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| 20090098807 | Composite slurries of nano silicon carbide and alumina - Improved slurry compositions comprising silicon carbide particles and alumina particles dispersed within an aqueous medium. Slurry compositions in the form of abrasive slurry compositions for use chemical mechanical planarization (CMP) processes, particularly abrasive slurry compositions for polishing of sapphire, and methods of use. | 04-16-2009 |
| 20090101625 | Silicon carbide particles, methods of fabrication, and methods using same - Improved silicon carbide particles, improved silicon carbide abrasive particles, and abrasive slurry compositions for use chemical mechanical planarization (CMP) processes. The particles can comprise nano-sized silicon carbide particles, particularly silicon carbide particles having a surface chemistry similar to silica. | 04-23-2009 |
| 20090104851 | Polishing of sapphire with composite slurries - Improved slurry compositions comprising a mixture of a first type of particles and a second type of abrasive particles dispersed within an aqueous medium, and abrasive slurry compositions for use chemical mechanical planarization (CMP) processes, particularly abrasive slurry compositions for polishing of sapphire. These abrasive slurry compositions comprise a mixture of a first type of abrasive particles having a hardness that is harder than the surface being polished and a second type of abrasive particles have a hardness that is softer than the surface being polished, particularly mixtures of silicon carbide abrasive particles and silica abrasive particles, dispersed within an aqueous medium. | 04-23-2009 |
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| 20100126488 | METHOD AND APPARATUS FOR CUTTING WAFERS BY WIRE SAWING - A method and apparatus of cutting wafers by wire sawing is disclosed. In one embodiment, a wire sawing apparatus includes a horizontal ingot feeding wire slicing apparatus which includes a vertical wire web, in which sawing wires of the vertical wire web are located substantially in a vertical plane and move in a substantially vertical direction, a top outlet located in top position with respect to a work piece for applying fluid during sawing, and a chute located substantially below the work piece for receiving the fluid, wherein the work piece is impelled against the vertical wire web by horizontal movement and the fluid moves in a vertical direction against and into the work piece. The wire sawing apparatus further includes a frame for holding the horizontal ingot feeding wire slicing apparatus, and a control panel for operating the wire sawing apparatus. | 05-27-2010 |
| 20100126489 | IN-SITU WAFER PROCESSING SYSTEM AND METHOD - An integrated wafer processing system and a method thereof is disclosed. In one embodiment, a wafer stack of sliced wafers includes a base, and a plurality of sliced wafers extending outwardly from the base, where the plurality of sliced wafers are obtained by slicing a portion of a work piece, where the base is an uncut portion which is the remaining portion of the work piece or a plate attached by welding to the plurality of sliced wafers and where the work piece is mono-crystalline or multi-crystalline silicon. Further, the wafer stack of sliced wafers are treated in-situ in cleaning and wet chemical tanks for processes such as damage etching, texturization and oxide etching and also treated in-situ in high temperature furnaces for processes such as diffusion and anti-reflection coating. | 05-27-2010 |
| 20100126490 | METHOD AND APPARATUS FOR CUTTING AND CLEANING WAFERS IN A WIRE SAW - A method and apparatus of cutting and cleaning wafers in a wire saw is disclosed. In one embodiment, a wire sawing apparatus includes a horizontal ingot feeding wire slicing apparatus which includes a vertical wire web, in which sawing wires of the vertical wire web are located substantially in a vertical plane and move in a substantially vertical direction, a first top outlet and a second top outlet located in a top position with respect to a work piece for applying fluids during sawing, and at least one chute located substantially below the work piece for receiving the fluids, wherein the work piece is impelled against the vertical wire web by horizontal movement and the fluids flow in a vertical direction against and into the work piece for slicing and cleaning wafers. | 05-27-2010 |
| 20110100346 | ABRASIVE GRAIN POWDER - Abrasive grain powder, in particular intended for machining silicon ingots, such that the granulometric fraction D | 05-05-2011 |
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| 20090022145 | SYSTEMS, METHODS, APPARATUS AND COMPUTER PROGRAM PRODUCTS FOR NETWORKING TRADING TURRET SYSTEMS USING SIP - Systems, methods, apparatus and computer program products are provided for sharing a resource including a subscription engine configured to subscribe to a first turret system to share the resource, a state change engine configured to receive a state change notification corresponding to the resource, from the turret system, and a failover engine configured to invite the turret system to initiate a connection to the resource. | 01-22-2009 |
| 20090022299 | SYSTEMS, METHODS, APPARATUS AND COMPUTER PROGRAM PRODUCTS FOR SHARING RESOURCES BETWEEN TURRET SYSTEMS AND PBXS USING SIP - Systems, methods, apparatus and computer program products are provided for sharing one or more resources across a turret system and a telephone exchange including an agent. The agent is configured to register into the telephone exchange as a predetermined device and to receive a state change notification of a resource from at least one of the telephone exchange and the turret system. Receipt of the state change notification causes the agent to change a state of a corresponding resource. | 01-22-2009 |
| 20090304168 | SOFTWARE BASED TRADING TURRET - A communications system including a turret switching system constructed to communicate to a Web server, a turret device, and to a remote communications device via a first communications network, the Web server being constructed to communicate to a client device via a second communications network, and the client device constructed to control switching across a plurality of lines. | 12-10-2009 |
| 20100110004 | CONVERGED DESKTOP BETWEEN A PC AND A TRADING TURRET - A personal computer and a telephony device are integrated using an input director and an input receiver. The input director is configured to receive an instruction from a user interface device, the instruction corresponding to a function of the telephony device. The input receiver is configured to receive the instruction from the input director and control the telephony device based on the instruction. | 05-06-2010 |
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| 20090017112 | Compounds for Inhibiting Beta-Amyloid Production - Provided are compounds useful for treating diseases associated with a cerebral accumulation of Alzheimer's amyloid, such as Alzheimer's disease. Also provided are methods of treating or reducing the risk of developing β-amyloid production, β-amyloid deposition, β-amyloid neurotoxicity (including abnormal hyperphosphorylation of tau) and microgliosis associated with cerebral accumulation of Alzheimer's amyloid by administering therapeutically effective amounts of the compounds. Further provided are methods for diagnosing diseases associated with cerebral accumulation of Alzheimer's amyloid in animals or humans by administering diagnostically effective amounts of the compounds. | 01-15-2009 |
| 20100119599 | POLYHYDROQUINOLINE COMPOUNDS AND DIHYDROPYRIDINE COMPOUNDS FOR INHIBITING BETA-AMYLOID PRODUCTION - Provided are methods of treating or reducing the risk of developing beta-amyloid production, beta-amyloid deposition, beta-amyloid neurotoxicity (including abnormal hyperphosphorylation of tau) and microgliosis associated with cerebral accumulation of Alzheimer's amyloid by administering therapeutically effective amounts of polyhydroquinoline and dihydropyridine compounds which decrease Abeta production in cells. Further provided are methods for diagnosing diseases associated with cerebral accumulation of Alzheimer's amyloid in animals or humans by administering diagnostically effective amounts of polyhydroquinoline and dihydropyridine compounds which decrease Abeta production in cells. | 05-13-2010 |
| 20100215735 | Compounds for Inhibiting Beta-Amyloid Production and Methods of Identifying the Compounds - Provided are compounds useful for treating diseases associated with a cerebral accumulation of Alzheimer's amyloid, such as Alzheimer's disease. Also provided are methods for screening for such compounds, by measuring capacitative calcium entry in cells which optionally overexpress APP or a fragment thereof. Also provided are methods of treating or reducing the risk of developing β-amyloid production, β-amyloid deposition, β-amyloid neurotoxicity (including abnormal hyperphosphorylation of tau) and microgliosis associated with cerebral accumulation of Alzheimer's amyloid by administering therapeutically effective amounts of compounds which decrease β-amyloid production and capacitative calcium entry in cells. Further provided are methods for diagnosing diseases associated with cerebral accumulation of Alzheimer's amyloid in animals or humans by administering diagnostically effective amounts of compounds which inhibit capacitative calcium entry in cells. | 08-26-2010 |
| 20100216784 | Compounds for Inhibiting Beta-Amyloid Production and Methods of Identifying the Compounds - Provided are compounds useful for treating diseases associated with a cerebral accumulation of Alzheimer's amyloid, such as Alzheimer's disease. Also provided are methods for screening for such compounds, by measuring capacitative calcium entry in cells which optionally overexpress APP or a fragment thereof. Also provided are methods of treating or reducing the risk of developing β-amyloid production, β-amyloid deposition, β-amyloid neurotoxicity (including abnormal hyperphosphorylation of tau) and microgliosis associated with cerebral accumulation of Alzheimer's amyloid by administering therapeutically effective amounts of compounds which decrease β-amyloid production and capacitative calcium entry in cells. Further provided are methods for diagnosing diseases associated with cerebral accumulation of Alzheimer's amyloid in animals or humans by administering diagnostically effective amounts of compounds which inhibit capacitative calcium entry in cells. | 08-26-2010 |
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| 20090213138 | MESH TRANSFER FOR SHAPE BLENDING - Techniques are disclose that may assist animators or other artists working with models. Information from a plurality of meshes in a collection may be blended or combined using correspondences between pairs of the meshes. Meshes in the collection may include different topologies and geometries. The combined information can be used to create combinations of data that reflect new topologies, geometries, scalar fields, hair styles, or the like that may be transferred to a mesh of new or existing models. | 08-27-2009 |
| 20100053172 | MESH TRANSFER USING UV-SPACE - Mesh data and other proximity information from the mesh of one model can be transferred to the mesh of another model, even with different topology and geometry. A correspondence can be created for transferring or sharing information between points of a source mesh and points of a destination mesh. Information can be “pushed through” the correspondence to share or otherwise transfer data from one mesh to its designated location at another mesh. Correspondences can be created based on parameterization information, such as UV sets, one or more maps, harmonic parameterization, or the like. A collection of “feature curves” may be inferred or user-placed to partition the source and destination meshes into a collection of “feature regions” resulting in partitions or “feature curve networks” for constructing correspondences between all points of one mesh and all points of another mesh. | 03-04-2010 |
| 20100053186 | MESH TRANSFFER IN N-D SPACE - Systems and methods are disclosed allowing data and other information from one model to be transferred to another model. A surface correspondence between meshes of the models can be created that provides a transfer or sharing of information to include all points of one mesh and all points of the other mesh. Additionally, a volume correspondence between the models can be created to transfer information found within corresponding volumes or other n-D spaces associated with the models. Mesh information and other data at, near, or otherwise within a volume or other n-D space associated with one model can be “pushed through” the volume correspondences to transfer the data to its designated location on, at, near, or otherwise within a corresponding volume or other n-D space associated with the other model. | 03-04-2010 |
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| 20090046273 | Systems and Methods for Monitoring and Controlling the Operation of Extreme Ultraviolet (EUV) Light Sources Used in Semiconductor Fabrication - Systems and methods for monitoring and controlling the operation of extreme ultraviolet (EUV) sources used in semiconductor fabrication are disclosed. A method comprises providing a semiconductor fabrication apparatus having a light source that emits in-band and out-of-band radiation, taking a first out-of-band radiation measurement, taking a second out-of-band radiation measurement, and controlling the in-band radiation of the light source, at least in part, based upon a comparison of the first and second out-of-band measurements. An apparatus comprises a detector operable to detect out-of-band EUV radiation emitted by an EUV plasma source, a spectrometer coupled to the electromagnetic detector and operable to measure at least one out-of-band radiation parameter based upon the detected out-of-band EUV radiation, and a controller coupled to the spectrometer and operable to monitor and control the operation of the EUV plasma source based upon the out-of-band measurements. | 02-19-2009 |
| 20090059196 | Systems and Methods for In-Situ Reflectivity Degradation Monitoring of Optical Collectors Used in Extreme Ultraviolet (EUV) Lithography Processes - Systems and methods for in-situ reflectivity degradation monitoring of optical collectors used in extreme ultraviolet (EUV) lithography processes are described. In one embodiment, a method comprises providing a semiconductor lithography tool employing an EUV source optically coupled to a collector within a vacuum chamber, the collector providing an intermediate focus area, measuring a first signal at the EUV source, measuring a second signal at the intermediate focus area, comparing the first and second signals, and monitoring a reflectivity parameter of the collector based upon the comparison. In another embodiment, a method comprises emitting a signal from a non-EUV light source optically coupled to the collector, measuring a signal reflected by the collector, and monitoring a reflectivity parameter of the collector based upon a comparison between the emitted and measured signals. | 03-05-2009 |
