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Badawi
David Y. Badawi, Glenview, IL US
| Patent application number | Description | Published |
|---|---|---|
| 20120059461 | INTRAOCULAR IMPLANTS AND RELATED KITS AND METHODS - Devices, methods and kits are described for reducing intraocular pressure. The devices include a support that is implantable within Schlemm's canal and that may restore or maintain at least partial patency of the canal without substantially interfering with transmural or transluminal fluid flow across the canal. The devices utilize the natural drainage process of the eye and may be implanted with minimal trauma to the eye. Kits may include a support and an introducer for implanting the support within Schlemm's canal. Methods may include implanting a support within Schlemm's canal, where the support is capable of restoring or maintaining at least partial patency of the canal without substantial interference with transmural or transluminal fluid flow across the canal. | 03-08-2012 |
David Y. Badawi, Northbrook, IL US
| Patent application number | Description | Published |
|---|---|---|
| 20100191329 | INTRAOCULAR IMPLANTS AND METHODS AND KITS THEREFOR - Devices, methods and kits are described for reducing intraocular pressure. The devices include a support that is implantable within Schlemm's canal and maintains the patency of the canal without substantially interfering with transmural fluid flow across the canal. The devices utilize the natural drainage process of the eye and can be implanted with minimal trauma to the eye. Kits include a support and an introducer for implanting the support within Schlemm's canal. Methods include implanting a support within Schlemm's canal, wherein the support is capable of maintaining the patency of the canal without substantial interference with transmural fluid flow across the canal. | 07-29-2010 |
| 20110130831 | INTRAOCULAR IMPLANTS AND METHODS AND KITS THEREFOR - Devices, methods and kits are described for reducing intraocular pressure. The devices include a support that is implantable within Schlemm's canal and maintains the patency of the canal without substantially interfering with transmural fluid flow across the canal. The devices utilize the natural drainage process of the eye and can be implanted with minimal trauma to the eye. Kits include a support and an introducer for implanting the support within Schlemm's canal. Methods include implanting a support within Schlemm's canal, wherein the support is capable of maintaining the patency of the canal without substantial interference with transmural fluid flow across the canal. | 06-02-2011 |
| 20110196487 | INTRAOCULAR IMPLANTS AND RELATED KITS AND METHODS - Devices, methods and kits are described for reducing intraocular pressure. The devices include a support that is implantable within Schlemm's canal and that may restore or maintain at least partial patency of the canal without substantially interfering with transmural or transluminal fluid flow across the canal. The devices utilize the natural drainage process of the eye and may be implanted with minimal trauma to the eye. Kits may include a support and an introducer for implanting the support within Schlemm's canal. Methods may include implanting a support within Schlemm's canal, where the support is capable of restoring or maintaining at least partial patency of the canal without substantial interference with transmural or transluminal fluid flow across the canal. | 08-11-2011 |
Essam Badawi, Scotts Valley, CA US
| Patent application number | Description | Published |
|---|---|---|
| 20090269716 | Oral Health Measurement Clamping Probe, System and Method - Devices, systems, and methods determine the health of oral objects by providing objective measurements using a detachable probe body. The detachable probe body may isolate reusable system components (including an electromagnetic signal detection, signal transmission, energy generation, and or energy transmitting components) from the oral cavity, optionally by encasing at least a portion of one or more of these components in a sheath or the like. A window of the probe body maintains sterile isolation and transmits electromagnetic energy to and/or signals from the oral object. Accuracy can be enhanced by a clamp or other structure for engaging a surface of the oral object so as to maintain a fixed alignment between the signal receiver and the oral object. | 10-29-2009 |
Mahmoud Badawi, Falls Church, VA US
| Patent application number | Description | Published |
|---|---|---|
| 20110088706 | HOOKAH BOWL - The present invention is directed to a hookah bowl with a central spire and a hookah bowl system with the hookah bowl and a coal plate. The coal plate fits about the spire and may be retained upon the hookah bowl via multiple means. The spire assists transportation, attachment, use, and removal of the hookah bowl. | 04-21-2011 |
M.hani Badawi, Santa Clara, CA US
| Patent application number | Description | Published |
|---|---|---|
| 20110089538 | LOW ETCH PIT DENSITY (EPD) SEMI-INSULATING III-V WAFERS - Systems and methods of manufacturing wafers are disclosed using a low EPD crystal growth process and a wafer annealing process are provided resulting in III-V/GaAs wafers that provide higher device yields from the wafer. In one exemplary implementation, there is provided a method of manufacturing a group III based material with a low etch pit density (EPD). Moreover, the method includes forming polycrystalline group III based compounds, and performing vertical gradient freeze crystal growth using the polycrystalline group III based compounds. Other exemplary implementations may include controlling temperature gradient(s) during formation of the group III based crystal to provide very low etch pit density. | 04-21-2011 |
M. Hani Badawi, Santa Clara, CA US
| Patent application number | Description | Published |
|---|---|---|
| 20080280427 | Low etch pit density (EPD) semi-insulating GaAs wafers - A method for manufacturing wafers using a low EPD crystal growth process and a wafer annealing process is provided that results in GaAs/InGaP wafers that provide higher device yields from the wafer. | 11-13-2008 |
| 20100001288 | Low Etch Pit Density (EPD) Semi-Insulating GaAs Wafers - A method for manufacturing wafers using a low EPD crystal growth process and a wafer annealing process is provided that results in GaAs/InGaP wafers that provide higher device yields from the wafer. | 01-07-2010 |
| 20110293890 | Low Etch Pit Density (EPD) Semi-Insulating III-V Wafers - Systems and methods of manufacturing wafers are disclosed using a low EPD crystal growth process and a wafer annealing process are provided resulting in III-V/GaAs wafers that provide higher device yields from the wafer. In one exemplary implementation, there is provided a method of manufacturing a group III based material with a low etch pit density (EPD). Moreover, the method includes forming polycrystalline group III based compounds, and performing vertical gradient freeze crystal growth using the polycrystalline group III based compounds. Other exemplary implementations may include controlling temperature gradient(s) during formation of the group III based crystal to provide very low etch pit density. | 12-01-2011 |
Paul Badawi, San Francisco, CA US
| Patent application number | Description | Published |
|---|---|---|
| 20100191329 | INTRAOCULAR IMPLANTS AND METHODS AND KITS THEREFOR - Devices, methods and kits are described for reducing intraocular pressure. The devices include a support that is implantable within Schlemm's canal and maintains the patency of the canal without substantially interfering with transmural fluid flow across the canal. The devices utilize the natural drainage process of the eye and can be implanted with minimal trauma to the eye. Kits include a support and an introducer for implanting the support within Schlemm's canal. Methods include implanting a support within Schlemm's canal, wherein the support is capable of maintaining the patency of the canal without substantial interference with transmural fluid flow across the canal. | 07-29-2010 |
| 20110130831 | INTRAOCULAR IMPLANTS AND METHODS AND KITS THEREFOR - Devices, methods and kits are described for reducing intraocular pressure. The devices include a support that is implantable within Schlemm's canal and maintains the patency of the canal without substantially interfering with transmural fluid flow across the canal. The devices utilize the natural drainage process of the eye and can be implanted with minimal trauma to the eye. Kits include a support and an introducer for implanting the support within Schlemm's canal. Methods include implanting a support within Schlemm's canal, wherein the support is capable of maintaining the patency of the canal without substantial interference with transmural fluid flow across the canal. | 06-02-2011 |
| 20110196487 | INTRAOCULAR IMPLANTS AND RELATED KITS AND METHODS - Devices, methods and kits are described for reducing intraocular pressure. The devices include a support that is implantable within Schlemm's canal and that may restore or maintain at least partial patency of the canal without substantially interfering with transmural or transluminal fluid flow across the canal. The devices utilize the natural drainage process of the eye and may be implanted with minimal trauma to the eye. Kits may include a support and an introducer for implanting the support within Schlemm's canal. Methods may include implanting a support within Schlemm's canal, where the support is capable of restoring or maintaining at least partial patency of the canal without substantial interference with transmural or transluminal fluid flow across the canal. | 08-11-2011 |
| 20120059461 | INTRAOCULAR IMPLANTS AND RELATED KITS AND METHODS - Devices, methods and kits are described for reducing intraocular pressure. The devices include a support that is implantable within Schlemm's canal and that may restore or maintain at least partial patency of the canal without substantially interfering with transmural or transluminal fluid flow across the canal. The devices utilize the natural drainage process of the eye and may be implanted with minimal trauma to the eye. Kits may include a support and an introducer for implanting the support within Schlemm's canal. Methods may include implanting a support within Schlemm's canal, where the support is capable of restoring or maintaining at least partial patency of the canal without substantial interference with transmural or transluminal fluid flow across the canal. | 03-08-2012 |