Inventors list |
Assignees list |
Classification tree browser |
Top 100 Inventors |
Top 100 Assignees |
Baltussen
Harrie W. J. Baltussen, Westervoort NL
| Patent application number | Description | Published |
|---|---|---|
| 20110191977 | ROBOTIC VACUUM CLEANER HAVING A DISPOSABLE DEBRIS BAG - A robotic vacuum cleaner having a main module and a cleaning head being connected with the main module by means of a suction hose. The main module comprises a debris compartment ( | 08-11-2011 |
Henricus Wilhelmus Johannes Baltussen, Westervoort NL
| Patent application number | Description | Published |
|---|---|---|
| 20110133013 | PAYING OUT AND RETRACTING AN ELECTRIC POWER CORD - A device for paying out and retracting an electric power cord ( | 06-09-2011 |
Jacobus Cornelus Maria Baltussen, St. Anthonis NL
| Patent application number | Description | Published |
|---|---|---|
| 20100058937 | TREATMENT DEVICE FOR TREATING FOOD PRODUCTS WITH CONDITIONED AIR - A treatment device for treating food products with conditioned air comprises a housing which delimits a treatment space and is provided with an entry and an exit, at least one conveying device for conveying the products from the entry throughout the treatment space to the exit, the conveying device between the entry and the exit following a conveying path with several windings which are situated one above the other, air-circulation device for circulating conditioned air throughout the treatment space via a hollow drum. According to a first aspect, air-conditioning device are provided upstream of the air-circulation device for conditioning the air. According to a second aspect, at least one winding of the conveying path near the entry has a pitch which is different to the pitch of the downstream windings. | 03-11-2010 |
Jozef Johannes Maria Baltussen, Nijmegen NL
| Patent application number | Description | Published |
|---|---|---|
| 20100272765 | Stable emulsion and process for preparing the same - The invention relates to a stable emulsion comprising (a) an oil; (b) water; (c) a surfactant; and (d) solid particulate material, wherein an emulsion comprising the oil, water, and the surfactant has a transitional phase inversion point, wherein the stable emulsion contains droplets having a d50 value of below 1 μm, and wherein the shelf life time of an emulsion comprising compounds (a) to (d) is longer than the shelf life time of emulsions containing only compounds (a) to (c). | 10-28-2010 |
| 20110000632 | Process to Make a Clay Comprising Charge-Balancing Organic Ions, Clays Thus Obtained, and Nanocomposite Materials Comprising the Same - The invention relates to a layered double hydroxide comprising a charge-balancing organic anion, wherein the charge-balancing anion is a monovalent anion comprising at least one hydroxyl group, and which comprises less than 20 wt % boehmite. Claimed are also an aqueous slurry, a water borne coating, a composite material and a master batch comprising the said layered double hydroxide as well as the use of the said layered double hydroxide in paper making processes and as stain blocking agent in water borne coating applications. | 01-06-2011 |
Jozef Johannes Maria Baltussen, Vv Nijmegen NL
| Patent application number | Description | Published |
|---|---|---|
| 20110268806 | ANTISOLVENT SOLIDIFICATION PROCESS - The present invention relates to a antisolvent solidification process wherein a liquid medium comprising at least one organic or inorganic compound which is to be solidified is forced through a membrane into one or more antisolvents, or wherein one or more antisolvents are forced through a membrane into a liquid medium comprising at least one organic or inorganic compound which is to be solidified, yielding a composition comprising solid particles comprising said organic and/or inorganic compound(s). | 11-03-2011 |
Sander Baltussen, Breda NL
| Patent application number | Description | Published |
|---|---|---|
| 20100269911 | Method and Arrangement for Realizing a Vacuum in a Vacuum Chamber - The invention relates to a method of realizing a vacuum in a vacuum chamber. The vacuum chamber is connected to a pumping system shared by a plurality of vacuum chambers. The method includes separately pumping down each vacuum chamber. The invention further relates to n arrangement of a plurality of vacuum chambers connected to a pumping system. In this arrangement, the pumping system is arranged for pumping down each vacuum chamber separately. | 10-28-2010 |
| 20100270299 | CHARGED PARTICLE LITHOGRAPHY APPARATUS AND METHOD OF GENERATING VACUUM IN A VACUUM CHAMBER - A vacuum chamber comprising a plurality of wall panels enclosing an interior space, in which the wall panels are removably attached to form the chamber using a plurality of connection members for locating the wall panels in a predetermined arrangement. The vacuum chamber further comprises one or more sealing members provided at the edges of the wall panels. The wall panels are arranged so that a vacuum tight seal is formed at the edges of the wall panels as a result of forming a vacuum in the interior space. | 10-28-2010 |
| 20110042579 | CHARGED PARTICLE LITHOGRAPHY APPARATUS AND METHOD OF GENERATING VACUUM IN A VACUUM CHAMBER - The invention relates to a charged particle lithography apparatus with a charged particle source for creating one or more charged particle beams, a charged particle projector for projecting the beams onto a wafer; and a moveable wafer stage for carrying the wafer. The charged particle source, charged particle projector, and moveable wafer stage are disposed in a common vacuum chamber forming a vacuum environment. The vacuum chamber further has an opening for loading wafers into the chamber and a door. | 02-24-2011 |
| 20110049393 | Lithography Machine and Substrate Handling Arrangement - An arrangement comprising a plurality of charged particle lithography apparatuses, each charged particle lithography apparatus having a vacuum chamber. The arrangement further comprises a common robot for conveying wafers to the plurality of lithography apparatuses, and a wafer load unit for each charged particle lithography apparatus arranged at a front side of each respective vacuum chamber. The plurality of lithography apparatuses are arranged in a row with the front side of the lithography apparatuses facing an aisle accommodating passage of the common robot for conveying wafers to each apparatus, and the rear side of each lithography apparatus faces an access corridor, and the back wall of each vacuum chamber is provided with an access door for access to the respective lithography apparatus. | 03-03-2011 |