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Blake R.

Blake R. Dronen, Minneapolis, MN US

Patent application numberDescriptionPublished
20100000160FIXED ABRASIVE PARTICLES AND ARTICLES MADE THEREFROM - An abrasive particle includes a substantially spheroid metal containing matrix having a circumference and a super abrasive material having an average diameter of less than about 8 micrometer at least partially embedded the circumference of the metal containing matrix. The abrasive particle having an average diameter of less than about 200 micrometer.01-07-2010

Blake R. Getson, Columbus, OH US

Patent application numberDescriptionPublished
20110087388AUTOMATIC DISPLAY OF APPROACH MINIMUMS - A system installed in an aircraft automatically retrieves and displays approach minimum data to the pilot, thereby relieving him or her of the burden of searching for the desired information. The display of the data may take the form of a complete or partial image of a published approach chart. In a variation, the system may both automatically retrieve and automatically enter the desired data into the flight plan, thereby relieving the pilot of both the searching and data-entry tasks. The system may include a database, a screen, a control, and a controller.04-14-2011

Blake R. Koelmel, Mountain View, CA US

Patent application numberDescriptionPublished
20090255921Apparatus Including Heating Source Reflective Filter For Pyrometry - Methods and apparatus for processing substrates and measuring the temperature using radiation pyrometry are disclosed. A reflective layer is provided on a window of a processing chamber. A radiation source providing radiation in a first range of wavelengths heats the substrate, the substrate being transparent to radiation in a second range of wavelengths within the first range of wavelengths for a predetermined temperature range. Radiation within the second range of wavelength is reflected by the reflective layer.10-15-2009
20090289053Apparatus Including Heating Source Reflective Filter for Pyrometry - Methods and apparatus for processing substrates and measuring the temperature using radiation pyrometry are disclosed. A reflective layer is provided on a window of a processing chamber. A radiation source providing radiation in a first range of wavelengths heats the substrate, the substrate being transparent to radiation in a second range of wavelengths within the first range of wavelengths for a predetermined temperature range. Radiation within the second range of wavelength is reflected by the reflective layer.11-26-2009
20100074604Apparatus and Method for Improved Control of Heating and Cooling of Substrates - Methods and apparatus for processing substrates and controlling the heating and cooling of substrates are described. A radiation source providing radiation in a first range of wavelengths heats the substrate within a predetermined temperature range, the substrate being absorptive of radiation in a second range of wavelengths within the first range of wavelengths and within the predetermined temperature rang. A filter prevents at least a portion of radiation within the second wavelength range from reaching the substrate.03-25-2010
20100133257Rapid Thermal Processing Chamber With Micro-Positioning System - Methods and apparatus for rapid thermal processing of a planar substrate including axially aligning the substrate with a substrate support or with an empirically determined position are described. The methods and apparatus include a sensor system that determines the relative orientations of the substrate and the substrate support.06-03-2010
20100264132METHODS AND APPARATUS FOR ALIGNING A SUBSTRATE IN A PROCESS CHAMBER - Methods and apparatus for aligning a substrate in a process chamber are provided herein. In some embodiments, an apparatus may include a process chamber having an interior volume for processing a substrate therein; and a substrate positioning system configured to determine a substrate position within the interior volume, wherein the substrate positioning system determines the substrate position in two dimensions by the interaction of a first position and a second position along an edge of a substrate with two beams of electromagnetic radiation provided by the substrate positioning system. In some embodiments, a method for aligning a substrate may include placing a substrate in the interior volume of a process chamber; directing electromagnetic radiation into the interior volume in a first beam along a first path and in a second beam along a second path; and determining the position of the substrate in two dimensions by interaction of the first and second beams of electromagnetic radiation with an edge of the substrate proximate a first position and a second position.10-21-2010
20110123178Apparatus and Method for Enhancing the Cool Down of Radiatively Heated Substrates - The present invention generally relates to methods and apparatus for processing substrates. Embodiments of the invention include apparatuses for processing a substrate comprising a dynamic heat sink that is substantially transparent to light from a radiant heat source, the dynamic heat sink being positioned near the substrate so the two are coupled. Additional embodiments of the invention are directed to methods of processing a substrate using the apparatuses described.05-26-2011

Patent applications by Blake R. Koelmel, Mountain View, CA US

Blake R. Storie, Laguna Niguel, CA US

Patent application numberDescriptionPublished
20100152679INJECTION DEVICE - An injection device includes a syringe having a body with a piston disposed therein with an open end along with a viscous fluid disposed in the body for injection by the piston. A needle assembly is provided which includes a cannula having a luer connection engageable with the syringe distal end with the luer connector including a hub. Mating engagement is provided by way of internal threads at the syringe distal end and external treads of a hub with a pitch sufficient to prevent detachment of the hub from the syringe distal end during ejection of the viscous fluid. In addition, a stepped cavity, disposed in the hub, further prevents detachment of the hub from the syringe distal end during ejection of the viscous fluid.06-17-2010
20110092916INJECTION DEVICE - An injection device includes a syringe having a body with a piston disposed therein with an open end along with a viscous fluid disposed in the body for injection by the piston. A needle assembly is provided which includes a cannula, for example a blunt tipped cannula, having a luer connection engageable with the syringe distal end with the luer connector including a hub. Mating engagement is provided by way of internal threads at the syringe distal end and external treads of a hub with a pitch sufficient to prevent detachment of the hub from the syringe distal end during ejection of the viscous fluid. In addition, a stepped cavity, disposed in the hub, further prevents detachment of the hub from the syringe distal end during ejection of the viscous fluid.04-21-2011

Blake R. Wiggs, Richmond CA

Patent application numberDescriptionPublished
20100205125IDENTIFYING INVENTION FEATURE PERMUTATIONS FOR A REASONABLE NUMBER OF PATENT APPLICATION CLAIMS - Permutations of features of an invention are ranked in accordance with factors such as importance and specificity to identify a reasonable number of (i.e. 20 or fewer) permutations as candidates for structuring a corresponding number of claims for a patent application. The identified permutations desirably include permutations corresponding to claims of broad scope, claims of narrow scope, and claims of intermediate scope; and exclude illogical or impractical permutations of features.08-12-2010