Patent application number | Description | Published |
20100128367 | PROJECTION OBJECTIVE FOR A MICROLITHOGRAPHY APPARATUS AND METHOD - A projection objective for a microlithography apparatus with improved imaging properties is provided. A manipulator for a projection objective is provided. A microlithography apparatus including a projection objective of this type and/or a manipulator of this type is provided. A method for improving the imaging properties of a projection objective is provided. | 05-27-2010 |
20100309433 | Illumination device and observation device - An illumination device ( | 12-09-2010 |
20100321637 | Illumination device as well as observation device - Among other items, an illumination device ( | 12-23-2010 |
20110019172 | ILLUMINATION OPTICS AND PROJECTION EXPOSURE APPARATUS - An illumination optics illuminates an object field of a projection exposure apparatus for microlithography. The illumination optics include a condenser group of optical components which guide a bundle of useful light. An objective group of bundle-guiding components is arranged downstream of the condenser group. At least one component of the condenser group and at least one component of the objective group are displaceable for compensation of deviations of the object field, which is in an actual illumination state, from a desired illumination state. | 01-27-2011 |
20110102758 | ILLUMINATION SYSTEM FOR A MICROLITHOGRAPHY PROJECTION EXPOSURE APPARATUS, MICROLITHOGRAPHY PROJECTION EXPOSURE APPARATUS COMPRISING SUCH AN ILLUMINATION SYSTEM, AND FOURIER OPTICAL SYSTEM - An illumination system for a microlithography projection exposure apparatus for illuminating an illumination field with the light from a primary light source has a variably adjustable pupil shaping unit for receiving light from the primary light source and for generating a variably adjustable two-dimensional intensity distribution in a pupil shaping surface of the illumination system. The pupil shaping unit has a Fourier optical system for converting an entrance beam bundle entering through an entrance plane of the Fourier optical system into an exit beam bundle exiting from an exit plane of the Fourier optical system. The Fourier optical system has a focal length f | 05-05-2011 |
20120008195 | MICROSCOPE SYSTEM - Microscope system for acquiring a plurality of images, comprising: a zoom system which is configured to continuously vary a magnification of the microscope system over a magnification range of the microscope system, wherein the zoom system comprises two movable zoom components, which are arranged movably along a common optical axis of the microscope system; an aperture stop, which is configured such that a plurality of different observation beam paths of the microscope system are selectable, which traverse the zoom system; wherein the aperture stop, as seen along the optical axis, is arranged between the two movable zoom components; and wherein for all values of the magnification within the magnification range, the aperture stop is located within an aperture stop range which is measured along the optical axis and which surrounds a pupil position of the microscope system. | 01-12-2012 |
20120229605 | OPTICAL OBSERVATION INSTRUMENT WITH AT LEAST TWO OPTICAL TRANSMISSION CHANNELS THAT RESPECTIVELY HAVE ONE PARTIAL RAY PATH - An optical observation instrument has two optical transmission channels for transmitting two partial ray bundles ( | 09-13-2012 |
20120300195 | METHOD AND APPARATUS FOR SETTING AN ILLUMINATION OPTICAL UNIT - A method for setting an illumination optical unit involves determining an actual value of an intensity-weighted illumination parameter of the illumination optical unit for multiple field points and for multiple illumination angles. The influence of a deformation of at least one of the optical surfaces of the illumination optical unit on the at least one illumination parameter is then determined. A desired value of the illumination parameter is then predefined. A desired form of the at least one optical surface is determined so that the actual value of the illumination parameter corresponds to the desired value of the illumination parameter within predefined limits. Finally, the optical surface is deformed with the aid of at least one actuator so that an actual form of the optical surface corresponds to the desired form. | 11-29-2012 |
20130076889 | DISPLAY DEVICE AND DISPLAY METHOD - A display device includes an image acquisition module which has an image sensor and a first focal plane, which captures a picture of an object, and an observation module which images the object such that a user can perceive it with his eye. A second focal plane is set by the observation module and the accommodation state of the eye, and with a measuring module for measuring the accommodation state of the eye. A control unit adjusts the position of the first focal plane on the basis of the measured accommodation state such that it coincides with the second focal plane. | 03-28-2013 |
20130083289 | Module for Transmitting a Light Beam and Surgical Microscope with Deflecting Element and Fundus Imaging System - The invention is directed to a module for transmitting a light beam ( | 04-04-2013 |
20130265637 | STEREOSCOPIC MICROSCOPE - A stereoscopic microscopic providing at least one pair of stereoscopic optical paths comprises an objective system, a first focusing lens having a first optical refractive power and a second focusing lens having a second optical refractive power and at least one actuator. The first optical refractive power and the second optical refractive have different signs. The objective system and the first and second focusing lenses are commonly traversed by the at least one pair of stereoscopic optical paths, respectively. The actuator shifts at least one of these first and second focusing lenses along the at least one pair of stereoscopic optical paths to change the working distance and/or to vary an optical refractive power of at least one of these first and second focusing lenses. The first focusing lens is immediately neighboring the objective system along the at least one pair of stereoscopic optical paths. | 10-10-2013 |
20140049633 | IMAGING SYSTEM AND IMAGING METHOD - An imaging system with an imaging lens system for imaging an object into an image plane is disclosed. The imaging lens system contains an optical component for a higher depth of field, of which the refractive power is alterable and the optical effect remains rotation-symmetrical. | 02-20-2014 |
20140185027 | ILLUMINATION OPTICS AND PROJECTION EXPOSURE APPARATUS - An illumination optics illuminates an object field of a projection exposure apparatus for microlithography. The illumination optics include a condenser group of optical components which guide a bundle of useful light. An objective group of bundle-guiding components is arranged downstream of the condenser group. At least one component of the condenser group and at least one component of the objective group are displaceable for compensation of deviations of the object field, which is in an actual illumination state, from a desired illumination state. | 07-03-2014 |
20140340500 | Surgical Microscope with Enlarged Working Distance - A surgical microscope | 11-20-2014 |
20150085357 | OPTICAL IMAGING SYSTEM - An optical imaging system generates an image of an object plane and includes a lens system which, in turn, includes a main objective and a reduction optical unit ahead of the main objective. The lens system is aligned along an optical axis and the reduction optical unit includes a first lens with a positive refractive power and a second lens with a negative refractive power. An object-side first main plane and an image-side second main plane are defined by the lens system. The optical imaging system defines an observation beam path which is guided through the lens system so that, in the first main plane and in the second main plane, the observation beam path is at a distance (B) from the optical axis. The first lens is of a first material having a first Abbe number and the second lens is of a second material having a second Abbe number, wherein the first Abbe number is greater than the second Abbe number. | 03-26-2015 |
20150085358 | Optical Imaging System - An optical imaging system generates an image of an object plane and includes a lens system which, in turn, includes a main objective and a reduction optical unit between the main objective and the object plane. The reduction optical unit includes a first composite element with a positive refractive power and a second composite element with a negative refractive power. The first composite element includes a first and second lens. The second composite element includes a third and fourth lens. An object-side first main plane and an image-side second main plane are defined by the lens system. The optical imaging system defines an observation beam path which is guided through the lens system so that, in each of the first main plane and the second main plane, the observation beam path is at a distance from the optical axis of the lens system. | 03-26-2015 |