| Patent application number | Description | Published |
|---|
| 20080218721 | OPTICAL ELEMENT UNIT - An optical element unit including an optical element and an optical element holder is disclosed. The optical element holder includes a holding element and coupling elements. The holding element holds the optical element and is made of a ceramic material. The elastic coupling elements are attached to the holding element and contact the optical element. The elastic coupling elements provide deformation decoupling between the holding element and the optical element. | 09-11-2008 |
| 20080278828 | Optical Element - An optical element has at least one additional element fitted thereon which dissipates the vibrational energy of the optical element by friction. | 11-13-2008 |
| 20090174874 | Optical Projection System - An optical projection unit comprising a first optical element module and at least one second optical element module is provided. The first optical element module comprises a first housing unit and at least a first optical element, the first optical element being received within the first housing unit and having an optically used first region defining a first optical axis. The at least one second optical element module is located adjacent to the first optical element module and comprises at least one second optical element, the second optical element defining a second optical axis of the optical projection unit. The first housing unit has a central first housing axis and an outer wall extending in a circumferential direction about the first housing axis. The first optical axis is at least one of laterally offset and inclined with respect to the first housing axis. Furthermore, the first housing axis is substantially collinear with the second optical axis. | 07-09-2009 |
| 20090207511 | ASSEMBLY FOR ADJUSTING AN OPTICAL ELEMENT - An assembly for fixation or adjusting of an optical element ( | 08-20-2009 |
| 20090219497 | OPTICAL DEVICE WITH STIFF HOUSING - The disclosure relates to an optical device, such as for microlithography, that includes an optical module and a supporting structure. The disclosure also relates to an optical module that includes an optical element and a carrier structure for the optical element. the carrier structure can be connected to the optical element via at least one holding element. The carrier structure can be fixed to the supporting structure and produced, for example, from a material having a coefficient of thermal expansion α<0.2*10 | 09-03-2009 |
| 20090244508 | METHOD AND DEVICE FOR CONNECTING AN OPTICAL ELEMENT TO A FRAME - A method and a device for the material-fit connection of an optical element to a frame are disclosed. | 10-01-2009 |
| 20090244509 | OPTICAL SYSTEM WITH AN EXCHANGEABLE, MANIPULABLE CORRECTION ARRANGEMENT FOR REDUCING IMAGE ABERRATIONS - The disclosure relates to an optical system, such as a projection exposure apparatus for semiconductor lithography, including a manipulable correction arrangement for reducing image aberrations. In some embodiments, the system includes at least one manipulator configured to reduce image aberrations. The manipulator can include at least one optical element which can be manipulated by at least one actuator. The manipulator can be formed in changeable fashion together with an actuator. | 10-01-2009 |
| 20090284849 | Arrangement for Mounting An Optical Element - Arrangements for mounting an optical element, such as a lens or a mirror, are disclosed. | 11-19-2009 |
| 20100128367 | PROJECTION OBJECTIVE FOR A MICROLITHOGRAPHY APPARATUS AND METHOD - A projection objective for a microlithography apparatus with improved imaging properties is provided. A manipulator for a projection objective is provided. A microlithography apparatus including a projection objective of this type and/or a manipulator of this type is provided. A method for improving the imaging properties of a projection objective is provided. | 05-27-2010 |
| 20110025992 | OPTICAL SYSTEM HAVING AN OPTICAL ARRANGEMENT - An optical system, such as an illumination system, includes an optical arrangement having at least one optical element and at least one heat dissipation element configured to at least partially dissipate thermal energy generated in the optical element(s) to the outside environment of the optical system. The heat dissipation element(s) is(are) arranged without direct contact with the optical element(s). | 02-03-2011 |
| 20110128521 | ACTUATORS AND MICROLITHOGRAPHY PROJECTION EXPOSURE SYSTEMS AND METHODS USING THE SAME - An actuator includes a housing and a rotor that can be moved in relation to the housing in the effective direction of the actuator, wherein the actuator includes an advancing unit that is connected to the rotor at least part of the time. The advancing unit includes at least one deformation unit and at least one deformer for deforming the deformation unit. The at least one deformer is suited to deform the deformation unit perpendicular to the effective direction of the actuator such that the total length of the deformation unit changes in the effective direction as a result of the deformation. The actuator can be used in a projection exposure system for semiconductor lithography. | 06-02-2011 |
| 20110165522 | IMAGING OPTICAL SYSTEM - An imaging optical system includes a plurality of mirrors configured to image an object field in an object plane of the imaging optical system into an image field in an image plane of the imaging optical system. An illumination system includes such an imaging optical system. The transmission losses of the illumination system are relatively low. | 07-07-2011 |
