| Patent application number | Description | Published |
|---|
| 20090165953 | Plasma Reactor - A plasma reactor ( | 07-02-2009 |
| 20090301298 | Apparatus for Treating a Gas Stream - Apparatus for treating a gas stream comprises a plasma abatement device ( | 12-10-2009 |
| 20100006227 | Microwave Plasma Reactor - A microwave plasma reactor ( | 01-14-2010 |
| 20100024654 | Trap device - A trap device comprises means for separating a liquid compound from a waste stream exhaust from a process chamber, means for collecting the liquid compound separated from the waste stream, means for selectively isolating the collected liquid compound from the waste stream, and means for evaporating the collected liquid compound to return the compound in gaseous form to the waste stream. This can enable a volatile liquid to be collected at a defined location, isolated from the waste stream, and, when so desired, returned to the waste stream in the form of a gas for subsequent abatement. | 02-04-2010 |
| 20100038230 | Microwave Plasma Abatement Apparatus - In a method of operating a microwave plasma abatement apparatus comprising a microwave generator, and a gas chamber for receiving microwave energy from the microwave generator and within which a plasma is generated using the microwave energy, the amount of microwave energy that is not absorbed within the gas chamber is monitored, and the power of the microwave energy generated by the microwave generator is adjusted in dependence on the monitored microwave energy. | 02-18-2010 |
| 20100143221 | COMBUSTIVE DESTRUCTION OF NOXIOUS SUBSTANCES - Apparatus for the combustive destruction of noxious substances comprises an annular combustion zone (C | 06-10-2010 |
| 20100269753 | METHOD AND APPARATUS FOR TREATING A GAS STREAM - Apparatus is described for treating a gas stream. The apparatus comprises a gas passage ( | 10-28-2010 |
| 20100290966 | METHOD AND APPARATUS FOR THE REMOVAL OF FLUORINE FROM A GAS STREAM - A method for the removal of a fluorinated gas from a gas stream ( | 11-18-2010 |
| 20100303676 | APPARATUS FOR TREATING GAS - Apparatus for treating gas comprises a casing ( | 12-02-2010 |
| 20110017140 | METHOD OF TREATING A GAS STREAM - A method is described of treating a gas stream exhausted from an atomic layer deposition (ALD) process chamber to which two or more gaseous precursors are alternately supplied. Between the process chamber and a vacuum pump used to draw the gas stream from the chamber, the gas stream is conveyed to a gas mixing chamber, to which a reactant is supplied for reacting with one of the gaseous precursors to form solid material. The gas stream is then conveyed to a cyclone separator to separate solid material from the gas stream. By deliberately reacting a non-reacted precursor to form solid material upstream from the pump, reaction within the pump of the non-reacted precursor and a second non-reacted precursor subsequently drawn from the chamber by the pump can be inhibited. | 01-27-2011 |
| 20110120184 | PURIFICATION OF A GAS STREAM - At least one gaseous impurity, for example silane, is removed by absorption from a feed gas stream, for example a gas stream comprising nitrogen and hydrogen, the gaseous impurity being less volatile than the feed gas stream. The absorption is effected by a sub-cooled absorbent at a first cryogenic temperature and a first pressure. The absorbent is typically propane. The absorption may be conducted in a liquid-vapour contact column ( | 05-26-2011 |
