| Patent application number | Description | Published |
|---|
| 20080218708 | EXPOSURE APPARATUS AND METHOD OF MANUFACTURING DEVICE - An exposure apparatus is configured to transfer a pattern to a substrate by exposing the substrate to light via a reticle. The apparatus comprises an inspection unit configured to inspect the reticle, an exposure unit configured to expose the substrate to light via the reticle inspected by the inspection unit, and a controller configured to control the inspection unit and the exposure unit. The controller (i) sets a partial region of the reticle, (ii) causes the inspection unit to inspect the reticle on which the partial region is set, and (iii) causes the exposure unit to expose the substrate to light via the partial region if the inspection unit finds no abnormality in the partial region. | 09-11-2008 |
| 20090207406 | PARTICLE INSPECTION APPARATUS, EXPOSURE APPARATUS, AND DEVICE MANUFACTURING METHOD - A particle inspection apparatus includes an irradiation unit configured to apply a light beam onto front and back surfaces of an object to be inspected, first and second detection units configured to detect scattering light from the surfaces, a calculation unit configured to conduct a particle inspection on the surfaces on the basis of outputs from the detection units, and a control unit configured to control the irradiation unit, the detection units, and the calculation unit. The irradiation unit can selectively apply the beam onto the front or back surface. The control unit causes the calculation unit to conduct the particle inspection on the inspection surface on which the light beam is selectively applied, on the basis of outputs made by the detection unit corresponding to simultaneous application and selective application of the light beam. | 08-20-2009 |
| 20100020316 | INSPECTION APPARATUS, EXPOSURE APPARATUS, AND METHOD OF MANUFACTURING DEVICE - An inspection apparatus includes a projecting unit, a first receiving unit, a second receiving unit, and a controller. The projection unit is configured to project linear light on a surface of an object. The first and second receiving units are configured to receive scattered light of the projected linear light. The controller is configured to scan the projecting unit, the first and second receiving units and determine the present or absence of a foreign substance on the surface based on intensity distribution signals output from the first and second receiving units. | 01-28-2010 |
| 20100273115 | PARTICLE INSPECTION APPARATUS, EXPOSURE APPARATUS, AND DEVICE MANUFACTURING METHOD - A particle inspection apparatus includes an irradiation unit configured to apply a light beam onto front and back surfaces of an object to be inspected, first and second detection units configured to detect scattering light from the surfaces, a calculation unit configured to conduct a particle inspection on the surfaces on the basis of outputs from the detection units, and a control unit configured to control the irradiation unit, the detection units, and the calculation unit. The irradiation unit can selectively apply the beam onto the front or back surface. The control unit causes the calculation unit to conduct the particle inspection on the inspection surface on which the light beam is selectively applied, on the basis of outputs made by the detection unit corresponding to simultaneous application and selective application of the light beam. | 10-28-2010 |
| 20110051130 | FOREIGN SUBSTANCE INSPECTION APPARATUS, EXPOSURE APPARATUS, AND METHOD OF MANUFACTURING DEVICE - A foreign substance inspection apparatus includes a light projecting unit, a detector which detects the intensity of scattered light of light projected onto the surface of an object to be detected by the light projecting unit, in association with the two-dimensional coordinate position on the surface, and a processing unit. The relationship between the intensity of the scattered light detected by the detector and the particle size of the foreign substance differs depending on the two-dimensional coordinate position on the surface. The processing unit determines, a conversion curve to convert the intensity of the scattered light detected by the detector into the particle size of the foreign substance, in accordance with the two-dimensional coordinate position of the foreign substance detected by the detector, and converts the intensity of the scattered light detected by the detector into the particle size of the foreign substance using the determined conversion curve. | 03-03-2011 |
