Patent application number | Description | Published |
20080200036 | Printable Etching Media For Silicon Dioxide and Silicon Nitride Layers - The present invention relates to a novel printable etching medium having non-Newtonian flow behaviour for the etching of surfaces in the production of solar cells, and to the use thereof. The present invention furthermore also relates to etching and doping media which are suitable both for the etching of inorganic layers and also for the doping of underlying layers. In particular, they are corresponding particle-containing compositions by means of which extremely fine structures can be etched very selectively without damaging or attacking adjacent areas. | 08-21-2008 |
20080210298 | Combined Etching and Doping Media for Silicon Dioxide Layers and Underlying Silicon - The present invention relates firstly to HF/fluoride-free etching and doping media which are suitable both for the etching of silicon dioxide layers and also for the doping of underlying silicon layers. The present invention also relates secondly to a process in which these media are employed. | 09-04-2008 |
20080210660 | Medium For Etching Oxidic, Transparent, Conductive Layers - The present invention relates to a novel dispensable medium for etching doped tin oxide layers having non-Newtonian flow behaviour for etching surfaces in the production of displays and/or solar cells and to the use thereof. In particular, it relates to corresponding particle-free compositions by means of which fine structures can be etched selectively without damaging or attacking adjacent areas. | 09-04-2008 |
20080217576 | Etching Media for Oxidic, Transparent, Conductive Layers - The present invention relates to a novel etching medium for the structuring of transparent, conductive layers, as are used, for example, in the production of liquid-crystal displays (LCDS) using flat-panel screens or of organic light-emitting displays (OLEDs) or in thin-film solar cells. Specifically, it relates to particle-free compositions by means of which fine structures can be etched selectively in oxidic, transparent and conductive layers without damaging or attacking adjacent areas. The novel liquid etching medium can advantageously be applied by means of printing processes to the oxidic, transparent, conductive layers to be structured. Subsequent heat treatment accelerates or initiates the etching process. | 09-11-2008 |
20080241044 | Process for the Production of Monodisperse Sio2 Particles - The present invention relates to processes for the production of monodisperse SiO | 10-02-2008 |
20080286370 | Nanoscale Particles Used as Contrasting Agents in Magnetic Resonance Imaging - The invention relates to nanoscale particles as contrast agents for magnetic resonance imaging, consisting of a core having an inert matrix, one or more covalently bonded organic complexing agents in which one or more metal ions having unpaired electrons are bonded, and optionally one or more biomolecules covalently bonded to the surface of the cores, and to a process for the production of these nanoparticles. | 11-20-2008 |
20100068889 | PARTICLE-CONTAINING ETCHING PASTES FOR SILICON SURFACES AND LAYERS - The present invention relates to particle-containing etching media in the form of etching pastes which are suitable for the full-area or selective etching of extremely fine lines or structures in silicon surfaces and layers and in glass-like surfaces formed from suitable silicon compounds. The present invention also relates to the use of the pastes according to the invention in processes for etching surfaces of this type. | 03-18-2010 |
20100068890 | PRINTABLE MEDIUM FOR ETCHING OXIDIC, TRANSPARENT AND CONDUCTIVE LAYERS - The present invention relates to novel printable etching media having improved properties for use in the process for the production of solar cells. These are corresponding particle-containing compositions by means of which extremely fine lines and structures can be etched very selectively without damaging or attacking adjacent areas. | 03-18-2010 |
20110123620 | SILICON DIOXIDE NANOPARTICLES AND THE USE THEREOF FOR VACCINATION - The invention relates to ultrasmall, monodisperse nanoparticles comprising silicon dioxide to the surface of which at least one antigen is attached. The nanoparticles can be used for the immunoprophylaxis or immunotherapy of cancer. The invention also relates to a method for the targeting of antigens at antigen-presenting cells and for the activation of the immune system, where the efficiency of targeting and/or immunoactivation are set via the particle characteristics. The invention also relates to a method for the active and passive immunisation of a mammal. | 05-26-2011 |
20120032108 | PRINTABLE ETCHING MEDIA FOR SILICON DIOXIDE AND SILICON NITRIDE LAYERS - The present invention relates to a novel printable etching medium having non-Newtonian flow behaviour for the etching of surfaces in the production of solar cells, and to the use thereof. The present invention furthermore also relates to etching and doping media which are suitable both for the etching of inorganic layers and also for the doping of underlying layers. In particular, they are corresponding particle-containing compositions by means of which extremely fine structures can be etched very selectively without damaging or attacking adjacent areas. | 02-09-2012 |
20120122788 | E-POLYLYSINE CONJUGATES AND THE USE THEREOF - The present invention relates to ε-polylysine conjugates, in particular conjugates of ε-polylysine with compounds carrying carboxyl groups, and to the preparation and use thereof for targeting of the kidney. | 05-17-2012 |