| Patent application number | Description | Published |
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| 20090056108 | BIMORPHIC STRUCTURES, SENSOR STRUCTURES FORMED THEREWITH, AND METHODS THEREFOR - A bimorphic structure responsive to changes in an environmental condition, sensor structures incorporating one or more of such bimorphic structures, and a method of forming such bimorphic structures. The sensor structure has an electrically-conductive first contact on a substrate, and a bimorph beam anchored to the substrate so that a portion thereof is suspended above the first contact. The bimorph beam has a multilayer structure that includes first and second layers, with the second layer between the first layer and the substrate. A portion of the first layer projects through an opening in the second layer toward the first contact so as to define an electrically-conductive second contact located on the beam so as to be spaced apart and aligned with the first contact for contact with the first contact when the beam sufficiently deflects toward the substrate. | 03-05-2009 |
| 20090108403 | SEMICONDUCTOR STRUCTURE AND METHOD OF MANUFACTURE - In various embodiments, semiconductor structures and methods to manufacture these structures are disclosed. In one embodiment, a capacitor embedded in a dielectric material below the surface of a semiconductor substrate is disclosed. Other embodiments are described and claimed. | 04-30-2009 |
| 20090108458 | SEMICONDUCTOR STRUCTURE AND METHOD OF MANUFACTURE - In various embodiments, semiconductor structures and methods to manufacture these structures are disclosed. In one embodiment, an electrical bus embedded in a dielectric material below a surface of a semiconductor substrate is disclosed. Other embodiments are described and claimed. | 04-30-2009 |
| 20090146248 | SEMICONDUCTOR STRUCTURE AND METHOD OF MANUFACTURE - In various embodiments, semiconductor structures and methods to manufacture these structures are disclosed. In one embodiment, a structure includes a dielectric material and a void below a surface of a substrate. The structure further includes a doped dielectric material over the dielectric material, over the first void, wherein at least a portion of the dielectric material is between at least a portion of the substrate and at least a portion of the doped dielectric material. Other embodiments are described and claimed. | 06-11-2009 |
| 20090148999 | SEMICONDUCTOR STRUCTURE AND METHOD OF MANUFACTURE - In various embodiments, semiconductor structures and methods to manufacture these structures are disclosed. In one embodiment, a method to manufacture a semiconductor structure includes forming a cavity in a substrate. A portion of the substrate is doped, or a doped material is deposited over a portion of the substrate. At least a portion of the doped substrate or at least a portion of the doped material is converted to a dielectric material to enclose the cavity. The forming of the cavity may occur before or after the doping of the substrate or the depositing of the doped material. Other embodiments are described and claimed. | 06-11-2009 |
| 20090174040 | SACRIFICIAL PILLAR DIELECTRIC PLATFORM - Briefly, in accordance with one or more embodiments, a dielectric platform is at least partially formed in a semiconductor substrate and extending at least partially below a surface of a semiconductor substrate. The dielectric platform may include structural pillars formed by backfilling a first plurality of cavities etched in the substrate, and a second plurality of cavities formed by etching away sacrificial pillars disposed between the structural pillars. The second plurality of cavities may be capped to hermetically seal the second plurality of cavities to impart the dielectric constant of the material contained therein, for example air, to the characteristic dielectric constant of the dielectric platform. Alternatively, the second plurality of cavities may be backfilled with a material having a lower dielectric constant than the substrate, for example silicon dioxide where the substrate comprises silicon. | 07-09-2009 |
| 20090261421 | SEMICONDUCTOR STRUCTURE AND METHOD OF MANUFACTURE - In various embodiments, semiconductor structures and methods to manufacture these structures are disclosed. In one embodiment, a method includes forming a portion of the unidirectional transistor and a portion of a bidirectional transistor in or over a semiconductor material simultaneously. Other embodiments are described and claimed. | 10-22-2009 |
| 20100230776 | SEMICONDUCTOR STRUCTURE AND METHOD OF MANUFACTURE - Briefly, in accordance with one or more embodiments, a semiconductor structure and method for forming the semiconductor structure are disclosed. The semiconductor structure may comprise a dielectric structure and one or more active areas or one or more field areas, for example, disposed proximate to the dielectric structure along a perimeter thereof. The dielectric structure and the other areas may be separated by one or more trenches or gaps to provide stress relief between the dielectric structure and the other areas. The one or more trenches may include one or more silicon formations formed there between to provide a spring like function and further provide stress relief between the dielectric structure and the other areas. Stress relief of the trenches may be further enhanced via hydrogen annealing to smooth sharp corners or other sharp features of the trenches such as scalloping. | 09-16-2010 |
| 20100273308 | SEMICONDUCTOR STRUCTURE AND METHOD OF MANUFACTURE - In various embodiments, semiconductor structures and methods to manufacture these structures are disclosed. In one embodiment, a structure includes a dielectric material and a void below a surface of a substrate. The structure further includes a doped dielectric material over the dielectric material, over the first void, wherein at least a portion of the dielectric material is between at least a portion of the substrate and at least a portion of the doped dielectric material. Other embodiments are described and claimed. | 10-28-2010 |
