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Bailey, NY
Ada Cannon Bailey, Chalton, NY US
| Patent application number | Description | Published |
|---|---|---|
| 20090033520 | INTELLIGENT FLOOR MAT WITH EMAIL TEXT TO VOICE PROCESSING - A floor mat suitable for a vehicle is shown in FIG. | 02-05-2009 |
Adam Bailey, Albany, NY US
| Patent application number | Description | Published |
|---|---|---|
| 20110170666 | XRF SYSTEM HAVING MULTIPLE EXCITATION ENERGY BANDS IN HIGHLY ALIGNED PACKAGE - An x-ray analysis apparatus for illuminating a sample spot with an x-ray beam. An x-ray tube is provided having a source spot from which a diverging x-ray beam is produced having a characteristic first energy, and bremsstrahlung energy; a first x-ray optic receives the diverging x-ray beam and directs the beam toward the sample spot, while monochromating the beam; and a second x-ray optic receives the diverging x-ray beam and directs the beam toward the sample spot, while monochromating the beam to a second energy. The first x-ray optic may monochromate characteristic energy from the source spot, and the second x-ray optic may monochromate bremsstrahlung energy from the source spot. The x-ray optics may be curved diffracting optics, for receiving the diverging x-ray beam from the x-ray tube and focusing the beam at the sample spot. Detection is also provided to detect and measure various toxins in, e.g., manufactured products including toys and electronics. | 07-14-2011 |
Aimee G. Bailey, Hoosick Falls, NY US
| Patent application number | Description | Published |
|---|---|---|
| 20080274033 | Methods of generating hydrogen with nitrogen-containing hydrogen storage materials - Methods of generating hydrogen-containing streams having a minimal concentration of gaseous reactive nitrogen-containing compounds, e.g., ammonia, are provided. Hydrogen storage material systems are also provided that generate such hydrogen-containing streams. A first composition comprising a nitride, a second composition comprising a hydride, and a third composition having a cation selected from the group consisting of: alkali metals, alkaline earth metals, and mixtures thereof are combined together. The hydrogen-containing stream thus generated has a minimal concentration of gaseous reactive nitrogen-containing compounds. | 11-06-2008 |
Carla A. Bailey, Poughkeepsie, NY US
| Patent application number | Description | Published |
|---|---|---|
| 20080264898 | SELECTIVE ETCH OF TiW FOR CAPTURE PAD FORMATION - A chemical etchant containing hydrogen peroxide and phosphate ions at a controlled pH is provided for selectively etching metals in the presence of one or more metals not to be etched. The etchant is useful in the fabrication of semiconductor components particularly for forming capture pads where TiW is used as a barrier layer for a copper, copper/nickel pad, or copper/nickel alloy pad. A commercial hydrogen peroxide solution is preferred to which has been added phosphoric acid as a source of phosphate ions and KOH as the pH adjuster. | 10-30-2008 |
| 20090084183 | SLIP RING POSITIVE Z FORCE LIQUID ISOLATION FIXTURE PERMITTING ZERO NET FORCE ON WORKPIECE - Apparatus for Scanning Acoustic Microscopy (SAM) of a semiconductor device including a substrate with an acoustic probe, The substrate has upper and lower surfaces. A sealed lower space provides an environment surrounding the lower surface. An upper ring structure formed above the upper surface includes an upper sealing ring in contact with the upper surface, with the upper sealing structure and the seal forming a dam for retaining the acoustic transmission fluid above the upper surface. A fixture base retains a lower sealing ring in contact with the lower surface surrounding the lower surface. An acoustic scanning probe positioned confronting the upper surface of the semiconductor device extending into the acoustic transmission fluid retained in contact with the upper surface. | 04-02-2009 |
| 20090267228 | INTERMETALLIC DIFFUSION BLOCK DEVICE AND METHOD OF MANUFACTURE - One embodiment of the present invention is directed to an under bump metallurgy material. The under bump metallurgy material of this embodiment includes an adhesion layer and a conduction layer formed on top of the adhesion layer. The under bump metallurgy material of this embodiment also includes a barrier layer plated on top of the conduction layer and a sacrificial layer plated on top of the barrier layer. The conduction layer of this embodiment includes a trench formed therein, the trench contacting a portion of the barrier layer and blocking a path of intermetallic formation between the conduction layer and the sacrificial layer. | 10-29-2009 |
David Bailey, Vestal, NY US
| Patent application number | Description | Published |
|---|---|---|
| 20110046775 | Facility Wide Mixed Mail Sorting and/or Sequencing System and Components and Methods Thereof - The invention generally relates to a facility wide sorting and/or sequencing system for improving product processing operations and, more particularly, to a facility wide system and related functionality for simultaneously sorting and sequencing mixed mail pieces such as, for example, flats and letter mail pieces. The flats and letter mail pieces are placed in frames so that all types of mail pieces can be sorted and/or sequenced simultaneously through merging and diverting a stream of filled trays into and out of different streams at a full or substantially full transport speed. | 02-24-2011 |
David B. Bailey, Webster, NY US
| Patent application number | Description | Published |
|---|---|---|
| 20080258344 | ABLATABLE ELEMENTS FOR MAKING FLEXOGRAPHIC PRINTING PLATES - Flexographic printing plates and other relief images can be formed from a laser-ablatable element having a laser-ablatable layer that is at least 20 μm in thickness. The laser-ablatable layer includes a film-forming material that is a laser-laser-ablatable material or the film-forming material has dispersed therein a laser-ablatable material. The laser-ablatable material is a polymeric material that when heated to 300° C. at a rate of 10° C./minute, loses at least 60% of its mass to form at least one predominant low molecular weight product. The element can be imaged by ablation at an energy of at least 1 J/cm2 to provide a relief image. | 10-23-2008 |
| 20080261028 | ABLATABLE ELEMENTS FOR MAKING FLEXOGRAPHIC PRINTING PLATES - Flexographic printing plates and other relief images can be formed from a laser-ablatable element having a laser-ablatable layer that is at least 20 μm in thickness. The laser-ablatable layer includes a film-forming material that is a laser-laser-ablatable material or the film-forming material has dispersed therein a laser-ablatable material. The laser-ablatable material is a polymeric material that when heated to 300° C. at a rate of 10° C./minute, loses at least 60% of its mass to form at least one predominant low molecular weight product. The element can be imaged by ablation at an energy of at least 1 J/cm2 to provide a relief image. | 10-23-2008 |
| 20090258368 | PARAMAGNETIC NUCLEATION NANOPARTICLES - A nucleic acid binding substance which has affinity for nucleic acid polymers. The nucleic acid binding substance is comprised of a nucleic acid binding element capable of specific binding to nucleic acid molecules and connected to a nucleation nanoparticle having paramagnetic properties. | 10-15-2009 |
| 20090270593 | NUCLEIC ACID BINDING SUBSTANCE CONTAINING CATALYTIC NUCLEATION NANOPARTICLES - A nucleic acid binding substance having an affinity for nucleic acid polymers. The nucleic acid binding substance is comprised of a nucleic acid binding element capable of specific binding to nucleic acid molecules and connected to a catalytic nucleation particle | 10-29-2009 |
| 20100285406 | ABLATABLE ELEMENTS FOR MAKING FLEXOGRAPHIC PRINTING PLATES - Flexographic printing plates and other relief images can be formed from a laser-ablatable element having a laser-ablatable layer that is from about 300 to about 4,000 μm in thickness. The laser-ablatable layer includes a film-forming material that is a laser-laser-ablatable material or the film-forming material has dispersed therein a laser-ablatable material. The laser-ablatable material is a polymeric material that when heated to 300° C. at a rate of 10° C./minute, loses at least 60% of its mass to form at least one predominant low molecular weight product. The laser-ablatable material also comprises at least 0.01 weight % of a depolymerization catalyst that is a Lewis acid or organometallic based catalyst. The element can be imaged by ablation at an energy of at least 1 J/cm | 11-11-2010 |
David P. Bailey, Portville, NY US
| Patent application number | Description | Published |
|---|---|---|
| 20090015366 | MECHANICAL REINFORCEMENT STRUCTURE FOR FUSES - A fuse includes an electrical assembly and a fuse tube assembly. The electrical assembly has two electrical contacts accessible from the exterior of the fuse and a fuse element in contact with the two electrical contacts. The fuse tube assembly includes a support structure surrounding at least a portion of the electrical assembly and a reinforcing structure formed over the support structure and in contact with at least a portion of the electrical assembly. The reinforcing structure is made of a fiber matrix pre-impregnated with a resin. | 01-15-2009 |
| 20100194520 | MANUFACTURING PROCESS FOR SURGE ARRESTER MODULE USING PRE-IMPREGNATED COMPOSITE - An electrical module assembly used in a surge arrester is manufactured by wrapping an electrical module assembly including at least one metal oxide varistor (MOV) disk to which a reinforcing structure including a pre-impregnated epoxy/glass-fiber composite has been applied with shrink film and compacting the wrapped electrical module assembly by heating the shrink film such that the shrink film shrinks and applies a radially compressive force to the electrical module assembly. The wrapped electrical module assembly then is cured at a temperature at which the shrink film no longer applies a compressive force. | 08-05-2010 |
Edward J. Bailey, New York, NY US
| Patent application number | Description | Published |
|---|---|---|
| 20100312769 | METHODS, APPARATUS AND SOFTWARE FOR ANALYZING THE CONTENT OF MICRO-BLOG MESSAGES - Methods, systems and software are described for analyzing micro-blog messages to detect abnormal activity of interest. The system includes a clusterer for clustering micro-blog messages received over a first period of time, a classifier for scoring the clustered messages; a knowledge base, a rule generator for generating classification rules from the knowledge base; and a matcher for matching the scored messages to information requests. Methods for operating the system and its components are described. | 12-09-2010 |
James G. Bailey, Kingston, NY US
| Patent application number | Description | Published |
|---|---|---|
| 20080286709 | Kiln Removable Ceramic Element Holder - A kiln of the pottery or glass type and of insulating firebrick or ceramic fiber with an interior wall includes: a ceramic holder for holding a wound electrical heating element; a channel in the interior wall for receiving and supporting the ceramic holder. The ceramic holder is removably positionable within the slot with means for receipt and holding the wound electrical heating element when the ceramic holder is positioned within the channel in a first preferred embodiment, the ceramic holder has a supporting surface for receipt of the heating element and an inner, upper lip for holding the heating element on the ceramic holder. The interior wall has a horizontal retaining slot aligned with the ceramic holder supporting surface, the supporting surface has an outer end received within the retaining slot and an inwardly angled bore and a pin passing through the bore into the interior wall for holding the ceramic holder removably in place. In an alternate embodiment, the channel has an upper outwardly projecting corner and a lower vertical slot, the ceramic element holder has a vertical outer wall integral with the supporting surface with an upper end for positioning and pivoting within the upper corner and an outer lower lip for positioning within the lower vertical slot when the ceramic element holder is positioned in place. | 11-20-2008 |
John Bailey, Bradford, NY US
| Patent application number | Description | Published |
|---|---|---|
| 20080224614 | Looped Frame Arc Tube Mounting Assembly for Metal Halide Lamp - An arc tube mounting assembly ( | 09-18-2008 |
John S. Bailey, Bradford, NY US
| Patent application number | Description | Published |
|---|---|---|
| 20090230864 | COMPACT HID ARC LAMP HAVING SHROUDED ARC TUBE AND HELICAL LEAD WIRE - A compact open-rated HID lamp ( | 09-17-2009 |
Mark Bailey, Hawthorne, NY US
| Patent application number | Description | Published |
|---|---|---|
| 20110219018 | DIGITAL MEDIA VOICE TAGS IN SOCIAL NETWORKS - A voice tagging system includes a client computing device that includes a media object capture device and a voice capture device and runs a client application that associates media objects to voice samples. The system also includes a communications network coupled to the client computing device, a voice tagging system coupled to the communications network and receiving at least one association between a first media object and a first voice sample, and a database coupled to the voice tagging system, the database including one or more voice tags, each voice tag being coupled to one or more voice samples. | 09-08-2011 |
| 20110219055 | SOCIAL BOOKMARKING FOR INTERACTIVE SERVICES - A service includes a server for operating system that supports parametric personalized social (PPS) bookmarks. The server includes a PPS bookmark creator configured to determine information gathered at a point in an automated dialog after a request to create a PPS bookmark is received. The server also includes a PPS bookmark executer configured to, upon receipt of a PPS bookmark identifier, return to the point in the automated dialog and recreate at least a part of the information gathered. | 09-08-2011 |
Michael Bailey, Bayport, NY US
| Patent application number | Description | Published |
|---|---|---|
| 20100133336 | System and Method for a Secure Transaction - A system and method is used to secure a transaction. The system comprises a data card and a payment receiving device. The data card stores confidential data related to the secure transaction. The payment receiving device receives the confidential data. A first credibility relating to the payment receiving device is verified. Upon the first credibility being verified, a second credibility relating to the data card is verified. | 06-03-2010 |
Todd Bailey, Fishkill, NY US
| Patent application number | Description | Published |
|---|---|---|
| 20080199816 | Method of Automatic Fluid Dispensing for Imprint Lithography Processes - Disclosed herein is an automatic fluid dispensing method and system for dispensing fluid on the surface of a plate-like material, or substrate, including a semiconductor wafer for imprint lithography processes. The dispensing method uses fluid dispenser and a substrate stage that may generate relative lateral motions between a fluid dispenser tip a substrate. Also described herein are methods and devices for creating a planar surface on a substrate using a substantially unpatterned planar template. | 08-21-2008 |
| 20100173033 | Device for Holding a Template for Use in Imprint Lithography - An imprint lithography template may be used to form an imprinted layer in a light curable liquid disposed on a substrate. During use, the template may be disposed within a template holder. The template holder may include a body with an opening configured to receive the template, a support plate, and an actuator system coupled to the body. The actuator system may be configured to alter a physical dimension of the template during use. | 07-08-2010 |
Todd C. Bailey, Hopewell Junction, NY US
| Patent application number | Description | Published |
|---|---|---|
| 20110102760 | ALIGNMENT METHOD FOR SEMICONDUCTOR PROCESSING - A method provides improved alignment for a photolithographic exposure. In such method, a first exposure tool and a first chuck used in a reference photolithographic exposure of a first material layer on a substrate can be identified. The substrate typically includes at least a semiconductor layer. The first chuck typically is one of a plurality of chucks usable with the first exposure tool. The method may further include identifying a second exposure tool and a second chuck used in a current photolithographic exposure of a second material layer on the substrate. In one embodiment, alignment correction information specific to each of the identified first exposure tool, the first chuck, the second exposure tool and the second chuck can be used in aligning the semiconductor substrate to a second exposure tool and a second chuck. In one embodiment, such method can compensate for alignment error caused by differences between the first and second exposure tools, between the first and second chucks, or between the first and second exposure tools and between the first and second chucks. | 05-05-2011 |
Todd C. Bailey, Fishkill, NY US
| Patent application number | Description | Published |
|---|---|---|
| 20090214689 | Imprint Lithography Templates Having Alignment Marks - One embodiment of the present invention is an imprint template for imprint lithography that comprises alignment marks embedded in bulk material of the imprint template. | 08-27-2009 |
| 20090284726 | Stray Light Feedback for Dose Control in Semiconductor Lithography Systems - A lithography system with a stray light feedback system is disclosed. The stray light feedback helps control critical dimension (CD) within a stray light specification limit. A stray light dose control factor is calculated as a function of the stray light measured in the exposure tool and the sensitivity of the resist. The stray light dose control factor is used to adjust the exposure dose to achieve the desired CD. The stray light may be monitored, and if a threshold level of stray light is reached or exceeded, the use of the exposure tool may be discontinued for a particular type of semiconductor product, resist, or mask level, until the lens system is cleaned. | 11-19-2009 |
Todd C. Bailey, Poughkeepsie, NY US
| Patent application number | Description | Published |
|---|---|---|
| 20080203589 | VARIABLE FILL AND CHEESE FOR MITIGATION OF BEOL TOPOGRAPHY - A method of designing features on a semiconductor wafer. A design of active or functional features is provided for chiplets separated by kerf areas on the wafer. The method then includes determining pattern density of the chiplet features, and applying a pattern of spaced dummy features on chiplet area not covered by active or functional features, as well as in the kerf areas. The dummy features are uniformly expanded or reduced in size until a desired dummy feature pattern density is reached. | 08-28-2008 |
| 20080286545 | MASK HAVING IMPLANT STOPPING LAYER - Methods of forming a mask for implanting a substrate and implanting using an implant stopping layer with a photoresist provide lower aspect ratio masks that cause minimal damage to trench isolations in the substrate during removal of the mask. In one embodiment, a method of forming a mask includes: depositing an implant stopping layer over the substrate; depositing a photoresist over the implant stopping layer, the implant stopping layer having a density greater than the photoresist; forming a pattern in the photoresist by removing a portion of the photoresist to expose the implant stopping layer; and transferring the pattern into the implant stopping layer by etching to form the mask. The implant stopping layer may include: hydrogenated germanium carbide, nitrogenated germanium carbide, fluorinated germanium carbide, and/or amorphous germanium carbon hydride (GeHX), where X includes carbon. The methods/mask reduce scattering during implanting because the mask has higher density than conventional masks. | 11-20-2008 |
| 20090004869 | MASK FORMING AND IMPLANTING METHODS USING IMPLANT STOPPING LAYER - Methods of forming a mask for implanting a substrate and implanting using an implant stopping layer with a photoresist provide lower aspect ratio masks that cause minimal damage to trench isolations in the substrate during removal of the mask. In one embodiment, a method of forming a mask includes: depositing an implant stopping layer over the substrate; depositing a photoresist over the implant stopping layer, the implant stopping layer having a density greater than the photoresist; forming a pattern in the photoresist by removing a portion of the photoresist to expose the implant stopping layer; and transferring the pattern into the implant stopping layer by etching to form the mask. The implant stopping layer may include: hydrogenated germanium carbide, nitrogenated germanium carbide, fluorinated germanium carbide, and/or amorphous germanium carbon hydride (GeHX), where X includes carbon. The methods/mask reduce scattering during implanting because the mask has higher density than conventional masks. | 01-01-2009 |
| 20110223756 | Method of Enhancing Photoresist Adhesion to Rare Earth Oxides - A method and apparatus are described for fabricating metal gate electrodes ( | 09-15-2011 |
Todd Christopher Bailey, Fishkill, NY US
| Patent application number | Description | Published |
|---|---|---|
| 20120076982 | STRUCTURE RESULTING FROM CHEMICAL SHRINK PROCESS OVER BARC (BOTTOM ANTI-REFLECTIVE COATING) - A structure. The structure includes: a hole layer; a hole layer including a top hole layer surface, wherein the hole layer has a thickness in a first direction that is perpendicular to the hole layer surface; a bottom antireflective coating (BARC) layer on and in direct physical contact with the hole layer at the top hole layer surface; a photoresist layer on and in direct physical contact with the BARC layer, wherein a continuous hole in the first direction extends completely through the photoresist layer, the BARC layer, and the hole layer; and a polymerized hole shrinking region in direct physical contact with the photoresist layer at a lateral surface of the photoresist layer and with the hole layer at the top hole layer surface, wherein the hole shrinking region does not extend below the hole layer surface in a direction from the BARC layer to the hole layer. | 03-29-2012 |