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Aritsuka
Makoto Aritsuka, Chiba JP
| Patent application number | Description | Published |
|---|---|---|
| 20090179357 | Method and Apparatus for Producing Porous Silica - There are provided a method for producing porous silica and a porous silica film having low specific dielectric constant and high mechanical strength, that are preferably applicable to optical functional materials, electronic functional materials or the like, and a method for producing an interlayer insulating film, a semiconductor material and a semiconductor apparatus and a producing apparatus, which use the porous silica film. A solution containing a hydrolysis-condensation product of alkoxysilanes and a surfactant is dried to form a composite to which are then applied in the following order an ultraviolet ray irradiation treatment and a hydrophobic treatment with the use of an organic silicon compound having an alkyl group. By forming the composite by drying the solution on a substrate, the porous silica film is obtained. | 07-16-2009 |
Toshiyuki Aritsuka, Kodaira JP
| Patent application number | Description | Published |
|---|---|---|
| 20110154216 | GUI CUSTOMIZING METHOD, SYSTEM AND PROGRAM - A processor executes different types of programs in the memory. Namely, the processor customizes the user's GUI by utilizing a processing unit to judge the user's skill level based on the quality of task results and task time, a processing unit to extract the GUI usage status based on the GUI operating history of the user, a category sorter unit to sort the users into the multiple categories according to the task content and skill level of the user, a processing unit to perform clustering the user group based on the usage status for each sorted category, and a processing unit to customize the GUI based on the usage status in each cluster grouped by a clustering method, and sorts the user for GUI customizing into one of clusters and customizes the user's GUI by applying the GUI customizing method set for that corresponding cluster. | 06-23-2011 |
Tsutomu Aritsuka, Obihiro-Shi JP
| Patent application number | Description | Published |
|---|---|---|
| 20100233290 | USE OF DIFRUCTOSE ANHYDRIDE-CONTAINING COMPOSITION - A method for increasing the absorption of magnesium, zinc, and/or copper through the intestines of a subject desiring such an increase, includes administering to the subject a difructose anhydride (DFA) in an amount effective to increase the absorption of magnesium, zinc, and/or copper present in the intestines. | 09-16-2010 |
| 20100234317 | USE OF DIFRUCTOSE ANHYDRIDE-CONTAINING COMPOSITION - A method for improving bowel movement of a subject desiring such an improvement, includes administering to the subject a defructose anhydride (DFA) in an amount effective to improve bowel movement. | 09-16-2010 |
Tsutomu Aritsuka, Hokkaido JP
| Patent application number | Description | Published |
|---|---|---|
| 20090209484 | PREVENTIVE AND/OR THERAPEUTIC AGENT FOR CALCIPENIA - The invention is to develop an agent having at least one of anricalclpenic, antiedemic and diuretic activities for humans or animals and to inhibit the postpartum drop of the calcium concentration in blood, thereby maintaining the health of the mother body and smoothing nursing and lactation. | 08-20-2009 |
Yuki Aritsuka, Tokyo JP
| Patent application number | Description | Published |
|---|---|---|
| 20100169042 | SYSTEM FOR MEASURING A SHAPE, METHOD FOR MEASURING A SHAPE, AND COMPUTER PROGRAM PRODUCT - A system for measuring a shape, includes an external storage unit storing tolerances of first and second shape factors defining a design shape of a measuring object; a first measuring tool measuring the first shape factor of the measuring object to obtain measurement data; and a measurement processing unit determining a shape of the measuring object. The measurement processing unit includes; a comparison module comparing the measurement data of the first shape factor with the tolerance of the first shape factor; a verification module composing a predicted shape using the measurement data and verifying whether the predicted shape is formed as a figure; a calculation module calculating predicted data of the second shape factor from the predicted shape; and a determination module determining a measurement shape by comparing the predicted data with the tolerance of the second shape factor. | 07-01-2010 |
| 20100189839 | IMPRINT MOLD - An imprint mold including a substrate of transparent material having a first principal surface having a pattern region and a second principal surface; a first light shielding film provided on the first principal surface, along a periphery of the pattern region; and a second light shielding film provided on the second principal surface, having an opening including an opposite region to the pattern region, a part of the second light shielding film opposite to the first light shielding film. In a cross section perpendicular to the substrate, the maximum incident angle of the light for curing a transfer layer to the second principal surface is less than an angle between a perpendicular line of the second principal surface and a line connecting an end of the second light shielding film on a side of the opening and a farthest end of the first light shielding film from the pattern region. | 07-29-2010 |