| Patent application number | Description | Published |
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| 20090233043 | WATER-RESPONSIVE MECHANICAL ELEMENT AND A METHOD FOR MANUFACTURING SUCH AN ELEMENT - This invention relates to flexible structures ( | 09-17-2009 |
| 20090233181 | POROUS HOLOGRAPHIC FILM - The present invention relates to a method for the manufacture of a holographic film. The method includes a polymerizable composition that comprises monomers with high reactivity, monomers with low reactivity and a non-reactive material. The method comprises a patterned exposure to obtain a patterned polymerization of the monomers with high reactivity and a subsequent polymerization to polymerize also monomers with low reactivity to form a solid film. The method gives a holographic film with a high refractive index modulation and a modulated porosity. | 09-17-2009 |
| 20100028816 | PROCESS FOR PREPARING A POLYMERIC RELIEF STRUCTURE - The invention relates to a process for the preparation of a polymeric relief structure comprising the steps of coating a substrate with a coating composition comprising one or more radiation-sensitive ingredients, locally treating the coated substrate with electromagnetic radiation having a periodic or random radiation-intensity pattern, forming a latent image, and polymerizing and/or crosslinking the resulting coated substrate, wherein the coating composition comprises one or more radical scavengers in an amount sufficient to inhibit/retard substantial polymerization in the non-treated areas of the coated substrate, and low enough to allow polymerization and/or crosslinking in the treated areas in step c, with the proviso that the amount of oxygen present in the coating composition is not equal to the equilibrium amount of oxygen present when the coating composition is in contact with air. | 02-04-2010 |
| 20100279074 | PROCESS FOR PREPARING A POLYMERIC RELIEF STRUCTURE - The invention relates to a process for the preparation of a polymeric relief structure comprising the steps of coating a substrate with a coating composition comprising one or more radiation-sensitive ingredients, locally treating the coated substrate with electromagnetic radiation having a periodic or random radiation-intensity pattern, forming a latent image, and polymerizing and/or crosslinking the resulting coated substrate, wherein the coating composition comprises one or more RAFT agents. | 11-04-2010 |
| 20110104445 | PROCESS FOR PREPARING A POLYMERIC RELIEF STRUCTURE - The invention relates to a photo-embossing process for the preparation of a polymeric relief structure comprising the steps of: a) coating a substrate with a coating composition comprising one or more radiation-sensitive ingredients and less than 30 wt % polymeric binder material; b) locally treating the coated substrate with electromagnetic radiation having a periodic, non-periodic or random radiation-intensity pattern, forming a latent image, at a temperature below a transition temperature of the coating composition; and c) polymerizing and/or crosslinking the resulting coated substrate, at a temperature above said transition temperature, wherein the transition temperature is a temperature that defines a transition of the coating composition between a state of high viscosity and low viscosity and wherein the coating composition comprises a compound A comprising at least one radiation curable group and a photoinitiator, the coating composition having a transition temperature between 30° C. and 120° C. | 05-05-2011 |
| Patent application number | Description | Published |
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| 20080220288 | Light-Emitting Device, And Method For The Manufacture Thereof - A light-emitting device comprising an anode; a cathode; a light-emitting layer arranged between said anode and said cathode; and a buffer layer, comprising a conducting polymer and a polymeric acid, arranged between said anode and said light-emitting layer, is disclosed. Acidic groups of said polymeric acid have been converted to non-acidic groups in at least a part of said buffer layer, which minimises acid quenching of photoluminescence. A method for manufacturing such a device is also disclosed. | 09-11-2008 |
| 20080269461 | Polymeric Carbazole Compounds - A polymeric carbazole compound comprising a monomer unit of formula (I): is disclosed, wherein x and y are equal to zero or 1, and n is an integer equal to or larger than zero. P represents a phenyl group, and C | 10-30-2008 |
| 20090242876 | CARBAZOLE COMPOUNDS - The present invention relates to carbazole compounds of formula (I) and a semiconducting material comprising such carbazole compounds. It also relates to a process for the preparation of such carbazole compounds, as well as to the use thereof as a semiconducting material, in particular as a host matrix for phosphorescent emitters. | 10-01-2009 |
