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Beppu, Tokyo

Masaaki Beppu, Tokyo JP

Patent application numberDescriptionPublished
20100163138METHOD FOR QUENCHING OF STEEL MEMBER, QUENCHED STEEL MEMBER, AND AGENT FOR PROTECTING QUENCHED SURFACE - A technique for increasing mechanical strength, such as contact pressure strength, and abrasion resistance and bending fatigue strength, of mechanical and/or structural parts by using surface hardening treatment. A quenched steel member, wherein a hard nitride layer is formed on the surface of a steel material, and an inorganic compound layer containing at least one metal oxide selected from the group consisting of Ti, Zr, Hf, V, Nb, Ta, Cr, W, Mo and Al is formed on the hard nitride layer.07-01-2010

Shiori Beppu, Tokyo JP

Patent application numberDescriptionPublished
20080249271Adhesive containing ladder-type polysilsesquioxane and adhesive sheet - An adhesive containing a ladder-type polysilsesquioxane which firmly bonds metals and synthetic resins and an adhesive sheet having an adhesive layer formed by using the adhesive on at least one side of a substrate are provided. An adhesive comprises a ladder-type polysilsesquioxane having a recurring unit of the following formula (I) in the molecule,10-09-2008
20100112262RELEASE SHEET AND PRESSURE-SENSITIVE ADHESIVE - A release sheet is provided. The release sheet comprises: a base material having one surface and the other surface; and a release agent layer provided on the one surface of the base material. The release agent layer contains substantially no silicone compound and is constituted of a polymer material containing a polyolefine-based thermoplastic elastomer of which density is in the range of 0.80 to 0.90 g/cm05-06-2010
20100215881DOUBLE-FACED PRESSURE-SENSITIVE ADHESIVE SHEET USED FOR ELECTRONIC COMPONENTS AND PRODUCING METHOD THEREOF - A double-faced pressure-sensitive adhesive sheet used for electronic components is provided. The double-faced pressure-sensitive adhesive sheet comprises a pressure-sensitive adhesive layer; a first release sheet including at least a first release agent layer attached to one surface of the pressure-sensitive adhesive layer; and a second release sheet including at least a second release agent layer attached to the other surface of the pressure-sensitive adhesive layer. The first release agent layer is mainly constituted of an olefin-based resin and the second release agent layer is mainly constituted of a diene-based polymer material. When an peeling force of the first release sheet with respect to the pressure-sensitive adhesive layer is defined as “X” [mN/20 mm] and an peeling force of the second release sheet with respect to the pressure-sensitive adhesive layer is defined as “Y” [mN/20 mm], the following relation is satisfied: Y−X≧50. The pressure-sensitive adhesive layer, the first release agent layer and the second release layer contain substantially no silicone compound and substantially no halogen compound.08-26-2010

Yasuyuki Beppu, Tokyo JP

Patent application numberDescriptionPublished
20100325251COMPUTER LINK METHOD AND COMPUTER SYSTEM - A computer system includes: a load information exchanging unit that exchanges load information on a regular basis to find a problem in a load distribution server on the other end of a link; a problem information communicating unit that transmits the information about the problem to a directory server (12-23-2010

Yoshihisa Beppu, Tokyo JP

Patent application numberDescriptionPublished
20100159246PROCESS FOR PRODUCING OXIDE CRYSTAL FINE PARTICLES - To provide a process for producing fine particles of crystalline oxide which have high crystallinity, are excellent in uniformity of the composition and particle diameter, and have a small particle diameter, and such fine particles of crystalline oxide.06-24-2010
20100248593POLISHING SLURRY, PROCESS FOR PRODUCING THE SAME, POLISHING METHOD AND PROCESS FOR PRODUCING GLASS SUBSTRATE FOR MAGNETIC DISK - The present invention provides a process for producing a polishing slurry, which achieves high-speed polishing of a principal plane of a glass substrate even when ceria crystal fine particles or ceria-zirconia solid solution crystal fine particles are employed.09-30-2010
20100298127CERIA-ZIRCONIA SOLID SOLUTION CRYSTAL FINE PARTICLES AND THEIR PRODUCTION PROCESS - To provide a process for producing ceria-zirconia solid solution crystal fine particles having high crystallinity, being excellent in uniformity of composition and particle size, having a small particle size and a high specific surface area and being excellent in heat resistance, and such solid solution crystal fine particles.11-25-2010