Patent application number | Description | Published |
20110066473 | SYSTEM AND METHOD OF ONGOING EVALUATION REPORTING AND ANALYSIS - A research and development system that gathers feedback from patients and healthcare providers with respect to the their experience with various aspects of a supplier's products in order to tabulate, consolidate, compare and analyze the data received rapidly and efficiently, and which can be used on successive iterations to determine future products and services. | 03-17-2011 |
20120130737 | SYSTEM AND METHOD FOR DISTRUBUTOR REPORTING AND ANALYSIS - In various embodiments, a research and development system that gathers feedback from patients and healthcare providers with respect to the their experience with various aspects of a supplier's products in order to tabulate, consolidate, compare and analyze the data received rapidly and efficiently, and which can be used on successive iterations to determine future products and services. | 05-24-2012 |
20150196640 | PROGESTERONE FORMULATIONS HAVING A DESIRABLE PK PROFILE - This disclosure provides progesterone formulations, methods of using these formulations, and their related pharmacokinetic parameters. In particular embodiments, the formulations disclosed herein allow for a reduction in the amount of progesterone administered to a patient in need thereof, while still providing the benefits of a larger dosage amount. | 07-16-2015 |
20150202211 | PROGESTERONE FORMULATIONS HAVING A DESIRABLE PK PROFILE - This disclosure provides progesterone formulations, methods of using these formulations, and their related pharmacokinetic parameters. In particular embodiments, the formulations disclosed herein allow for a reduction in the amount of progesterone administered to a patient in need thereof, while still providing the benefits of a larger dosage amount. | 07-23-2015 |
Patent application number | Description | Published |
20090260983 | Cylindrical Magnetron - A rotatable cylindrical magnetron sputtering device that includes a cathode body defining a magnet receiving chamber and a cylindrical target assembly surrounding the cathode body, wherein the cylindrical target assembly is rotatable around the cathode body. The cylindrical target assembly includes a hollow mandrel and a target portion mounted around and spaced away from the hollow mandrel portion so as to create a space gap between the hollow mandrel and the target portion, wherein the space gap may be greater than 0.002 inch and less than 0.020 inch. | 10-22-2009 |
20090314631 | Magnetron With Electromagnets And Permanent Magnets - A magnet assembly for a magnetron sputtering device having circular, linear or other types of planar targets including two permanent magnets and an electromagnet, e.g., electromagnetic coil between the permanent magnets associated with a sputtering target of a target assembly. An electrical control circuit is arranged to selectively adjust at least the current level and the direction of current to the electromagnet to alter the magnetic fields of the magnet assembly thereby encompassing the entire portions of the sputtering target, including the extreme inner and outer portions of the sputtering target to optimize the target uniformity and the sputtered film uniformity on a substrate. Methods for operating the magnet assembly of the magnetron sputtering devices, for optimizing the target utilization and sputtered film uniformity on a substrate, and for operating the magnetron sputtering process in a reactive gas environment to form an insulating or dielectric thin film are also provided. | 12-24-2009 |
20110186427 | Cylindrical Magnetron Having a Shunt - A magnetron sputtering electrode for use in a rotatable cylindrical magnetron sputtering device, the electrode including a cathode body defining a magnet receiving chamber and a cylindrical target surrounding the cathode body. The target is rotatable about the cathode body A magnet arrangement is received within the magnet receiving chamber, the magnet arrangement including a plurality of magnets. A shunt is secured to the cathode body and proximate to a side of the magnet arrangement, the shunt extending in a plane substantially parallel to the side of the magnet arrangement. A method of fine-tuning a magnetron sputtering electrode in a rotatable cylindrical magnetron sputtering device is also disclosed. | 08-04-2011 |
20150194294 | Method of Fine Tuning a Magnetron Sputtering Electrode in a Rotatable Cylindrical Magnetron Sputtering Device - A magnetron sputtering electrode for use in a rotatable cylindrical magnetron sputtering device, the electrode including a cathode body defining a magnet receiving chamber and a cylindrical target surrounding the cathode body. The target is rotatable about the cathode body. A magnet arrangement is received within the magnet receiving chamber, the magnet arrangement including a plurality of magnets. A shunt is secured to the cathode body and proximate to a side of the magnet arrangement, the shunt extending in a plane substantially parallel to the side of the magnet arrangement. A method of fine-tuning a magnetron sputtering electrode in a rotatable cylindrical magnetron sputtering device is also disclosed. | 07-09-2015 |