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Aoai

Natsumi Aoai, Tokyo JP

Patent application numberDescriptionPublished
20100209669PHOTOSENSITIVE RESIN COMPOSITION - There is provided a photosensitive resin composition comprising: 08-19-2010

Toshiaki Aoai, Shizuoka JP

Patent application numberDescriptionPublished
20090148791POSITIVE PHOTOSENSITIVE COMPOSITION - A positive photosensitive composition comprises a compound capable of generating a specified sulfonic acid upon irradiation with one of an actinic ray and radiation and (B) a resin capable of decomposing under the action of an acid to increase the solubility in an alkali developer.06-11-2009
20100255419POSITIVE PHOTOSENSITIVE COMPOSITION - A positive photosensitive composition comprises a compound capable of generating a specified sulfonic acid upon irradiation with one of an actinic ray and radiation and (B) a resin capable of decomposing under the action of an acid to increase the solubility in an alkali developer.10-07-2010

Patent applications by Toshiaki Aoai, Shizuoka JP

Toshiaki Aoai, Kanagawa JP

Patent application numberDescriptionPublished
20090263605SURFACE-HYDROPHILIC STRUCTURE - A structure comprising: an adhesive layer; a plastic substrate; and a hydrophilic coating film, provided in this order, wherein the hydrophilic coating film includes a cross-linked structure produced by hydrolysis and polycondensation with an aqueous solution containing (a) a hydrophilic polymer and (b) an alkoxide of a metal selected from the group consisting of Si, Ti, Zr, and Al.10-22-2009
20090274914HYDROPHILIC MEMBER AND PROCESS FOR PRODUCING THE SAME - A hydrophilic member comprising a substrate and a hydrophilic coating film provided on the substrate, wherein the hydrophilic coating film is produced by coating a substrate with an aqueous solution containing (a) a hydrophilic polymer, (b) an alkoxide of a metal selected from the group consisting of Si, Ti, Zr, and Al, and (c) a metal complex catalyst, and heat-drying the solution applied.11-05-2009