| Patent application number | Description | Published |
|---|
| 20090216774 | VIRTUALIZATION OF METADATA FOR FILE OPTIMIZATION - Mechanisms are provided for optimizing files while allowing application servers access to metadata associated with preoptimized versions of the files. During file optimization involving compression and/or compaction, file metadata changes. In order to allow file optimization in a manner transparent to application servers, the metadata associated with preoptimized versions of the files is maintained in a metadata database as well as in an optimized version of the files themselves. | 08-27-2009 |
| 20090216788 | MULTIPLE FILE COMPACTION FOR NETWORK ATTACHED STORAGE - Mechanisms are provided for optimizing multiple files in an efficient format that allows maintenance of the original namespace. Multiple files and associated metadata are written to a suitcase file. The suitcase file includes index information for accessing compressed data associated with compacted files. A hardlink to the suitcase file includes an index number used to access the appropriate index information. A simulated link to a particular file maintains the name of the particular file prior to compaction. | 08-27-2009 |
| 20100094813 | REPRESENTING AND STORING AN OPTIMIZED FILE SYSTEM USING A SYSTEM OF SYMLINKS, HARDLINKS AND FILE ARCHIVES - A data de-duplication system is used with network attached storage and serves to reduce data duplication and file storage costs. Techniques utilizing both symlinks and hardlinks ensure efficient deletion file/data cleanup and avoid data loss in the event of crashes. | 04-15-2010 |
| 20110071989 | FILE AWARE BLOCK LEVEL DEDUPLICATION - A system provides file aware block level deduplication in a system having multiple clients connected to a storage subsystem over a network such as an Internet Protocol (IP) network. The system includes client components and storage subsystem components. Client components include a walker that traverses the namespace looking for files that meet the criteria for optimization, a file system daemon that rehydrates the files, and a filter driver that watches all operations going to the file system. Storage subsystem components include an optimizer resident on the nodes of the storage subsystem. The optimizer can use idle processor cycles to perform optimization. Sub-file compression can be performed at the storage subsystem. | 03-24-2011 |
| 20110125722 | METHODS AND APPARATUS FOR EFFICIENT COMPRESSION AND DEDUPLICATION - Mechanisms are provided for performing efficient compression and deduplication of data segments. Compression algorithms are learning algorithms that perform better when data segments are large. Deduplication algorithms, however, perform better when data segments are small, as more duplicate small segments are likely to exist. As an optimizer is processing and storing data segments, the optimizer applies the same compression context to compress multiple individual deduplicated data segments as though they are one segment. By compressing deduplicated data segments together within the same context, data reduction can be improved for both deduplication and compression. Mechanisms are applied to compensate for possible performance degradation. | 05-26-2011 |
| 20110270809 | HEAT INDICES FOR FILE SYSTEMS AND BLOCK STORAGE - Techniques and mechanisms are provided to allow for selective optimization, including deduplication and/or compression, of portions of files and data blocks. Data access is monitored to generate a heat index for identifying sections of files and volumes that are frequently and infrequently accessed. These frequently used portions may be left non-optimized to reduce or eliminate optimization I/O overhead. Infrequently accessed portions can be more aggressively optimized. | 11-03-2011 |
| 20110270810 | METHODS AND APPARATUS FOR ACTIVE OPTIMIZATION OF DATA - Techniques and mechanisms are provided to support live file optimization. Active I/O access to an optimization target is monitored during optimization. Active files need not be taken offline or made unavailable to an application during optimization and retain the ability to support file operations such as read, write, unlink, and truncate while an optimization engine performs deduplication and/or compression on active file ranges. | 11-03-2011 |
| 20120084270 | STORAGE OPTIMIZATION MANAGER - Techniques and mechanisms provide a storage optimization manager. Data may be optimized and maintained on various nodes in a cluster. Particular nodes may be overburdened while other nodes remain relatively unused. Techniques are provided to efficiently optimize data onto nodes to enhance operational efficiency. Data access requests for optimized data are monitored and managed to allow for intelligent maintenance of optimized data. | 04-05-2012 |
| 20120084527 | DATA BLOCK MIGRATION - Techniques and mechanisms are provided for migrating data blocks around a cluster during node addition and node deletion. Migration requires no downtime, as a newly added node is immediately operational while the data blocks are being moved. Blockmap files and deduplication dictionaries need not be updated. | 04-05-2012 |
| Patent application number | Description | Published |
|---|
| 20080315322 | METHOD FOR RELIABLY REMOVING EXCESS METAL DURING METAL SILICIDE FORMATION - A method for manufacturing a semiconductor device. The method comprises forming a metal layer on a silicon-containing layer located on a semiconductor substrate. The method also comprises reacting a portion of the metal layer with the silicon-containing layer to form a metal silicide layer. The method further comprises removing an unreacted portion of the metal layer on the metal silicide layer by a removal process. The removal process includes delivering a flow of an acidic solution to a surface of the unreacted portion of the metal layer, wherein the acidic solution delivered to the surface is substantially gas-free. | 12-25-2008 |
| 20090152600 | PROCESS FOR REMOVING ION-IMPLANTED PHOTORESIST - A method of manufacturing an IC that comprises fabricating a semiconductor device. Fabricating the device includes depositing a photoresist layer on a substrate surface and implanting one or more dopant species through openings in the photoresist layer into the substrate, and, into the photoresist layer, thereby forming an implanted photoresist layer. Fabricating the device also includes removing the implanted photoresist layer. Removing the implanted photoresist layer includes exposing the implanted photoresist layer to a mixture that includes sulfuric acid, hydrogen peroxide and ozone. The mixture is at a temperature of at least about 130°. | 06-18-2009 |
| 20100167552 | METHODS FOR PARTICLE REMOVAL DURING INTEGRATED CIRCUIT DEVICE FABRICATION - A method of manufacturing an IC device includes providing a workpiece having least one dielectric layer disposed on a surface of the workpiece. The method also includes processing the dielectric layer to form a plurality of apertures in the dielectric layer, where the processing includes at least one micromask-prone process. The method further includes subsequent to the processing step, cryogenically treating the workpiece. In the method, the treating step removes particles deposited on or in the plurality of apertures during the processing step and maintains the plurality of apertures, where the particles are generated from micromask features resulting from the micromask-prone process. | 07-01-2010 |
| 20110053372 | Low Temperature Surface Preparation for Removal of Organometallic Polymers in the Manufacture of Integrated Circuits - A method of removing photoresist from a surface during the manufacture of an integrated circuit. Organometallic polymers and monomers are formed during the etch of a hard mask material defining the locations of a metal-bearing film, such as tantalum nitride, when photoresist is used to mask the hard mask etch. These organometallic polymers and monomers as formed are not fully cross-linked. A liquid phase solution of sulfuric acid and hydrogen peroxide used to remove the photoresist also removes these not-fully-cross-linked organometallic polymers and monomers, thus preventing the formation of stubborn contaminants during subsequent high temperature processing. | 03-03-2011 |
