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Bijkerk
Elise Bijkerk, Rotterdam NL
| Patent application number | Description | Published |
|---|---|---|
| 20090004342 | Temporally Meal Menu For Infants - The invention concerns a kit of parts and a method for providing nutrition which provides within a time period of 5 to 10 days a nutritional composition comprising 0.35 to 6 mg iron per 100 g, a nutritional composition comprising 1 to 10 g fibre per 100 g and a nutritional composition comprising 10 to 5000 mg long chain poly unsaturated fatty acids per 100 g to an infant. | 01-01-2009 |
Fred Bijkerk, Bosch En Duin NL
| Patent application number | Description | Published |
|---|---|---|
| 20100027107 | REFLECTIVE OPTICAL ELEMENT FOR EUV LITHOGRAPHY DEVICE - A reflective optical element exhibits an increase in the maximum reflectivity at operating wavelengths in the extreme ultraviolet or soft x-ray wavelength range. A first additional intermediate layer ( | 02-04-2010 |
Frederik Bijkerk, Amsterdam NL
| Patent application number | Description | Published |
|---|---|---|
| 20100171050 | METHOD FOR REGENERATING A SURFACE OF AN OPTICAL ELEMENT IN AN XUV RADIATION SOURCE, AND XUV RADIATION SOURCE - Method for regenerating a surface of an optical element in a radiation source for electromagnetic radiation with a wavelength in the extreme ultraviolet wavelength range, H (EUV, XUV) in particular with a wavelength in the wavelength range between 10 nm and 15 nm, this radiation source comprising at least a chamber for arranging therein a plasma generating XUV or EUV radiation and the optical element, in particular a collector for bundling XUV or EUV radiation generated by the plasma and causing it to exit the chamber, according to which method a first Si, C or metal compound is arranged in the chamber which reacts in an equilibrium reaction with the material of the surface of the collector to form respectively a second Si, C or metal compound bonded to this surface, and XUV or EUV radiation source adapted for such a method. | 07-08-2010 |
Frederik Bijkerk, Bosch En Duin NL
| Patent application number | Description | Published |
|---|---|---|
| 20110194087 | REFLECTIVE OPTICAL ELEMENT AND METHOD OF MANUFACTURING THE SAME - A reflective optical element e.g. for use in EUV lithography, configured for an operating wavelength in the soft X-ray or extreme ultraviolet wavelength range, includes a multilayer system ( | 08-11-2011 |