Biolsi
David J. Biolsi, Portland, ME US
Patent application number | Description | Published |
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20080228031 | System and Method for an Illumination-Quality Test - An endoscopic illumination tester is provided for testing illumination quality of a lightsource. The endoscopic illumination tester includes an optical bridge that is removably interlockable with the lightsource. The endoscopic illumination tester includes an integrating sphere that is removably interlockable with the optical bridge. The endoscopic illumination tester may further engage a lightguide connectable between the optical bridge and the lightsource. An endoscope may be inserted between the optical bridge and the integrating sphere. | 09-18-2008 |
Peter Biolsi, New Windsor, NY US
Patent application number | Description | Published |
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20090017632 | METHODS OF MANUFACTURING SEMICONDUCTOR STRUCTURES USING RIE PROCESS - A method for etching on a semiconductors at the back end of line using reactive ion etching. The method comprises reduced pressure atmosphere and a mixture of gases at a specific flow rate ratio during plasma generation and etching. Plasma generation is induced by a source radio frequency and anisotropic etch performance is induced by a second bias radio frequency. | 01-15-2009 |
20120253497 | Contact Processing Using Multi-Input/Multi-Output (MIMO) Models - The invention provides a systems and methods for creating Double Pattern (DP) structures on a patterned wafer in real-time using Dual Pattern Contact-Etch (DPCE) processing sequences and associated Contact-Etch-Multi-Input/Multi-Output (CE-MIMO) models. The DPCE processing sequences can include one or more contact-etch procedures, one or more measurement procedures, one or more contact-etch modeling procedures, and one or more contact-etch verification procedures. The CE-MIMO model uses dynamically interacting behavioral modeling between multiple layers and/or multiple contact-etch procedures. The multiple layers and/or the multiple contact-etch procedures can be associated with the creation of lines, trenches, vias, spacers, contacts, and gate structures that can be created during Double Patterning (DP) procedures. | 10-04-2012 |
Robert A. Biolsi, Bronx, NY US
Patent application number | Description | Published |
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20080319920 | Method And System For Determining Margin Requirements - The present invention provides for a system and method of applying value-at-risk determination of a financial portfolio to a performance bond requirement and comparing the value-at-risk determination with a traditional scenario-based performance bond requirement. | 12-25-2008 |
20110047096 | METHOD AND SYSTEM FOR DETERMINING MARGIN REQUIREMENTS - The present invention provides for a system and method of applying value-at-risk determination of a financial portfolio to a performance bond requirement and comparing the value-at-risk determination with a traditional scenario-based performance bond requirement. | 02-24-2011 |