Patent application number | Description | Published |
20090028683 | SUBSTRATE PROCESSING APPARATUS AND METHOD - Substrate processing methods and apparatus are disclosed. In some embodiments a substrate processing apparatus may comprise a support structure and a moveable stage including first and second stages. The moveable stage has one or more maglev units attached to the first stage and/or second stage proximate an edge of the first stage. The first stage retains one or more substrates and moves with respect to a first axis that is substantially fixed with respect to the second stage. The second stage translates along a second axis with respect to the support structure. In other embodiments, a primary motor may maintain a rotary stage at an angular speed and/or accelerate or decelerate the stage from a first angular speed to a second angular speed. A secondary motor may accelerate the stage from rest to the first angular speed and/or decelerate the stage from a non-zero angular speed. | 01-29-2009 |
20090135416 | Parametric Profiling Using Optical Spectroscopic Systems - A gallery of seed profiles is constructed and the initial parameter values associated with the profiles are selected using manufacturing process knowledge of semiconductor devices. Manufacturing process knowledge may also be used to select the best seed profile and the best set of initial parameter values as the starting point of an optimization process whereby data associated with parameter values of the profile predicted by a model is compared to measured data in order to arrive at values of the parameters. Film layers over or under the periodic structure may also be taken into account. Different radiation parameters such as the reflectivities R | 05-28-2009 |
20090190141 | SYSTEM FOR MEASURING A SAMPLE WITH A LAYER CONTAINING A PERIODIC DIFFRACTING STRUCTURE - To measure the critical dimensions and other parameters of a one- or two-dimensional diffracting structure of a film, the calculation may be simplified by first performing a measurement of the thickness of the film, employing a film model that does not vary the critical dimension or parameters related to other characteristics of the structure. The thickness of the film may be estimated using the film model sufficiently accurately so that such estimate may be employed to simplify the structure model for deriving the critical dimension and other parameters related to the two-dimensional diffracting structure. | 07-30-2009 |
20100091284 | APPARATUS AND METHODS FOR DETECTING OVERLAY ERRORS USING SCATTEROMETRY - Disclosed are techniques, apparatus, and targets for determining overlay error between two layers of a sample. A plurality of targets is provided. Each target includes a portion of the first and second structures and each is designed to have an offset between its first and second structure portions. The targets are illuminated with electromagnetic radiation to thereby obtain spectra from each target at a −1 | 04-15-2010 |
20110172952 | Apparatus and Method for Measuring Position and/or Motion Using Surface Micro-Structure - One embodiment relates to a method in which a measuring apparatus is used to collect a first set of wave form data which depends on micro-structure of a moving surface. A correspondence is identified between the first set of wave form data and actual position data. Calibrated wave form data is stored which indicates said correspondence between the first set of wave form data and actual position data. In addition, the measuring apparatus may be used to collect a second set of wave form data which depends on micro-structure of the moving surface, a cross-correlation may be computed between the second set of wave form data and the calibrated wave form data. Another embodiment relates to an apparatus for measuring position and/or motion using surface micro-structure of a moving surface. Another embodiment relates to method for measuring motion using surface micro-structure. Other embodiments and features are also disclosed. | 07-14-2011 |
Patent application number | Description | Published |
20100224140 | Method and a System for Measuring an Animal's Height - A method and a system for measuring animal's height is disclosed. The method, and the system as well, is comprised of the following steps: allowing the animal to pass through a passage with measurement-references; capturing plurality of images of the animal while the animal is passing; on each image of the captured images applying the following steps: filtering the background from the image; applying imaging-process technique on the lower area of the measuring-image to recognize the location of the legs; defining a vertical slice of the measuring-image, in which the back's contour of the animal—from neck to tail—appears and applying imaging processing and mathematical calculations to obtain the real height, as defined, of the animal. | 09-09-2010 |
20100269582 | Method and a System for Lameness Recognition - A method and a system for recognizing a lameness of an animal are disclosed. | 10-28-2010 |
20130340682 | HUMAN ASSISTED MILKING ROBOT AND METHOD - A human operated control device for assisting a plurality of milking robots includes a controller adapted for controlling communication with a plurality of milking robots operated substantially simultaneously, graphical user interface (GUI) adapted for displaying information received from at least one milking robot and for receiving input from a human supervisor for operating the at least one milking robot based on the displayed information, and a processor adapted to convert the input received from the human supervisor into a command for operating the at least one milking robot from which the information was received. A milking robot for operating milking equipment is adapted to operate in one of an automated mode of operation and a human assisted mode of operation. | 12-26-2013 |
20140000520 | SYSTEM AND METHOD FOR THREE DIMENSIONAL TEAT MODELING FOR USE WITH A MILKING SYSTEM | 01-02-2014 |