| Patent application number | Description | Published |
| 20090270299 | Composition for removing protective layer in fabrication of MEMS and method for removing same - There is provided a composition that can effectively remove a protective coating and a primer coating that have a resistance to etching solutions and are rendered unnecessary after wet-etching treatment in MEMS fabrication processes, and a method for removing the protective layer. The composition contains (A) at least one organic solvent selected from the group consisting of amides, lactones, pyrrolidones and ketones, (B) water, and (C) a fluoride, in an amount of 80.00 to 99.90 mass %, 0.05 to 12.00 mass %, and 0.05 to 8.00 mass %, respectively. The composition may further contain (D) phosphoric acid, phosphonic acid or phosphinic acid in an amount over 0 mass part to 5.5 mass parts, or (E) an organic amine in an amount over 0 mass part to 45 mass parts, based on 100 mass parts of the composition. | 10-29-2009 |
| 20090270300 | Composition for removing protective layer in fabrication of mems and method for removing same - There is provided a composition that can effectively remove a protective coating and a primer coating that have a resistance to etching solutions and are rendered unnecessary after wet-etching treatment in MEMS fabrication processes, and a method for removing the protective layer. The composition contains (A) at least one organic solvent selected from the group consisting of amides, lactones, pyrrolidones and ketones, (B) water, and (C) a fluoride, in an amount of 80.00 to 99.90 mass %, 0.05 to 12.00 mass %, and 0.05 to 8.00 mass %, respectively. The composition may further contain (D) phosphoric acid, phosphonic acid or phosphinic acid in an amount over 0 mass part to 5.5 mass parts, or (E) an organic amine in an amount over 0 mass part to 45 mass parts, based on 100 mass parts of the composition. | 10-29-2009 |
| Patent application number | Description | Published |
| 20090190826 | WORKING APPARATUS AND CALIBRATION METHOD THEREOF - A working apparatus comprises a working unit which executes work on a work subject, and a calibration jig on which a plurality of markers is arranged in a radial pattern from a center point of markers, the plurality of markers being arranged in three dimensions, and the calibration jig being attached to a working unit such that a calibration reference point set of a working unit coincides with a center point of markers. According to such a composition, it becomes possible to calibrate a position of a working unit even when a portion of the jig containing a center point of markers is occluded during image measurement. | 07-30-2009 |
| 20100131235 | WORK SYSTEM AND INFORMATION PROCESSING METHOD - In a work system which measures 3D information of a target object by a light-section method, high measurement precision is realized. The invention includes a robot arm, a hand position detection member which is arranged at the distal end portion of the robot arm, a slit laser projector which irradiates slit light, a camera which is fixed at a position independent of the robot arm, and senses an image of the target object, and a computer which calculates a light-section plane of the slit light based on a light-section line formed on the hand position detection member which is included in image data of the target object obtained by image sensing by the camera, and calculates the position and orientation of the target object based on the calculated light-section plane and the light-section line formed on the target object. | 05-27-2010 |
| 20100161125 | WORK APPARATUS AND CALIBRATION METHOD FOR THE SAME - A work apparatus sets a virtual target point on an image plane in an imaging apparatus, and obtains a plurality of coordinate values of a moving unit at which a work reference point of a work unit and the virtual target point are caused to match in an image captured by the imaging apparatus. Further, the work apparatus obtains, in the image, coordinate values of the moving unit at which a position of light projection by a distance information obtaining unit and the virtual target point are caused to match, and a plurality of pieces of distance information obtained from the distance information obtaining unit at those coordinate positions. Then, the work apparatus calculates, based on the plurality of coordinate values and the plurality of pieces of distance information obtained through the above processing, a calibration parameter for the moving unit and the distance information obtaining unit. | 06-24-2010 |
| 20110103652 | IMAGE PROCESSING APPARATUS AND IMAGE PROCESSING METHOD - A feature amount cluster holding unit extracts respective feature amounts from N images sensed under N respective types of image sensing conditions, and manages the feature amounts extracted from each sensed image as a feature amount cluster in association with corresponding one of the image sensing conditions. A feature space distance calculation unit specifies the second feature amount cluster containing a feature amount similar to the feature amount of interest in the first feature amount cluster. An image sensing condition setting unit specifies sets of feature amounts associated with the N respective types of image sensing conditions from the first and second feature amount clusters. The image sensing condition setting unit specifies a set having a largest distance between feature amounts in the set among the specified sets. An image sensing condition associated with the specified set is output as an image sensing condition for discriminating the feature amount clusters. | 05-05-2011 |