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Bieg

Hermann Bieg, Huettlingen DE

Patent application numberDescriptionPublished
20080315134OPTICAL SYSTEM FOR RADIATION IN THE EUV-WAVELENGTH RANGE AND METHOD FOR MEASURING A CONTAMINATION STATUS OF EUV-REFLECTIVE ELEMENTS - An optical system for radiation in the EUV wavelength range, in particular a projection exposure apparatus, having at least one vacuum vessel, including: at least one EUV-reflective optical element arranged in an optical path, and a holder which includes at least one sample element, the sample element having an optical surface which is exposed to incident EUV-radiation outside of the optical path, the sample element being sensitive to chemical alterations under influence of the incident EUV-radiation which also affect the optical element. The optical system further includes at least one detection unit for online detection of the contamination status of the sample element during exposure of the sample element to the incident EUV-radiation.12-25-2008
20100066990IMAGING DEVICE WITH EXCHANGEABLE DIAPHRAGMS AND METHOD THEREFOR - The disclosure concerns a method for exchangeable introduction and/or exchange of diaphragms in an imaging device, such as an EUV projection exposure system for microlithography or a corresponding imaging device with a housing and at least one diaphragm, which is accommodated exchangeably in the housing and at least one transfer device with at least one receptacle, on or at which the diaphragm can be detachably arranged in order that it may be moved in or out of the objective space. At least one receptacle of the transfer device, on or at which the diaphragm can be detachably arranged, is an element of the diaphragm mount for positioning the diaphragm in the housing.03-18-2010
20100134777DIAPHRAGM CHANGING DEVICE - The invention relates to an optical imaging device, in particular an objective 06-03-2010
20100271607OPTICAL ASSEMBLY - An optical assembly supported in an arrangement, especially in an objective or in an illuminating or exposure system, in the interior of a housing comprising at least one optical element, especially a lens, a mirror, or an aperture, wherein the at least one element is influenceable by at least one manipulator is characterized in that the at least one manipulator is arranged either outside of the housing or in a holding means that is separated entirely or to a large extent by the help of a decoupling means, and that there is provided an effective coupling between the manipulator and the element to be influenced by the manipulator in the interior of the arrangement.10-28-2010
20110063595OPTICAL APERTURE DEVICE - An optical module includes an aperture device and a support structure supporting the aperture device. The aperture device defines an aperture edge and an aperture plane. The aperture edge is adapted to define a geometry of a light beam passing the aperture device along an optical axis. The support structure is adapted to hold the aperture device in a defined manner when the aperture plane is inclined with respect to a horizontal plane. A temperature distribution prevails within the aperture device and at least one of the aperture device and the support structure is adapted to maintain at least one of a relative position of the aperture edge with respect to the optical axis and a geometry of the aperture edge substantially unaltered upon an introduction of a thermal energy into the aperture device, where the thermal energy being adapted to cause an alteration in the temperature distribution.03-17-2011
20110181857OPTICAL ASSEMBLY - An optical assembly supported in an arrangement, especially in an objective or in an illuminating or exposure system, in the interior of a housing comprising at least one optical element, especially a lens, a mirror, or an aperture, wherein the at least one element is influenceable by at least one manipulator is characterized in that the at least one manipulator is arranged either outside of the housing or in a holding means that is separated entirely or to a large extent by the help of a decoupling means, and that there is provided an effective coupling between the manipulator and the element to be influenced by the manipulator in the interior of the arrangement.07-28-2011
20120075611DIAPHRAGM CHANGING DEVICE - The invention relates to an optical imaging device, in particular an objective 03-29-2012

Patent applications by Hermann Bieg, Huettlingen DE

Hermann Bieg, Aalen DE

Patent application numberDescriptionPublished
20090021820Optical Imaging Device Having At Least One System Diaphragm - An optical imaging device (PL), in particular an objective for semiconductor lithography, is provided with at least one system diaphragm. The system diaphragm comprises a multiplicity of mobile plates, which are rotatably mounted. The plates have a spherical curvature.01-22-2009

Joerg Bieg, St. Georgen DE

Patent application numberDescriptionPublished
20120126035AUSTRAGVORRICHTUNG FUER FLUESSIGE MEDIEN - Discharging unit for discharging pharmaceutical media from a medium storage receptacle, including a first discharge orifice, a pump, an inlet duct connecting the medium storage receptacle to the pump, and an outlet duct for connecting the pump to the first discharge orifice.05-24-2012

Lothar Franz Bieg, Albuquerque, NM US

Patent application numberDescriptionPublished
20120063057Methods and apparatus related to a purge valve for a capacitor - In some embodiments, an apparatus includes a housing and a purge valve. The housing defines a cavity and a lumen extending from a volume of the cavity to a volume outside the cavity. The purge valve is disposed within the lumen and includes an occlusion member. A portion of the occlusion member has a width substantially equal to a width of an end portion of the lumen such that the portion of the occlusion member is disposed within the end portion of the lumen when the purge valve is in a first configuration. The portion of the occlusion member being disposed outside the end portion of the lumen when the purge valve is in a second configuration.03-15-2012

Wilfried Bieg, Eschach DE

Patent application numberDescriptionPublished
20090261567Belt Tensioner for a Seatbelt System - A belt tensioner for a safety belt system includes a pinion (10-22-2009

Patent applications by Wilfried Bieg, Eschach DE