| Patent application number | Description | Published |
|---|
| 20080273183 | Image sensor, lithographic apparatus comprising an image sensor and use of an image sensor in a lithographic apparatus - The invention relates to an image sensor for detection of an aerial image formed by a beam of radiation in a lithographic projection apparatus for exposing a pattern onto a substrate held in a substrate plane by a substrate holder. The image sensor has an image detector and a lens. The lens is arranged to project at least part of the aerial image onto the image detector. The image sensor is positioned such within the substrate holder that the lens is positioned proximate the substrate plane. | 11-06-2008 |
| 20080315121 | Radiation detector, method of manufacturing a radiation detector and lithographic apparatus comprising a radiation detector - The invention relates to a radiation detector, a method of manufacturing a radiation detector and a lithographic apparatus comprising a radiation detector. The radiation detector has a radiation-sensitive surface. The radiation-sensitive surface is sensitive for radiation with a wavelength between 10-200 nm. The radiation detector has a silicon substrate, a dopant layer, a first electrode and a second electrode. The silicon substrate is provided in a surface area at a first surface side with doping profile of a certain conduction type. The dopant layer is provided on the first surface side of the silicon substrate. The dopant layer has a first layer of dopant material and a second layer. The second layer is a diffusion layer which is in contact with the surface area at the first surface side of the silicon substrate. The first electrode is connected to dopant layer. The second electrode is connected to the Silicon substrate. | 12-25-2008 |
| 20090002656 | Device and method for transmission image detection, lithographic apparatus and mask for use in a lithographic apparatus - A device is provided for transmission image detection of an aerial image formed in a lithographic projection apparatus. The device has a structure provided with an object mark, an projection system and a detector. The object mark is arranged to form a object mark pattern upon illumination by radiation with a predetermined wavelength. The projection system is arranged to form an object mark aerial image of the object mark pattern at an image side of the projection system, where the image side has a numerical aperture larger than 1. The detector has a slit pattern and a photo-sensitive device. The slit pattern is positioned in a plane proximate to image plane of the projection system. The device can be configured to satisfy the following condition: | 01-01-2009 |
| 20090002710 | Device and method for transmission image sensing - A device for transmission image sensing for sensing an aerial image in a lithographic exposure apparatus comprises a projection system arranged to form, at an image side of the projection system, an aerial image of an object mark. The device further comprises a detector comprising a slit pattern having features corresponding to at least a part of the aerial image. The slit pattern is arranged to be exposed to the aerial image. The detector is further being arranged to detect detection radiation transmitted by the slit pattern; wherein d<0.85·NA/λ, where d represents the dimension of the smallest feature of the slit pattern, λ represents the intended wavelength of the detection radiation, and NA, which is larger than 1, represents the numerical aperture of the image side. | 01-01-2009 |
| 20090021717 | Radiation Detector, Method of Manufacturing a Radiation Detector, and Lithographic Apparatus Comprising a Radiation Detector - A radiation detector, a method of manufacturing a radiation detector, and a lithographic apparatus comprising a radiation detector. The radiation detector has a radiation sensitive surface. The radiation sensitive surface is sensitive to radiation wavelengths between 10-200 nm and charged particles. The radiation detector has a silicon substrate, a dopant layer, a first electrode, and a second electrode. The silicon substrate is provided in a surface area at a first surface side with doping profile of a certain conduction type. The dopant layer is provided on the first surface side of the silicon substrate. The dopant layer has a first layer of dopant material and a second layer. The second layer is a diffusion layer in contact with the surface area at the first surface side of the silicon substrate. The first electrode is connected to dopant layer. The second electrode is connected to the silicon substrate. | 01-22-2009 |
| 20100091260 | LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - A method and apparatus make use of data representing changes in wavelength of a radiation source to provide control of focal plane position or to provide correction of sensor data. In the first aspect, the wavelength variation data is provided to control systems that control focus by moving apparatus components including, for example, the mask table, the substrate table or optical elements of the projection optical system. In the second aspect, variation data is used in correcting, e.g., focal plane position data measured by an inboard sensor, such as a transmitted image sensor. The two aspects may be combined in a single apparatus or may be used separately. | 04-15-2010 |
| 20100141920 | Device and Method for Transmission Image Sensing - A device for transmission image sensing for sensing an aerial image in a lithographic exposure apparatus comprises a projection system arranged to form, at an image side of the projection system, an aerial image of an object mark. The device further comprises a detector comprising a slit pattern having features corresponding to at least a part of the aerial image. The slit pattern is arranged to be exposed to the aerial image. The detector is further being arranged to detect detection radiation transmitted by the slit pattern; wherein d<0.85 λ/NA, where d represents the dimension of the smallest feature of the slit pattern, λ represents the intended wavelength of the detection radiation, and NA, which is larger than 1, represents the numerical aperture of the image side. | 06-10-2010 |
| 20100157271 | LITHOGRAPHIC APPARATUS AND METHOD OF IRRADIATING AT LEAST TWO TARGET PORTIONS - A lithographic apparatus is disclosed that includes a table, at least two target portions on the table or on an object on the table, and a surface material between the at least two target portions. The apparatus further includes an optical system configured to project a beam of radiation, along an optical path towards the table, with a cross-section to irradiate the at least two target portions at the same time. The apparatus further includes a shield moveable into the optical path to restrict the cross-section of the beam of radiation to restrict illumination between the at least two target portions, wherein the surface material between the at least two target portions would degrade when irradiated with radiation from the optical system. | 06-24-2010 |
| 20100195071 | Image Sensor, Method for Image Detection and Computer Program Product - The invention relates to an image for detection of an aerial pattern comprising spatial differences in radiation intensity in a cross section of a beam of radiation in a lithographic apparatus for exposing a substrate. The image sensor comprises a lens ( | 08-05-2010 |
| 20110090476 | LITHOGRAPHIC APPARATUS, DEVICE MANUFACTURING METHOD, AND METHOD OF APPLYING A PATTERN TO A SUBSTRATE - A lithographic apparatus includes at least one image alignment sensor for receiving radiation projected from an alignment mark on a reticle. Processor processes signals from the sensor(s) to resolve spatial information in the projected alignment mark to establish a reference for measuring positional relationships between a substrate support and the patterning location. Examples of the sensor include line arrays of photodetectors. A single array can resolve spatial information in a plane of the sensor (X, Y direction) and in a perpendicular (Z) direction. At least a final step in establishing the reference position is performed while holding the substrate support stationary. Errors and delays induced by mechanical scanning of prior art sensors are avoided. Alternatively (not illustrated) the sensor is moved for mechanical scanning relative to the substrate support, independently of the main positioning systems. | 04-21-2011 |
