface of wafer in a semiconductor device manufacturing processor. The pad conditioner may include a substrate constructed of a flat plate of disk shape, a coating part formed with a given thickness on the substrate, and a plurality of protrusion parts formed on the coating part, the plurality of protrusion parts having a plurality of polishing members based on the same size in a predetermined grouping or pattern. | 02-12-2009 |
| 20110027996 | SLURRY COMPOSITION FOR A CHEMICAL MECHANICAL POLISHING PROCESS, METHOD OF POLISHING AN OBJECT LAYER AND METHOD OF MANUFACTURING A SEMICONDUCTOR MEMORY DEVICE USING THE SLURRY COMPOSITION - A slurry composition for a chemical mechanical processing process includes about 0.05 to about 0.3 percent by weight of a ceria abrasive, about 0.005 to about 0.04 percent by weight of an anionic surfactant, about 0.0005 to about 0.003 percent by weight of a polyoxyethylene-based nonionic surfactant, about 0.2 to about 1.0 percent by weight of a salt of polyacrylic acid having an average molecular weight substantially greater than a molecular weight of the anionic surfactant, and a remainder of water. In addition, a method of polishing an object layer and a method of manufacturing a semiconductor device using the slurry composition are also provided. | 02-03-2011 |
| Patent application number | Description | Published |
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| 20080285845 | Image processing apparatus and method - An image processing apparatus according to the present invention comprises an object area extracting unit for extracting an object area including an object pixel and pixels adjacent to the object pixel from a bayer pattern image; a fault pixel judging unit for determining if the object pixel is a fault pixel based on levels of the adjacent pixels and a fault pixel judgment standard range that varies according to a level of the object pixel; and a fault pixel correcting unit for correcting the level of the object pixel determined to be a fault pixel based on a level average value of the adjacent pixels and a fault pixel correction standard range that varies according to the level average value of the adjacent pixels. | 11-20-2008 |
| 20080292207 | Image processing apparatus and image processing method - An image processing apparatus is provided, including a brightness change level classifying unit, a dynamic weight calculating unit, and a brightness correcting unit. The brightness change level classifying unit compares a brightness change average value representing brightness changes from a pixel of interest to neighboring pixels around the pixel of interest with an upper threshold value and a lower threshold value and classifies the brightness change level of the pixel of interest into three types of levels according to the result of the comparison. An upper threshold value and a lower threshold value are predetermined based on the brightness of the pixel of interest. The dynamic weight calculating unit calculates different dynamic weights according to the brightness change level of the pixel of interest. The brightness correcting unit corrects the brightness of the pixel of interest, based on the dynamic weights. Accordingly, noise generated on a plane part of an image is minimized and a contour of the image is appropriately emphasized, consequently improving the definition of images. | 11-27-2008 |
| 20080316334 | Apparatus and method for processing image - Provided is an apparatus and method for processing an image which can correct image distortion caused by hand shake. The apparatus includes: a reference image acquiring unit for acquiring a first and a second reference images by using different shutter times and international standard organization (ISO) values; and a color information correcting unit for correcting color information of an input image, which is obtained by using a shutter time that is shorter of the shutter times used to acquire the first and the second reference images, based on a brightness ratio and a chrominance ratio of the first and second reference images. Accordingly, image distortion caused by hand shake can be corrected. | 12-25-2008 |
