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Aslami
Ahmad John Aslami, Alpharetta, GA US
| Patent application number | Description | Published |
|---|---|---|
| 20090187459 | System and method for qualifying a lead originating with an advertisement published on-line - A system and method are provided for qualifying leads originating from an advertisement published online. The system is configured to track certain events relative to an advertisement. Tracked event data may be recorded to a database. | 07-23-2009 |
| 20100076837 | Presence optimized advertisement publishing system and methodology - A system and method are provided for publishing certain advertising information on-line. Presence indicators are incorporated into merchant advertisements published online. The presence indicators are preferably active hyper-links that are configured to allow a consumer to send a request to a merchant for initiation of a 2-way real time communications session. The system provides for adding one of a pool of merchant representatives to an opened communications session with the consumer. Advertisements may be selectively published or withheld from publication based upon the availability status of an associated merchant. | 03-25-2010 |
Mohd Aslami, Sturbridge, MA US
| Patent application number | Description | Published |
|---|---|---|
| 20090325340 | Plasma vapor deposition system and method for making multi-junction silicon thin film solar cell modules and panels - A plasma vapor deposition system for making multi-junction silicon thin film solar cell modules and panels including a flexible substrate disposed about and removably supported by a dual-walled cylindrical substrate support for axially rotating the flexible substrate about its longitudinal axis, the dual-walled cylindrical substrate support comprising an inner wall spaced apart by an outer wall to define a coaxial cavity, a plasma vapor deposition torch located substantially adjacent to the flexible substrate for depositing at least one thin film material layer on an outer surface of the flexible substrate; and a traversing platform for supporting the rotatable substrate support relative to the plasma vapor deposition torch, the rotatable substrate support being traversed along its longitudinal axis by the traversing platform. | 12-31-2009 |
| 20100189926 | PLASMA DEPOSITION APPARATUS AND METHOD FOR MAKING HIGH PURITY SILICON - A plasma deposition apparatus for making high purity silicon, including a chamber for depositing said high purity silicon, the chamber including a top defining substantially an upper end of the chamber; one or more sides having an upper end and a lower end, the top substantially sealingly joining the upper end of the one or more sides; a base defining substantially a lower end of the chamber, the base substantially sealingly joining the lower end of the one or more sides; and at least one induction coupled plasma torch disposed in the top, the at least one induction coupled plasma torch oriented in a substantially vertical position producing a plasma flame downward from the top towards the base, the plasma flame defining a reaction zone for reacting one or more reactants to produce the high purity. | 07-29-2010 |
Mohd A. Aslami, Stubridge, MA US
| Patent application number | Description | Published |
|---|---|---|
| 20100184251 | PLASMA INSIDE VAPOR DEPOSITION APPARATUS AND METHOD FOR MAKING MULTI-JUNCTION SILICON THIN FILM SOLAR CELL MODULES AND PANELS - A plasma inside vapor deposition apparatus for making silicon thin film solar cell modules including means for supporting a substrate, the substrate having an outer surface and an inner surface; plasma torch means located proximal to the inner surface for depositing at least one thin film layer on the inner surface of the substrate, the plasma torch means located a distance from the substrate; and means for supplying reagent chemicals to the plasma torch means, wherein the at least one thin film layer form the silicon thin film solar cell modules. | 07-22-2010 |
Mohd A. Aslami, Sturbridge, MA US
| Patent application number | Description | Published |
|---|---|---|
| 20090209093 | PLASMA DEPOSITION APPARATUS AND METHOD FOR MAKING POLYCRYSTALLINE SILICON - A plasma deposition apparatus for making polycrystalline silicon including a chamber for depositing said polycrystalline silicon, the chamber having an exhaust system for recovering un-deposited gases; a support located within the deposition chamber for holding a target substrate having a deposition surface, the deposition surface defining a deposition zone; at least one induction coupled plasma torch located within the deposition chamber and spaced apart from the support, the at least one induction coupled plasma torch producing a plasma flame that is substantially perpendicular to the deposition surface, the plasma flame defining a reaction zone for reacting at least one precursor gas source to produce the polycrystalline silicon for depositing a layer of the polycrystalline silicon the deposition surface. | 08-20-2009 |