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Barsan
Florin Barsan, Pearland, TX US
| Patent application number | Description | Published |
|---|---|---|
| 20090163658 | Process for making low color polyvinyl alcohol - A process is provided for the manufacture of polyvinyl alcohol, having an APHA color of equal to or less than about 10, by polymerizing a vinyl acetate monomer to form polyvinyl acetate and then hydrolyzing the polyvinyl acetate to form polyvinyl alcohol wherein the vinyl acetate monomer is characterized as having an inhibitor level of equal to or less than about 10 ppm, preferably less than about 5 ppm, more preferably less than about 3 ppm, even more preferably less than about 1 ppm. | 06-25-2009 |
| 20110160418 | IMPROVED NVF COPOLYMER PROCESS - Disclosed herein is a water-soluble copolymer formed by copolymerizing N-vinylformamide and one or more vinyl C | 06-30-2011 |
Nicolae Barsan, Tuebingen DE
| Patent application number | Description | Published |
|---|---|---|
| 20090291024 | FORMATION OF HIGHLY POROUS GAS-SENSING LAYERS BY DEPOSITION OF NANOPARTICLES PRODUCED BY FLAME SPRAY PYROLYSIS - The invention relates to a method of producing a gas sensor comprising the steps of | 11-26-2009 |
Radu Barsan, Saratoga, CA US
| Patent application number | Description | Published |
|---|---|---|
| 20100303411 | DEVICE FABRICATION WITH PLANAR BRAGG GRATINGS SUPPRESSING PARASITIC EFFECTS - The present invention relates to various methods of fabricating Planar Bragg Gratings (PBG) in a doped waveguide in a Planar Lightwave Circuit (PLC) device, suppressing unwanted parasitic grating effects during fabrication of the device. One approach to reduce parasitic gratings is to use a hard mask before the waveguide photolithography and etch, that results in a steeper sidewall angle that reduces or eliminates the parasitic grating effect. Another method of reducing parasitic grating effect is to deposit a layer of developable Bottom Anti Reflective Coating (BARC) prior to depositing the photo resist for waveguide etch. A third method of resisting parasitic gratings comprises using a planarizing undoped silica layer as a barrier layer on top of the core. During subsequent high temperature annealing germanium outdiffuses laterally into the cladding. The net effect is an optical waveguide with improved lateral uniformity because germanium diffusion smoothes out the sidewall roughness created during the waveguide reactive ion etch process. The undoped silica (SiO2) layer on top of the grating also serves the purpose of significantly reducing germanium outdiffusion from the core in the upward direction. | 12-02-2010 |