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Antonelli, US
Andrew Antonelli, Portland, OR US
| Patent application number | Description | Published |
|---|---|---|
| 20100099271 | METHOD FOR IMPROVING PROCESS CONTROL AND FILM CONFORMALITY OF PECVD FILM - A method for forming a silicon-based dielectric film on a substrate with a single deposition process operation using pulsed plasma enhanced chemical vapor deposition (PECVD) wherein the high frequency radio frequency power of the plasma is pulsed, allows enhanced control, efficiency and product quality of the PECVD process. Pulsing the high frequency RF power of the plasma reduces the deposited film thickness per unit time the high frequency RF power of the plasma is on. This yields silicon-based dielectric films that are both thin and conformal. | 04-22-2010 |
| 20110133313 | HARDMASK MATERIALS - Hardmask films having high hardness and low stress are provided. In some embodiments a film has a stress of between about −600 MPa and 600 MPa and hardness of at least about 12 GPa. In some embodiments, a hardmask film is prepared by depositing multiple sub-layers of doped or undoped silicon carbide using multiple densifying plasma post-treatments in a PECVD process chamber. In some embodiments, a hardmask film includes a high-hardness boron-containing film selected from the group consisting of Si | 06-09-2011 |
Andy Antonelli, Phoenix, AZ US
| Patent application number | Description | Published |
|---|---|---|
| 20080242054 | Dicing and drilling of wafers - Methods and apparatus to dicing and/or drilling of wafers are described. In one embodiment, an electromagnetic radiation beam (e.g., a relatively high intensity, ultra-short laser beam) may be used to dice and/or drill a wafer. Other embodiments are also described. | 10-02-2008 |
Dominic Antonelli, Berkeley, CA US
| Patent application number | Description | Published |
|---|---|---|
| 20090033683 | Method, system and apparatus for intelligent resizing of images - A new approach contemplating a variety of improved methods and systems to perform intelligent image resizing on an image is proposed. The approach enables a user to interactively mark or select portions of the image to preserve and/or remove. An energy function can then be used to calculate values of an energy metric, for a non-limiting example, entropy, on every pixel over the entire image. Such calculated values can then be used to determine the optimal regions where new pixels are to be inserted or existing pixels are to be removed in order to minimize the amount of energy lost (for shrinking) or added (for growing) in the image. | 02-05-2009 |
| 20090171766 | SYSTEM AND METHOD FOR PROVIDING ADVERTISEMENT OPTIMIZATION SERVICES - Systems and methods for providing advertisement optimization services are disclosed. In one aspect, embodiments of the present disclosure include a method, which may be implemented on a system, of analyzing a first set of images hosted by the web-publisher for display on the website. One embodiment can include, analyzing metadata associated with a set of advertisements available to the web-publisher for placement on the website, and identifying an advertisement suitable for placement on a webpage of the website for a fee. | 07-02-2009 |
| 20090172030 | SYSTEM AND METHOD FOR IMAGE CLASSIFICATION - Systems and methods for image classification are disclosed. In one aspect, embodiments of the present disclosure include a method, which may be implemented on a system, of selecting a predetermined number of training images that are representative of images associable with a particular topic category. One embodiment can include, extracting training image features from the training images, generating a set of descriptors characteristic of images associable with the particular topic category, and generating the particular set of predetermined models that correspond to the particular topic category based on the set of descriptors. | 07-02-2009 |
| 20090172730 | SYSTEM AND METHOD FOR ADVERTISEMENT DELIVERY OPTIMIZATION - Systems and methods for advertisement delivery optimization are disclosed. In one aspect, embodiments of the present disclosure include a method, which may be implemented on a system, of identifying multimedia content associated with a web-user. One embodiment can include, analyzing the multimedia content to retrieve a set of descriptors, comparing the set of descriptors with metadata of a plurality of advertisements, selecting a candidate pool of advertisements from the plurality of advertisements based on relevancy indicated by the comparison, and presenting at least a portion of the candidate pool of advertisements to the web-user. | 07-02-2009 |
Gary Dennis Antonelli, Niskayuna, NY US
| Patent application number | Description | Published |
|---|---|---|
| 20110013985 | Apparatus for shaping pavement - An apparatus for shaping pavement, the apparatus comprising: a pavement-shaping member for receiving a flow of shapeless pavement material and generating a flow of shaped pavement material; and a paving machine mount, operably coupled to the pavement-shaping member, for coupling the pavement-shaping member to a paving machine, the pavement-shaping member comprising a concave pavement-shaping surface being disposed at a pavement ramp angle less than about 45 degrees and having a single radius of curvature less than about 60 inches. | 01-20-2011 |
George A. Antonelli, Portland, OR US
| Patent application number | Description | Published |
|---|---|---|
| 20110111533 | UV AND REDUCING TREATMENT FOR K RECOVERY AND SURFACE CLEAN IN SEMICONDUCTOR PROCESSING - Treatment of carbon-containing low-k dielectric with UV radiation and a reducing agent enables process-induced damage repair. Also, treatment with a reducing agent and UV radiation is effective to clean a processed wafer surface by removal of metal oxide (e.g., copper oxide) and/or organic residue of CMP slurry from the planarized surface of a processed wafer with or without low-k dielectric. The methods of the invention are particularly applicable in the context of damascene processing to recover lost low-k property of a dielectric damaged during processing, either pre-metalization, post-planarization, or both, and/or provide effective post-planarization surface cleaning to improve adhesion of subsequently applied dielectric barrier and/or other layers. | 05-12-2011 |
George Andrew Antonelli, Portland, OR US
| Patent application number | Description | Published |
|---|---|---|
| 20100308463 | INTERFACIAL CAPPING LAYERS FOR INTERCONNECTS - Adhesive layers residing at an interface between metal lines and dielectric diffusion barrier (or etch stop) layers are used to improve electromigration performance of interconnects. Adhesion layers are formed by depositing a precursor layer of metal-containing material (e.g., material containing Al, Ti, Ca, Mg, etc.) over an exposed copper line, and converting the precursor layer to a passivated layer (e.g., nitridized layer). For example, a substrate containing exposed copper line having exposed Cu—O bonds is contacted with trimethylaluminum to form a precursor layer having Al—O bonds and Al—C bonds on copper surface. The precursor layer is then treated to remove residual organic substituents and to form Al—N, Al—H bonds or both. The treatment can include direct plasma treatment, remote plasma treatment, UV-treatment, and thermal treatment with a gas such as NH | 12-09-2010 |
| 20100317178 | REMOTE PLASMA PROCESSING OF INTERFACE SURFACES - Embodiments related to the cleaning of interface surfaces in a semiconductor wafer fabrication process via remote plasma processing are disclosed herein. For example, in one disclosed embodiment, a semiconductor processing apparatus comprises a processing chamber, a load lock coupled to the processing chamber via a transfer port, a wafer pedestal disposed in the load lock and configured to support a wafer in the load lock, a remote plasma source configured to provide a remote plasma to the load lock, and an ion filter disposed between the remote plasma source and the wafer pedestal. | 12-16-2010 |
| 20100317198 | REMOTE PLASMA PROCESSING OF INTERFACE SURFACES - Embodiments related to the cleaning of interface surfaces in a semiconductor wafer fabrication process via remote plasma processing are disclosed herein. For example, in one disclosed embodiment, a semiconductor processing apparatus comprises a processing chamber, a load lock coupled to the processing chamber via a transfer port, a wafer pedestal disposed in the load lock and configured to support a wafer in the load lock, and a remote plasma source configured to provide a remote plasma to the load lock. | 12-16-2010 |
| 20110120377 | REMOTE PLASMA PROCESSING OF INTERFACE SURFACES - Embodiments related to the cleaning of interface surfaces in a semiconductor wafer fabrication process via remote plasma processing are disclosed herein. For example, in one disclosed embodiment, a semiconductor processing apparatus comprises a processing chamber, a load lock coupled to the processing chamber via a transfer port, a wafer pedestal disposed in the load lock and configured to support a wafer in the load lock, a remote plasma source configured to provide a remote plasma to the load lock, and an ion filter disposed between the remote plasma source and the wafer pedestal. | 05-26-2011 |
| 20110135557 | HARDMASK MATERIALS - Hardmask films having high hardness and low stress are provided. In some embodiments a film has a stress of between about −600 MPa and 600 MPa and hardness of at least about 12 GPa. In some embodiments, a hardmask film is prepared by depositing multiple sub-layers of doped or undoped silicon carbide using multiple densifying plasma post-treatments in a PECVD process chamber. In some embodiments, a hardmask film includes a high-hardness boron-containing film selected from the group consisting of Si | 06-09-2011 |
| 20110236594 | In-Situ Deposition of Film Stacks - Methods and hardware for depositing film stacks in a process tool in-situ (i.e., without a vacuum break or air exposure) are described. In one example, a method for depositing, on a substrate, a film stack including films of different compositions in-situ in a process station using a plasma is described, the method including, in a first plasma-activated film deposition phase, depositing a first layer of film having a first film composition on the substrate; in a second plasma-activated deposition phase, depositing a second layer of film having a second film composition on the first layer of film; and sustaining the plasma while transitioning a composition of the plasma from the first plasma-activated film deposition phase to the second plasma-activated film deposition phase. | 09-29-2011 |
| 20110236600 | Smooth Silicon-Containing Films - Methods and hardware for depositing ultra-smooth silicon-containing films and film stacks are described. In one example, an embodiment of a method for forming a silicon-containing film on a substrate in a plasma-enhanced chemical vapor deposition apparatus is disclosed, the method including supplying a silicon-containing reactant to the plasma-enhanced chemical vapor deposition apparatus; supplying a co-reactant to the plasma-enhanced chemical vapor deposition apparatus; supplying a capacitively-coupled plasma to a process station of the plasma-enhanced chemical vapor deposition apparatus, the plasma including silicon radicals generated from the silicon-containing reactant and co-reactant radicals generated from the co-reactant; and depositing the silicon-containing film on the substrate, the silicon-containing film having a refractive index of between 1.4 and 2.1, the silicon-containing film further having an absolute roughness of less than or equal to 4.5 Å as measured on a silicon substrate. | 09-29-2011 |
| 20110244694 | DEPOSITING CONFORMAL BORON NITRIDE FILMS - A method of forming a boron nitride or boron carbon nitride dielectric produces a conformal layer without loading effect. The dielectric layer is formed by chemical vapor deposition (CVD) of a boron-containing film on a substrate, at least a portion of the deposition being conducted without plasma, and then exposing the deposited boron-containing film to a plasma. The CVD component dominates the deposition process, producing a conformal film without loading effect. The dielectric is ashable, and can be removed with a hydrogen plasma without impacting surrounding materials. The dielectric has a much lower wet etch rate compared to other front end spacer or hard mask materials such as silicon oxide or silicon nitride, and has a relatively low dielectric constant, much lower then silicon nitride. | 10-06-2011 |
Jason A. Antonelli, Redmond, WA US
| Patent application number | Description | Published |
|---|---|---|
| 20080320003 | SCALING NETWORK SERVICES USING DNS - Lookup requests received by a domain name service (DNS) are processed based on the actual location of data associated with a requested content page rather than a domain mapping of IP addresses. A DNS server which receives a request initiates a query for the location of user data associated with the request based on an object handle contained in a domain name of the request. The location data is used to construct an IP address which is provided in response to the IP lookup request received by the DNS server. The DNS system may be used to provide IP addresses for a scaled web-based networking service, alternate versions of a service and a service implementing rolling upgrades. | 12-25-2008 |
| 20120066288 | SCALABLY IMAGING CLIENTS OVER A NETWORK - Techniques exist for imaging clients over a network, such as the preboot execution environment (PXE) protocol. However, such techniques may not scale well (e.g., using broadcast messages and having few facilities for distributing the imaging service over several servers) and limited capacity to choose a particular image for a particular client. Instead, a set of servers may be configured such that each server is assigned a set of clients, and when a client sends an imaging query, only the server to which the client is assigned sends a reply. For example, a PXE server also comprising a DHCP server may reply to queries only for clients having a DHCP reservation on the server. The servers may also be configured to refer to a network map (e.g., a manageability data store) in order to identify the role of the client and the appropriate image to direct the client to apply. | 03-15-2012 |
Jason Andrew Antonelli, Redmond, WA US
| Patent application number | Description | Published |
|---|---|---|
| 20080313287 | E-MAIL PUBLISHING OF PHOTOS TO PHOTO ALBUMS - Aspects of the subject matter described herein relate to publishing content via e-mail. In aspects, a user configures a publishing component to enable photos to be published to an album via e-mail. The user may indicate valid e-mail addresses from which e-mails may be sent to publish to the album. A keyword is associated with the album. The keyword is used to generate an e-mail address associated with the album. This e-mail address is provided to the user. The user may then publish photos to the album by sending e-mails conveying photos to the e-mail address. The server hosting the album may verify that the e-mail came from a valid e-mail address. | 12-18-2008 |
Lynn Antonelli, Cranston, RI US
| Patent application number | Description | Published |
|---|---|---|
| 20120101344 | NON-CONTACT SYSTEM AND METHOD FOR MONITORING A PHYSIOLOGICAL CONDITION - Systems and methods are disclosed for measuring a physiological signal of a patient without having to contact the patient. A system can include a laser configured to provide an optical beam to a surface associated with a patient. A detector receives light from the surface in response to the optical beam. A controller is configured to generate velocity data representing a velocity of the surface based on the detected interference of the optical beam and the reflected light. A processor computes a corresponding displacement waveform representing displacement of the surface based on the velocity waveform, the displacement waveform representing the physiological condition. | 04-26-2012 |
Lynn T. Antonelli, Cranston, RI US
| Patent application number | Description | Published |
|---|---|---|
| 20080314155 | Remote Voice Detection System - A device and system to remotely detect vocalizations of speech. The skin located on the throat region of a speaking person or a reflective layer on the skin on the throat region vibrates in response to vocalizations of speech by the person. The vibrating skin or reflective layer is reflective of impinging radiation. A laser Doppler vibrometer transmits radiation onto the vibrating skin or the covering reflective layer and receives reflected radiation from the vibrating skin or reflective layer. The laser Doppler vibrometer generates voltage output signals that are representative of the speech causing the vibrations. A target tracker directs the impinging radiation and detects the reflected radiation to pass between the throat region and the laser Doppler vibrometer and includes a processor that removes non-speech signal artifacts from the voltage output signals. An interconnected audio speaker reproduces the speech from the voltage output signals. | 12-25-2008 |
| 20090299197 | Remote Blood Pressure Waveform Sensing Method and Apparatus - The invention as disclosed is a non-contact method and apparatus for continuously monitoring a physiological event in a human or animal, such as blood pressure, which involves utilizing a laser-based interferometer system in combination with a laser tracking system and a signal processor to produce a waveform that is representative of a continuous physiological event such as blood pressure or respiration in a subject. | 12-03-2009 |
| 20110235040 | Outboard Optical Cable Sensor System and Method - A plurality of optical sensors are mounted to a housing made of optically conductive material. The housing seals the optical sensors from a water-filled tube which extends through said housing. The optically conductive material provides optical coupling with the water-filled cable tube whereby a plurality of light beams are directed through the housing and the water-filled tube in a predetermined pattern, which provides certainty of the absence or presence of a cable within the water-filled cable tube for a minimum cable diameter regardless of the orientation of the cable within the water-filled tube. | 09-29-2011 |
Michelle Antonelli, Barrington, IL US
| Patent application number | Description | Published |
|---|---|---|
| 20100071027 | METHOD OF PROVIDING A MIXED GROUP COMMUNICATION SESSION - A method of providing a mixed group communication session for a mixed group containing protected users and a guest user is provided. The method uses a secure server to assign temporary Identities (IDs) to the protected users. The secure server forms a mixed group session containing desired participants from among the protected users and the guest user. The secure server provides limited group rights to the guest user in the mixed group session. During the mixed group session, the secure server uses the permanent IDs of the protected users towards other protected users and temporary IDs of the permanent users towards the guest user. Also provided is a method for providing a mixed group communication session for a mixed group containing protected users and a guest user, wherein temporary IDs are assigned to protected users and the guest user. | 03-18-2010 |
Michelle M. Antonelli, Barrington, IL US
| Patent application number | Description | Published |
|---|---|---|
| 20090312045 | DYNAMIC GROUP PRIORITIZATION IN COMMUNICATION NETWORKS - An apparatus and method for dynamic group prioritization in a communication network includes a first step ( | 12-17-2009 |
| 20110065415 | FACILITATING INTEROPERABILITY AMONG COMMUNICATION SYSTEMS VIA INTER- AND INTRA-AGENCY COMMUNICATIONS USING A SHARED NETWORK - Providing contact information via a directory service comprises a request being received from an originator to obtain at least a portion of contact information associated with a target. A first policy associated with the originator is identified, and a second policy that is associated with the target is identified. Based on at least one of the policies, it is determined whether a portion of the contact information associated with the target is authorized to be presented to the originator. If authorized, the portion of the contact information is presented to the originator. Upon receiving a request from the originator to establish communication with the target, it is determined whether a portion of contact information associated with the originator is authorized to presented to the target based on at least one of the policies. If authorized, the portion of the contact information associated with the originator is presented to the target. | 03-17-2011 |
| 20110150219 | SYSTEM AND METHOD OF INCREASING ENCRYPTION SYNCHRONIZATION AVAILABILITY - Methods for increasing encryption synchronization availability include collecting encryption synchronization data from a first superframe received at a gateway. The encryption synchronization data is for decrypting media in a second superframe also received at the gateway. The encryption synchronization data from the first superframe is used to form a composite encryption synchronization codeword for decrypting media in a third superframe formed by the gateway, wherein the third superframe includes the composite encryption synchronization codeword and at least a portion of the media from the second superframe. The third superframe is sent to a receiving device so that media in the third superframe can be decrypted by the receiving device using the composite encryption synchronization codeword that is included in the same superframe as the media that is being decrypted. | 06-23-2011 |
Nicholas Antonelli, Bethel, CT US
| Patent application number | Description | Published |
|---|---|---|
| 20090160121 | CAM DRIVEN INSERT GRIPPER - An apparatus includes a frame, a rotatable first shaft, wherein the first shaft includes a first cam, a rotatable second shaft, an item gripper connected to the second shaft by a connection including a link and an offset shaft rotatably connected to the link, and a linkage. The link is adapted to rotate with the second shaft for pivoting the offset shaft about the second shaft. The item gripper includes jaws adapted to open and close when the offset shaft is axially rotated relative to the link. The linkage connects the first cam on the first shaft to a rider on the offset shaft. The linkage includes a second having a stepped surface for a stepped movement of the rider along the stepped surface to open the jaws during a predetermined angular movement of the offset shaft about the center axis of the second shaft. | 06-25-2009 |
Nicola A. Antonelli, Seven Hills, OH US
| Patent application number | Description | Published |
|---|---|---|
| 20100257702 | BAND CLAMP - A band clamp includes an elongated band having a base portion which in cross section extends in a plane and first and second side portions. The first and second side portions of the band protrude away from the plane. A first housing is attached to the band and a second housing is attached to the band in a spaced manner from the first housing. A fastener is attached to one of the first and second housings in an adjustable manner. The fastener selectively engages with another of the first and second housings in a quick connect manner, such that the first and second housings can be brought closer to each other for tensioning the clamp around an associated object. | 10-14-2010 |
Patrick J. Antonelli, Gainesville, FL US
| Patent application number | Description | Published |
|---|---|---|
| 20110046731 | METHOD AND APPARATUS FOR IN-SITU ADJUSTABILITY OF A MIDDLE EAR PROSTHESIS - Embodiments of the present invention provide a middle ear prosthesis that can be adjusted in situ. Embodiments of the invention also relate to a method for adjusting a middle ear prosthesis in situ. In specific embodiments, the middle ear prosthesis can be inserted into the middle ear of a patient during surgery and then, after the surgery, the length of, or distance between the end resting on the malleus and the end resting on the stapes, can be adjusted without the need to touch the prosthesis through a surgical intervention. A middle ear prosthesis can include a first element | 02-24-2011 |
Stephen Antonelli, Lynn, MA US
| Patent application number | Description | Published |
|---|---|---|
| 20080287663 | Process For Production Of 4-Biphenylyazetidin-2-Ones - The present invention relates to processes for the production of 4-biphenylylazetidin-2-one derivatives of formula | 11-20-2008 |
| 20090099355 | Processes for Production of 4-(Biphenylyl)Azetidin-2-One Phosphonic Acids - The present invention relates to processes for the production of 4-(biphenylyl)azetidin-2-one phosphonic acid derivatives of formula | 04-16-2009 |
| 20090131395 | BIPHENYLAZETIDINONE CHOLESTEROL ABSORPTION INHIBITORS - The invention relates to a chemical genus of 4-biphenyl-1-phenylazetidin-2-ones useful in the treatment of hypercholesterolemia and other disorders. The compounds have the general formula I: | 05-21-2009 |