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Arjunan
Arul Chakkaravarthi Arjunan, Gainesville, FL US
| Patent application number | Description | Published |
|---|---|---|
| 20100258528 | CHEMICAL MECHANICAL POLISHING OF SILICON CARBIDE COMPRISING SURFACES - Slurry compositions and chemically activated CMP methods for polishing a substrate having a silicon carbide surface using such slurries. In such methods, the silicon carbide surface is contacted with a CMP slurry composition that comprises i) a liquid carrier and ii) a plurality of particles having at least a soft surface portion, wherein the soft surface portion includes a transition metal compound that provides a Mohs hardness ≦6, and optionally iii) an oxidizing agent. The oxidizing agent can include a transition metal. The slurry is moved relative to the silicon carbide comprising surface, wherein at least a portion of eth silicon carbide surface is removed. | 10-14-2010 |
| 20100260977 | CHEMICAL MECHANICAL FABRICATION (CMF) FOR FORMING TILTED SURFACE FEATURES - A method of chemical-mechanical fabrication (CMF) for forming articles having tilted surface features. A substrate is provided having a patterned surface including two different layer compositions or a non-planar surface having at least one protruding or recessed feature, or both. The patterned surface are contacted with a polishing pad having a slurry composition, wherein a portion of surface being polished polishes at a faster polishing rate as compared to another portion to form at least one tilted surface feature. The tilted surface feature has at least one surface portion having a surface tilt angle from 3 to 85 degrees and a surface roughness<3 nm rms. The tilted surface feature includes a post-CMF high elevation portion and a post-CMF low elevation portion that defines a maximum height (h), wherein the tilted surface feature defines a minimum lateral dimension (r), and h/r is ≧0.05. | 10-14-2010 |
Palanisamy Arjunan, Houston, TX US
| Patent application number | Description | Published |
|---|---|---|
| 20110169199 | Process For Preparing Articles - The present invention relates to a process for preparing a thermoplastic vulcanizate (TPV) comprising: contacting a thermoplastic polymer, a cross-linkable elastomer, at least one curative, and at least one cure activator in a solvent to form Composition A. The solvent is then removed, and thereafter the cross-linkable elastomer is at least partially cured. The average particle size of the cross-linkable elastomer is 10 microns or less after the solvent is removed. | 07-14-2011 |
Palanisamy Arjunan, Baton Rouge, LA US
| Patent application number | Description | Published |
|---|---|---|
| 20110196101 | Homogeneous Polymer Blend and Process of Making the Same - A homogeneous polymer blend comprises a thermoplastic first polymer having a crystallinity of at least 30%; and a second polymer having a crystallinity of more than 5% and being at least partially cross-linked. | 08-11-2011 |
Sam Arjunan, Grand Prairie, TX US
| Patent application number | Description | Published |
|---|---|---|
| 20110036940 | MECHANICAL FLIGHT CONTROL AUXILIARY POWER ASSIST SYSTEM - A mechanical flight control system for a rotary-wing aircraft is disclosed. The flight control system comprises an upstream portion, a downstream portion, and an assembly for connecting the upstream portion to the downstream portion. The assembly may comprise dual concentric valve actuators and/or a variety of system load limiting features. | 02-17-2011 |
Sankar Arjunan, Mumbai IN
| Patent application number | Description | Published |
|---|---|---|
| 20100317856 | PROCESS FOR THE PREPARATION OF R-SITAGLIPTIN AND ITS PHARMACEUTICALLY ACCEPTABLE SALTS THEREOF - The present invention provides processes for the preparation of R-sitagliptin and its pharmaceutically acceptable salts thereof. | 12-16-2010 |
Sankar Arjunan, Navi Mumbai IN
| Patent application number | Description | Published |
|---|---|---|
| 20090054441 | Process For The Preparation of an Optically Active 5H-Pyrrolo [3,4-B] Pyrazine Derivative - A substantially pure dextrorotatory isomer of zopiclone or a pharmaceutically acceptable salt thereof and crystalline forms thereof are provided. Also provided is a process for its preparation and pharmaceutical compositions containing same. | 02-26-2009 |