| Patent application number | Description | Published |
|---|
| 20080241479 | Antifouling Material and Production Method thereof - The subject of the invention is the use of a material composed of a substrate equipped with a coating based on titanium oxide surmounted by a thin hydrophilic layer forming at least one part of the outer surface of said material and that is not composed of titanium oxide, as a material that prevents the deposition of mineral soiling on said outer surface in the absence of water runoff. | 10-02-2008 |
| 20100059365 | PROCESS FOR MANUFACTURING A MASK HAVING SUBMILLIMETRIC OPENINGS FOR PRODUCING A SUBMILLIMETRIC GRID, AND SUBMILLIMETRIC GRID - A process for manufacturing a mask having submillimetric openings on a surface portion of a substrate, characterized in that:
| 03-11-2010 |
| 20100209673 | PROCESS FOR TEXTURING THE SURFACE OF A SUBSTRATE HAVING A GLASS FUNCTION, AND GLASS PRODUCT HAVING A TEXTURED SURFACE - Surface texturing process, i.e. one for the formation of at least one array of features with a characteristic dimension on at least one surface portion of a substrate having a glass function, characterized in that a solution containing at least one precursor of a material to be deposited is dissociated, at atmospheric pressure, within a flame, said flame being directed toward said surface portion so as to deposit, in the form of a plurality of nodules based on said material, a mask, said mask of said material being subjected to an etching step. | 08-19-2010 |
| 20100313936 | GLASS SUBSTRATE COATED WITH LAYERS HAVING AN IMPROVED MECHANICAL STRENGTH - The invention relates to
| 12-16-2010 |
| 20110102926 | MIRROR AND PROCESS FOR OBTAINING A MIRROR - The subject of the invention is a mirror, especially a front-face mirror and/or a mirror for concentrating solar energy, comprising a material, which mirror comprises a substrate coated with a multilayer comprising at least one silver layer and at least one protective layer located on top of said at least one silver layer, at least one protective layer being characterized in that at least one of its physicochemical characteristics varies with the distance from the substrate. | 05-05-2011 |
| 20110240343 | METHOD FOR MANUFACTURING A MASK HAVING SUBMILLIMETRIC APERTURES FOR A SUBMILLIMETRIC ELECTRICALLY CONDUCTIVE GRID, MASK HAVING SUBMILLIMETRIC APERTURES AND SUBMILLIMETRIC ELECTRICALLY CONDUCTIVE GRID - A process for manufacturing a mask having submillimetric openings, in which: for a masking layer, a solution of colloidal nanoparticles that are stabilized and dispersed in a first solvent is deposited, the particles having a given glass transition temperature T | 10-06-2011 |
| 20110247859 | METHOD FOR MANUFACTURING A SUBMILLIMETRIC ELECTRICALLY CONDUCTIVE GRID, AND SUBMILLIMETRIC ELECTRICALLY CONDUCTIVE GRID - The manufacture of a submillimetric grid includes the production of a mask having submillimetric openings, referred to as a network mask, on the main face, from a solution of colloidal nanoparticles with a given glass transition temperature T | 10-13-2011 |
| 20110248219 | METHOD FOR MANUFACTURING A SUBMILLIMETRIC ELECTRICALLY CONDUCTIVE GRID COATED WITH AN OVERGRID, AND SUBMILLIMETRIC ELECTRICALLY CONDUCTIVE GRID COATED WITH AN OVERGRID - A method of manufacturing a submillimetric electroconductive grid coated with an overgrid on a substrate includes: the production of a mask having submillimetric openings by the deposition of a solution of colloidal polymeric nanoparticles that are stabilized and dispersed in a solvent, the polymeric particles having a glass transition temperature T | 10-13-2011 |
| 20110250387 | METHOD FOR MANUFACTURING A MASK HAVING SUBMILLIMETRIC APERTURES FOR A SUBMILLIMETRIC ELECTRICALLY CONDUCTIVE GRID, AND MASK AND SUBMILLIMETRIC ELECTRICALLY CONDUCTIVE GRID - A process for manufacturing a mask having submillimetric openings, in which: for a masking layer, a first solution of colloidal nanoparticles in a first solvent is deposited, the particles having a given glass transition temperature T | 10-13-2011 |
