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Arunagiri
Kumara Arunagiri, Bangalore IN
| Patent application number | Description | Published |
|---|---|---|
| 20110264710 | MONITORING AND REPORTING PRODUCTIVITY IN ENTERPRISE ENVIRONMENT - A system and associated method for monitoring and reporting productivity in an enterprise environment. The enterprise environment has a server, a database, a client program and a web interface. The database stores transaction data and administration data. The transaction data stores records of time spent by an end user to perform a certain volume of work for a transaction. The administration data configures operations of the client program per transaction. The client program records a time log and provides an interface to upload a volume log of the transaction. The end user or an administrative user manages content of the database via web interface. The server processes a respective request for recording transaction time and volume log and subsequently generates a productivity report including efficiency, availability, and utilization values based on the transaction data in the database. | 10-27-2011 |
Muthulingham Arunagiri, Bangalore IN
| Patent application number | Description | Published |
|---|---|---|
| 20100267968 | METHOD FOR THE PREPARATION OF DULOXETINE HYDROCHLORIDE - The present invention relates to an improved process for the preparation of Duloxetine and its intermediates (S)-(+)-N,N-dimethyl-3-(1-naphthalenyloxy)-3-(2-thienyl)propanamine by reacting (S)-(+)-N,N-dimethyl-3-(2-thienyl)-3-hydroxypropanamine with 1-fluoronaphthalene in the presence of a base; wherein the improvement lies in conducting the reaction in the absence of solvent. | 10-21-2010 |
Tiruchirapalli N. Arunagiri, Newark, CA US
| Patent application number | Description | Published |
|---|---|---|
| 20100062164 | Methods and Solutions for Preventing the Formation of Metal Particulate Defect Matter Upon a Substrate After a Plating Process - Methods and solutions for preventing the formation of metal particulate defect matter upon a substrate after plating processes are provided. In particular, solutions are provided which are free of oxidizing agents and include a non-metal pH adjusting agent in sufficient concentration such that the solution has a pH between approximately 7.5 and approximately 12.0. In some cases, a solution may include a chelating agent. In addition or alternatively, a solution may include at least two different types of complexing agents each offering a single point of attachment for binding metal ions via respectively different functional groups. In any case, at least one of the complexing agents or the chelating agent includes a non-amine or non-imine functional group. An embodiment of a method for processing a substrate includes plating a metal layer upon the substrate and subsequently exposing the substrate to a solution comprising the aforementioned make-up. | 03-11-2010 |
