Patent application number | Description | Published |
20090072168 | Radical cleaning arrangement for a lithographic apparatus - A cleaning arrangement is configured to clean an EUV optic of an EUV lithographic apparatus. The partial radical pressure ranges between 0.1-10 Pa. The cleaning arrangement can be configured inside a cleaning cocoon of the lithographic apparatus for offline cleaning. It can also be configured at particular positions inside the apparatus to clean nearby optics during production. In the pressure range of 0.1-10 Pa the penetration of atomic hydrogen into the optical devices is high, while the recombination to molecular hydrogen and hydrogen consumption is limited. | 03-19-2009 |
20090173360 | Lithographic Apparatus, and Device Manufacturing Method - A lithographic apparatus configured to project a patterned beam of radiation onto a target portion of a substrate is disclosed. The apparatus includes a first radiation dose detector and a second radiation dose detector, each detector comprising a secondary electron emission surface configured to receive a radiation flux and to emit secondary electrons due to the receipt of the radiation flux, the first radiation dose detector located upstream with respect to the second radiation dose detector viewed with respect to a direction of radiation transmission, and a meter, connected to each detector, to detect a current or voltage resulting from the secondary electron emission from the respective electron emission surface. | 07-09-2009 |
20090231707 | OPTICAL ARRANGEMENT, IN PARTICULAR PROJECTION EXPOSURE APPARATUS FOR EUV LITHOGRAPHY, AS WELL AS REFLECTIVE OPTICAL ELEMENT WITH REDUCED CONTAMINATION - An optical arrangement, in particular a projection exposure apparatus ( | 09-17-2009 |
20090314931 | METHOD FOR REMOVING CONTAMINATION ON OPTICAL SURFACES AND OPTICAL ARRANGEMENT - A method and an optical arrangement for removing contamination on optical surfaces ( | 12-24-2009 |
20100288302 | Method for removing a contamination layer from an optical surface and arrangement therefor as well as a method for generating a cleaning gas and arrangement therefor - The invention is directed to a method for at least partially removing a contamination layer ( | 11-18-2010 |
20110037961 | LITHOGRAPHIC APPARATUS COMPRISING AN INTERNAL SENSOR AND A MINI-REACTOR, AND METHOD FOR TREATING A SENSING SURFACE OF THE INTERNAL SENSOR - A lithographic apparatus includes a projection system constructed and arranged to project a beam of radiation onto a target portion of a substrate, an internal sensor having a sensing surface, and a mini-reactor movable with respect to the sensor. The mini-reactor includes an inlet for a hydrogen containing gas, a hydrogen radical generator, and an outlet for a hydrogen radical containing gas. The mini-reactor is constructed and arranged to create a local mini-environment comprising hydrogen radicals to treat the sensing surface. | 02-17-2011 |
20130148200 | OPTICAL ARRANGEMENT, IN PARTICULAR PROJECTION EXPOSURE APPARATUS FOR EUV LITHOGRAPHY, AS WELL AS REFLECTIVE OPTICAL ELEMENT WITH REDUCED CONTAMINATION - An optical arrangement, e.g. a projection exposure apparatus ( | 06-13-2013 |
20130186430 | METHOD FOR REMOVING A CONTAMINATION LAYER FROM AN OPTICAL SURFACE AND ARRANGEMENT THEREFOR - The invention is directed to a method for at least partially removing a contamination layer ( | 07-25-2013 |