Patent application number | Description | Published |
20160058336 | PHYSICAL ACTIVITY AND WORKOUT MONITOR - The present disclosure relates to devices and processes for monitoring attributes of a user's physical activity (e.g., workout) or inactivity, and to user interfaces (e.g., an activity indicator) for displaying the same. In some examples, a device determines whether physical activity corresponds to a first type based on a first set of criteria, and whether physical activity corresponds to a second type based on a second set of criteria. In some examples, the device controls an inactivity timer that measures user's inactivity. In some examples, the device displays a first visual representation of an attribute or amount of a first type of physical activity, and a second visual representation of an attribute or amount of a second type. In some examples, the device displays a third visual representation of an attribute or amount of a third type of activity. In some examples, the third visual representation corresponds to user's inactivity. | 03-03-2016 |
20160058337 | PHYSICAL ACTIVITY AND WORKOUT MONITOR - The present disclosure relates to devices and processes for monitoring attributes of a user's physical activity (e.g., workout) or inactivity, and to user interfaces (e.g., an activity indicator) for displaying the same. In some examples, a device determines whether physical activity corresponds to a first type based on a first set of criteria, and whether physical activity corresponds to a second type based on a second set of criteria. In some examples, the device controls an inactivity timer that measures user's inactivity. In some examples, the device displays a first visual representation of an attribute or amount of a first type of physical activity, and a second visual representation of an attribute or amount of a second type. In some examples, the device displays a third visual representation of an attribute or amount of a third type of activity. In some examples, the third visual representation corresponds to user's inactivity. | 03-03-2016 |
20160089569 | FITNESS CHALLENGE E-AWARDS - The present disclosure relates to systems and processes for users of electronic devices to issue physical activity goal challenges and rewards to one another. In one example, a first user can provide a physical activity goal that is to be performed by a second user. The first user can further provide a reward that is to be given to the second user in response to the second user completing the physical activity goal. An electronic device associated with the second user can be used to detect physical activity performed by the second user and to determine whether the second user has completed the physical activity goal. In response to determining that the second user has completed the physical activity goal, the reward can be issued to the second user. The reward can include an image, video, song, electronic message, amount of virtual currency, access to a service, or the like. | 03-31-2016 |
Patent application number | Description | Published |
20120268592 | Processing Data of a User Performing an Athletic Activity to Estimate Energy Expenditure - Example embodiments may relate to a system, method, apparatus, and computer readable media configured for prompting a user to perform an exercise, monitoring form of the user while performing the exercise, and calculating an energy expenditure estimate for the user performing the exercise based on a type of the exercise and on the form of the user. | 10-25-2012 |
20120271143 | Fatigue Indices and Uses Thereof - Example embodiments may relate to a system, method, apparatus, and computer readable media configured for monitoring a user performing an athletic movement and/or exercise and generating a fatigue value. Fatigue values may be determined for different groups. In one embodiment, a first value is determined for a muscle fatigue value and a second value is determined for a respiratory value. In another embodiment, a first value may pertain to a first muscle group and a second value may pertain to a second muscle group. A fatigue index may be created from values obtained during an athletic movement and/or a workout session. In further embodiments, a cumulative fatigue index may be determined. A cumulative fatigue index may consider values obtained during several workout sessions. Further, data obtained outside of workout sessions may be considered in determinations relating to fatigue values and/or indices. | 10-25-2012 |
20120277891 | Method and System for Automated Personal Training that Includes Training Programs - Systems and methods for creating personalized exercise programs are disclosed. An image capture device and a computer device are used to capture images of a user while the user performs athletic movements. The images may then be evaluated to create a human movement screen score. The human movement screen score, goal and time commitment information may then be used to create a personalized exercise program tailored to the specific user. | 11-01-2012 |
20130268205 | Fitness Training System with Energy Expenditure Calculation That Uses a Form Factor - System and methods are provided for prompting a user to perform an exercise and to monitor the exercise. The form of the user may be monitored, such as with one or more video cameras and/or other sensors, to determine how well the user is performing the exercise. Energy expenditure is estimated based factors that include the type of the exercise, the form of the user and a contribution value that associates energy expenditure with form. | 10-10-2013 |
20130324368 | Fitness Training System With Energy Expenditure Calculation That Uses Multiple Sensor Inputs - Systems and methods for prompting a user to perform an exercise and monitoring the exercise are provided. Multiple independent sensors or sensor systems may be used to calculate energy expenditure. Various criteria may be used to manually or automatically select the independent sensor or sensor system or combination that will be used with the energy expenditure calculations. | 12-05-2013 |
20140187394 | EXERCISE DEVICE - An exercise device may include a main body defining an arch-shaped structure, at least one movable support mechanism coupled to the main body and configured to support the exercise device on a support surface, and at least one gripping mechanism coupled to the main body. The main body may be formed from a shape retaining material. The exercise device may further include a biasing mechanism coupled to the main body. The at least one movable support mechanism may include wheels coupled to the main body. The at least one gripping mechanism may include a handle or a recess or an elongated slot formed in the main body. The main body may further include apertures for joining the handle to the main body at various positions. | 07-03-2014 |
20140187395 | EXERCISE DEVICE AND METHODS FOR USING THE EXERCISE DEVICE - An exercise device may include one or more leg assemblies operatively joined to a user engagement component. The leg assemblies may position the user engagement component at an initial or rest position, which may be a predetermined distance above a support surface. The leg assemblies may be configured to allow a user to move the user engagement towards the support surface from the initial or rest position. The exercise device may further include one or more biasing or resistance components that are joined to at least one leg assembly and that resist movement of the user engagement component towards the support surface. The biasing or resistance components may further be configured to return the engagement component to its initial or rest position. | 07-03-2014 |
Patent application number | Description | Published |
20120017938 | PLATEN CLEANING - To achieve cost efficiency, solar cells must be processed at a high throughput. Breakages, which may leave debris on the clamping surface of the platen, adversely affect this throughput. A plurality of embodiments are disclosed which may be used to remove debris from the clamping surface without breaking the vacuum condition within the processing station. In some embodiments, a brush is used to sweep the debris from the surface of the platen. In other embodiments, an adhesive material is used to collect the debris. In some embodiments, the automation equipment used to handle masks may also be used to handle the platen cleaning mechanisms. In still other embodiments, stream of gas or ion beams are used to clean debris from the clamping surface of the platen. | 01-26-2012 |
20140241848 | ELECTRIC SWITCHABLE MAGNET SLITVALVE - A slitvalve that uses magnetic energy to move a door in a direction normal to the plane of the wall is disclosed. An electrically switchable magnet is used to draw the door toward the wall to seal an aperture in the wall. Compressed Dry Air or other mechanisms may be employed to move the door between a first open position and a second closed position. A method of passing a workpiece between two different environments utilizing this magnetic slitvalve is also disclosed. | 08-28-2014 |
20160033205 | MULTI-SUBSTRATE THERMAL MANAGEMENT APPARATUS - Embodiments of multi-substrate thermal management apparatus are provided herein. In some embodiments, a multi-substrate thermal management apparatus includes a plurality of plates vertically arranged above one another; a plurality of channels extending through each of the plurality of plates; a supply manifold including a supply channel coupled to the plurality of plates at first locations; and a return manifold including a return channel coupled to the plurality of plates via a plurality of legs at second locations, wherein the supply and return channels are fluidly coupled to the plurality of channels to flow a heat transfer fluid through the plurality of plates. | 02-04-2016 |
Patent application number | Description | Published |
20140271048 | High Throughput, Low Volume Clamshell Load Lock - A load lock having a reduced volume, thereby allowing faster pumping and venting, is disclosed. The load lock uses a movable bottom wall to modify the volume of the chamber to be pumped. In a first position, the movable wall is disposed so as to create a small internal volume. In a second position, the bottom wall is moved downward, allowing the workpiece to be in contact with a process chamber or an exit aperture. The bottom wall may be sealed in the first position through the use of a sealing mechanism, such as a magnetic clamp. The bottom wall may also include a workpiece holding mechanism. The top wall may be a removable cover, which is moved by an actuator. A robotic mechanism may supply workpieces to the load lock while the top wall is in the open position. | 09-18-2014 |
20140271054 | MULTI-POSITION BATCH LOAD LOCK APPARATUS AND SYSTEMS AND METHODS INCLUDING SAME - Various embodiments of batch load lock apparatus are disclosed. The batch load lock apparatus includes a load lock body including first and second load lock openings, a lift assembly within the load lock body, the lift assembly including multiple wafer stations, each of the multiple wafer stations adapted to provide access to wafers through the first and second load lock openings, wherein the batch load lock apparatus includes temperature control capability (e.g., heating or cooling). Batch load lock apparatus is capable of transferring batches of wafers into and out of various processing chambers. Systems including the batch load lock apparatus and methods of operating the batch load lock apparatus are also provided, as are numerous other aspects. | 09-18-2014 |
20140271057 | TEMPERATURE CONTROL SYSTEMS AND METHODS FOR SMALL BATCH SUBSTRATE HANDLING SYSTEMS - Embodiments of substrate handling systems capable of heating and/or cooling batches of substrates being transferred into and out of various substrate processing chambers are provided. Methods of substrate handling are also provided, as are numerous other aspects. | 09-18-2014 |
Patent application number | Description | Published |
20090016855 | LOAD LOCK FAST PUMP VENT - A substrate processing tool including a frame forming at least one isolatable chamber configured to hold a controlled atmosphere, at least two substrate supports located within each of the at least one isolatable chamber, each of the at least two substrate supports being stacked one above the other and configured to hold a respective substrate and a cooling unit communicably coupled to the at least two substrate supports such that the at least two substrate supports and cooling unit effect simultaneous conductive cooling of each of the respective substrates located on the at least two substrate supports. | 01-15-2009 |
20130078057 | LOAD LOCK FAST PUMP VENT - A semiconductor processing tool is disclosed, the tool having a frame forming at least one chamber with an opening and having a sealing surface around a periphery of the opening, a door configured to interact with the sealing surface for sealing the opening, the door having sides perpendicular to the door sealing surface and perpendicular to a transfer plane of a substrate, and at least one drive located on the frame to a side of at least one of the sides that are substantially perpendicular to the door sealing surface and substantially perpendicular to the transfer plane of the substrate, the drive having actuators located at least partially in front of the sealing surface and the actuators being coupled to one of the sides of the door for moving the door from a sealed position. The at least one drive is located outside of a substrate transfer zone. | 03-28-2013 |
20140178157 | LOAD LOCK CHAMBER - A semiconductor processing tool is disclosed, the tool having a frame forming at least one chamber with an opening and having a sealing surface around a periphery of the opening, a door configured to interact with the sealing surface for sealing the opening, the door having sides perpendicular to the door sealing surface and perpendicular to a transfer plane of a substrate, and at least one drive located on the frame to a side of at least one of the sides that are substantially perpendicular to the door sealing surface and substantially perpendicular to the transfer plane of the substrate, the drive having actuators located at least partially in front of the sealing surface and the actuators being coupled to one of the sides of the door for moving the door from a sealed position. The at least one drive is located outside of a substrate transfer zone. | 06-26-2014 |
Patent application number | Description | Published |
20100283359 | INSTALLATION SYSTEM AND DOOR POSITIONING DEVICE FOR APPLIANCES - An appliance comprises a body and a door panel and/or drawer panel movable between a home position, an open position, and an over-travel position. A cosmetic panel may be coupled to the door and/or drawer panel. The appliance may further include an installation system and/or a positioning device. The positioning device is configured to bias the door and/or drawer panels to the home position from the over-travel position. The installation system is configured to establish the front-to-back alignment of the appliance. The installation system may be a direct mount installation system. The installation system may include an adjustment system configured to facilitate positioning the cosmetic panel to be co-planar with the surrounding cabinetry. The adjustment mechanism may further help establish small and consistent reveals. | 11-11-2010 |
20130134851 | INSTALLATION SYSTEM AND DOOR POSITIONING DEVICE FOR APPLIANCES - An appliance comprises a body and a door panel and/or drawer panel movable between a home position, an open position, and an over-travel position. A cosmetic panel may be coupled to the door and/or drawer panel. The appliance may further include an installation system and/or a positioning device. The positioning device is configured to bias the door and/or drawer panels to the home position from the over-travel position. The installation system is configured to establish the front-to-back alignment of the appliance. The installation system may be a direct mount installation system. The installation system may include an adjustment system configured to facilitate positioning the cosmetic panel to be co-planar with the surrounding cabinetry. The adjustment mechanism may further help establish small and consistent reveals. | 05-30-2013 |
20130221825 | CONTROLLED CLOSURE SYSTEM FOR A HINGE - A hinge including a device bracket, a door bracket, a first arm, a second arm, and a closure device is provided. The first arm mounts to the device bracket at a first pin and to the door bracket at a second pin. The second arm mounts to the device bracket at a third pin and to the door bracket at a fourth pin. The third pin is closer to an axis of rotation of a door than the first pin when the door is in a closed position. The closure device includes a closure device body mounted to move with the second arm, a rod mounted within the closure device body, a spring, a spring retainer mounted to the rod, and a nut mounting the rod to the device bracket. The spring is mounted between the spring retainer and the closure device body to exert a force on the second arm. | 08-29-2013 |
20140042885 | HINGE MOUNTED SWITCH CONTROL DEVICE - A switching system including a switch activation pin, a switch, and a switch connector is provided. The switch activation pin mounts to an arm that pivotally mounts a door to a body of a device. The switch activation pin moves with the arm when the door is opened or closed. The switch mounts to the device to control a component of the device. The switch connector mounts to the device to activate the switch based on a position of the switch activation pin. | 02-13-2014 |
Patent application number | Description | Published |
20090103184 | LITHOGRAPHY PROJECTION OBJECTIVE, AND A METHOD FOR CORRECTING IMAGE DEFECTS OF THE SAME - Projection objectives, as well as related components, systems and methods, are disclosed. In general, a projection objective is configured to image radiation from an object plane to an image plane. A projection objective can include a plurality of optical elements along the optical axis. The plurality of optical elements can include a group of optical elements and a last optical element which is closest to the image plane, and a positioning device configured to move the last optical element relative to the image plane. Typically, a projection objective is configured to be used in a microlithography projection exposure machine. | 04-23-2009 |
20090306921 | SPECIFICATION, OPTIMIZATION AND MATCHING OF OPTICAL SYSTEMS BY USE OF ORIENTATIONAL ZERNIKE POLYNOMIALS - The present disclosure relates to specification, optimization and matching of optical systems by use of orientation Zernike polynomials. In some embodiments, a method for assessing the suitability of an optical system of a microlithographic projection exposure apparatus is provided. The method can include determining a Jones pupil of the optical system, at least approximately describing the Jones pupil using an expansion into orientation Zernike polynomials, and assessing the suitability of the optical system on the basis of the expansion coefficient of at least one of the orientation Zernike polynomials in the expansion. | 12-10-2009 |
20100157435 | LITHOGRAPHY PROJECTION OBJECTIVE, AND A METHOD FOR CORRECTING IMAGE DEFECTS OF THE SAME - Projection objectives, as well as related components, systems and methods, are disclosed. In general, a projection objective is configured to image radiation from an object plane to an image plane. A projection objective can include a plurality of optical elements along the optical axis. The plurality of optical elements can include a group of optical elements and a last optical element which is closest to the image plane, and a positioning device configured to move the last optical element relative to the image plane. Typically, a projection objective is configured to be used in a microlithography projection exposure machine. | 06-24-2010 |
20100231887 | ILLUMINATION SYSTEM OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS - A microlithographic projection exposure apparatus includes an illumination system and a projection objective. During use of the microlithographic projection exposure apparatus, the illumination system illuminates an object plane of the projection objective. The illumination system is configured so that light components in point-symmetrical relationship with each other, which are produced during use of the illumination system and which are only superposed in the object plane, have mutually orthogonal polarization states. | 09-16-2010 |
20110134403 | MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS - A microlithographic projection exposure apparatus contains a projection objective, whose last optical element on the image side is a dry terminating element that has no refractive power and is designed for dry operation of the projection objective. According to the invention, the projection exposure apparatus furthermore contains an immersion terminating element that has no refractive power and is designed for immersed operation of the projection objective. The immersion terminating element is replaceable with the dry terminating element. Preferably, the dry terminating element and/or the immersion terminating element is composed of a plurality of plates, which are made of materials having different refractive indices. | 06-09-2011 |
20120019800 | LITHOGRAPHY PROJECTION OBJECTIVE, AND A METHOD FOR CORRECTING IMAGE DEFECTS OF THE SAME - A lithography projection objective for imaging a pattern to be arranged in an object plane of the projection objective onto a substrate to be arranged in an image plane of the projection objective comprises a multiplicity of optical elements that are arranged along an optical axis of the projection objective. The optical elements comprise a first group, following the object plane, of optical elements, and a last optical element, which follows the first group and is next to the image plane and which defines an exit surface of the projection objective and is arranged at a working distance from the image plane. The projection objective is tunable or tuned with respect to aberrations for the case that the volume between the last optical element and the image plane is filled by an immersion medium with a refractive index substantially greater than 1. The position of the last optical element is adjustable in the direction of the optical axis. A positioning device is provided that positions at least the last optical element during immersion operation such that aberrations induced by disturbance are at least partially compensated. | 01-26-2012 |
20140327891 | LITHOGRAPHY PROJECTION OBJECTIVE, AND A METHOD FOR CORRECTING IMAGE DEFECTS OF THE SAME - A lithography projection objective for imaging a pattern in an object plane onto a substrate in an image plane. The projection objective comprises a multiplicity of optical elements along an optical axis. The optical elements comprise a first group of optical elements following the object plane, and a last optical element, following the first group and next to the image plane. The projection objective is tunable or tuned with respect to aberrations for the case that the volume between the last optical element and the image plane is filled by an immersion medium with a refractive index substantially greater than 1. The position of the last optical element is adjustable in the direction of the optical axis. A positioning device is provided that positions at least the last optical element during immersion operation such that aberrations induced by disturbance are at least partially compensated. | 11-06-2014 |