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Andricacos

Caliopi Andricacos, Chicago, IL US

Patent application numberDescriptionPublished
20100051474METHOD AND COMPOSITION FOR ELECTRO-CHEMICAL-MECHANICAL POLISHING - Methods and compositions for electro-chemical-mechanical polishing (e-CMP) of silicon chip interconnect materials, such as copper, are provided. The methods include the use of compositions according to the invention in combination with pads having various configurations.03-04-2010

Panayotis Andricacos, Croton-On-Hudson, NY US

Patent application numberDescriptionPublished
20080237053STRUCTURE COMPRISING A BARRIER LAYER OF A TUNGSTEN ALLOY COMPRISING COBALT AND/OR NICKEL - An interconnection structure comprising a substrate having a dielectric layer with a via opening therein; wherein the opening has an underlayer of cobalt and/or nickel therein, barrier layer of an alloy of cobalt and/or nickel; and tungsten is provided.10-02-2008

Patent applications by Panayotis Andricacos, Croton-On-Hudson, NY US

Panayotis C. Andricacos, Croton-On-Hudson, NY US

Patent application numberDescriptionPublished
20100047990METHOD OF FABRICATING A HIGH Q FACTOR INTEGRATED CIRCUIT INDUCTOR - A method of forming an inductor. The method including: (a) forming a dielectric layer on a top surface of a substrate; after (a), (b) forming a lower trench in the dielectric layer; after (b), (c) forming a resist layer on a top surface of the dielectric layer; after (c), (d) forming an upper trench in the resist layer, the upper trench aligned to the lower trench, a bottom of the upper trench open to the lower trench; and after (d), (e) completely filling the lower trench and at least partially filling the upper trench with a conductor in order to form the inductor.02-25-2010
20100051474METHOD AND COMPOSITION FOR ELECTRO-CHEMICAL-MECHANICAL POLISHING - Methods and compositions for electro-chemical-mechanical polishing (e-CMP) of silicon chip interconnect materials, such as copper, are provided. The methods include the use of compositions according to the invention in combination with pads having various configurations.03-04-2010

Patent applications by Panayotis C. Andricacos, Croton-On-Hudson, NY US