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| 20110229830 | Inspection Method For Lithography - The present invention relates to an inspection apparatus and method which include projecting a measurement radiation beam onto a target on a substrate in order to measure the radiation reflected from the target and obtain information related to properties of the substrate. In the present embodiments, the measurement spot, which is the focused beam on the substrate, is larger than the target. Information regarding the radiation reflected from the target is kept and information regarding the radiation reflected from the surface around the target is eliminated. This is done either by having no reflecting (or no specularly reflecting) surfaces around the target or by having known structures around the target, the information from which may be recognized and removed from the total reflected beam. The reflected beam is measured in the pupil plane of the projector such that the information obtained is related to diffraction orders of the reflected beam and profile, critical dimension or overlay of structures on the substrate may be determined. | 09-22-2011 |
| 20120013881 | Method and Apparatus for Determining an Overlay Error - A method of determining an overlay error. Measuring an overlay target having process-induced asymmetry. Constructing a model of the target. Modifying the model, e.g., by moving one of the structures to compensate for the asymmetry. Calculating an asymmetry-induced overlay error using the modified model. Determining an overlay error in a production target by subtracting the asymmetry-induced overlay error from a measured overlay error. In one example, the model is modified by varying asymmetry p | 01-19-2012 |
| 20120044470 | Substrate for Use in Metrology, Metrology Method and Device Manufacturing Method - A pattern from a patterning device is applied to a substrate. The applied pattern includes device functional areas and metrology target areas. Each metrology target area comprises a plurality of individual grating portions, which are used for diffraction based overlay measurements or other diffraction based measurements. The gratings are of the small target type, which is small than an illumination spot used in the metrology. Each grating has an aspect ratio substantially greater than 1, meaning that a length in a direction perpendicular to the grating lines which is substantially greater than a width of the grating. Total target area can be reduced without loss of performance in the diffraction based metrology. A composite target can comprise a plurality of individual grating portions of different overlay biases. Using integer aspect ratios such as 2:1 or 4:1, grating portions of different directions can be packed efficiently into rectangular composite target areas. | 02-23-2012 |
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| 20090246529 | Particle with Bipolar Topospecific Characteristics and Process for Preparation Thereof - A particle with bipolar topospecific characteristics, whose precursor is an asymmetric 1:1 or 2:1:1 clay particle having alternating tetrahedral and octahedral sheets terminating with a tetrahedral sheet at one external surface plane and an octahedral sheet at another external surface plane, wherein a chemical group, having greater than 3 carbon atoms, and selected from an organyl or an organoheteryl chemical group, is attached to coordinating cations on the exterior side of one of the surface sheets. | 10-01-2009 |
| 20110021799 | PARTICLE WITH BIPOLAR TOPOSPECIFIC CHARACTERISTICS AND PROCESS FOR PREPARATION THEREOF - This invention relates to particles with bipolar topospecific characteristics and process of preparation thereof. It is an object of the present invention is to provide a particle with bipolar topospecific characteristics with two spatially distinct regions on its surface having non-identical surface characteristics. It has been found that particles prepared by topospecific treatment of an asymmetric clay precursor with an organyl or an organoheteryl group attached to coordinating cations of one of the surface sheets, provides a particle with bipolar topospecific characteristics with two spatially distinct regions on its surface having non-identical surface characteristics. | 01-27-2011 |
| 20120094883 | PERSONAL CLEANSING COMPOSITION - This invention relates to a liquid or soft-solid personal cleansing composition that utilises the detergency properties of new materials which are more efficient, more inexpensive and are an environmentally friendly alternative to conventional soaps or synthetic surfactants. It more particularly relates to a cleansing composition in liquid, gel or cream formats. The present invention provides for a personal cleansing composition comprising (i) 1 to 50% of treated clay particles; and (ii) a cosmetically acceptable base; wherein said treated clay particles are asymmetric 1:1 or 2:1:1 clay particles having alternating tetrahedral and octahedral sheets terminating with a tetrahedral sheet at one external surface plane and an octahedral sheet at another external surface plane, with a fatty acid of carbon chain length 10 to 22 attached to coordinating cation on one of said exterior surface planes. | 04-19-2012 |
