Andes
Cecily Andes, Marlborough, MA US
Patent application number | Description | Published |
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20160103393 | PHOTORESIST COMPOSITIONS AND METHODS OF FORMING PHOTOLITHOGRAPHIC PATTERNS - Provided are photoresist compositions useful in forming photolithographic patterns by a negative tone development process. Also provided are methods of forming photolithographic patterns by a negative tone development process and substrates coated with the photoresist compositions. The photoresist compositions include one or more polymer additive that contains a basic moiety and which is substantially non-miscible with a resin component of the resist. The compositions, methods and coated substrates find particular applicability in the manufacture of semiconductor devices. | 04-14-2016 |
Cecily Andes, Watertown, MA US
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20130115559 | METHODS OF FORMING PHOTOLITHOGRAPHIC PATTERNS BY NEGATIVE TONE DEVELOPMENT - Provided are methods of forming photolithographic patterns by negative tone development. The methods employ a photoresist composition that includes a polymer having a unit of the following general formula (I): | 05-09-2013 |
20130302735 | MONOMERS, POLYMERS AND PHOTORESIST COMPOSITIONS - Provided are monomers, polymers, photoresist compositions and coated substrates which find use in the formation of photolithographic patterns by negative tone development. The monomers are of the following general formula (I): | 11-14-2013 |
20140038102 | PHOTORESIST COMPOSITIONS AND METHODS OF FORMING PHOTOLITHOGRAPHIC PATTERNS - Provided are photoresist compositions useful in forming photolithographic patterns by a negative tone development process. Also provided are methods of forming photolithographic patterns by a negative tone development process and substrates coated with the photoresist compositions. The photoresist compositions include one or more polymer additive that contains a basic moiety and which is substantially non-miscible with a resin component of the resist. The compositions, methods and coated substrates find particular applicability in the manufacture of semiconductor devices. | 02-06-2014 |
Cecily Andes, Newton, MA US
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20140186770 | DENDRITIC COMPOUNDS, PHOTORESIST COMPOSITIONS AND METHODS OF MAKING ELECTRONIC DEVICES - Dendritic compounds are provided. The dendritic compounds include an anionic dendron that has a focal point having an anionic group and a linking group, and a photoreactive cation. The dendritic compounds find particular use as photoacid generators. Also provided are photoresist compositions that include such a dendritic compound, as well as methods of forming electronic devices with the photoresist compositions. The dendritic compounds, photoresist compositions and methods find particular applicability in the manufacture of semiconductor devices. | 07-03-2014 |
20150185607 | PHOTORESIST OVERCOAT COMPOSITIONS - Photoresist overcoat compositions comprise: a quenching polymer wherein the quenching polymer comprises: a first unit having a basic moiety; and a second unit formed from a monomer of the following general formula (I): | 07-02-2015 |
20150185615 | PHOTOLITHOGRAPHIC METHODS - Methods of forming an electronic device, comprising in sequence: (a) providing a semiconductor substrate comprising one or more layers to be patterned; (b) forming a photoresist layer over the one or more layers to be patterned, wherein the photoresist layer is formed from a composition that comprises: a matrix polymer comprising a unit having an acid labile group; a photoacid generator; and an organic solvent; (c) coating a photoresist overcoat composition over the photoresist layer, wherein the overcoat composition comprises a quenching polymer and an organic solvent, wherein the quenching polymer comprises a unit having a basic moiety effective to neutralize acid generated by the photoacid generator in a surface region of photoresist layer; (d) exposing the photoresist layer to activating radiation; (e) heating the substrate in a post-exposure bake process; and (f) developing the exposed film with an organic solvent developer. The methods have particular applicability in the semiconductor manufacturing industry. | 07-02-2015 |
David Andes, Madison, WI US
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20140364385 | FORAZOLINES, COMPOSITIONS THEREOF AND USES THEREOF - An isolated compound of Formula I and salts thereof are provided: | 12-11-2014 |
20150050284 | ANTIBODY BINDING MICROBIAL HEPARIN BINDING MOTIF TO RETARD OR PREVENT MICROBIAL BIOFILM FORMATION ON IMPLANTED MEDICAL DEVICES - Methods and reagents for ameliorating biofilm formation on a surface of an indwelling or implanted device in a patient resulting in decreased virulence of microorganisms such as | 02-19-2015 |
Ian Edward Andes, Los Angeles, CA US
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20130214998 | Head-Mounted Peripheral Vision Display Systems And Methods - A head-mounted peripheral vision display and associated methods display information to a user without distraction. A plurality of light display elements are positioned within an area of peripheral vision of at least one eye of the user such that the information is imparted to the user without a need for repositioning or refocusing of the eye. The information may be determined from data received from one or more sensors and an illumination pattern is determined based upon the performance information. The light display elements are controlled to display the illumination pattern to the user. | 08-22-2013 |
Jonathan M. Andes, Seattle, WA US
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20140380058 | Process Authentication and Resource Permissions - The techniques and systems described herein present various implementations of a model for authenticating processes for execution and specifying and enforcing permission restrictions on system resources for processes and users. In some implementations, a binary file for an application, program, or process may be augmented to include a digital signature encrypted with a key such that an operating system may subsequently authenticate the digital signature. Once the binary file has been authenticated, the operating system may create a process and tag the process with metadata indicating the type of permissions that are allowed for the process. The metadata may correspond to a particular access level for specifying resource permissions. | 12-25-2014 |
Keith Andes, Apex, NC US
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20110077345 | PRESSURE SENSITIVE ADHESIVE COMPOSITIONS AND METHOD OF MAKING THE SAME - The instant invention is a pressure sensitive adhesive composition comprising an ultra-high solid polyurethane dispersion. The ultra-high solid polyurethane dispersion comprises (1) a first component comprising a first polyurethane prepolymer comprising the reaction product of a polyol and polyisocyanate, (2) a second component comprising a media phase selected from the group consisting of a second polyurethane prepolymer emulsion, a low solid content polyurethane dispersion, a seed latex, and combinations thereof; and (3) optionally a chain extender. The ultra-high solid polyurethane dispersion has at least a solid content of at least 60 percent by weight of solid content, based on the total weight of the ultra-high solid polyurethane dispersion, and a viscosity of less than 5000 cps at 20 rpm at 21° C. using spindle #4 with Brookfield viscometer. | 03-31-2011 |
Keith J. Andes, Apex, NC US
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20150094415 | PRESSURE SENSITIVE ADHESIVE COMPOSITIONS AND METHOD OF MAKING THE SAME - The instant invention is a pressure sensitive adhesive composition comprising an ultra-high solid polyurethane dispersion. The ultra-high solid polyurethane dispersion comprises (1) a first component comprising a first polyurethane prepolymer comprising the reaction product of a polyol and polyisocyanate, (2) a second component comprising a media phase selected from the group consisting of a second polyurethane prepolymer emulsion, a low solid content polyurethane dispersion, a seed latex, and combinations thereof; and (3) optionally a chain extender. The ultra-high solid polyurethane dispersion has at least a solid content of at least 60 percent by weight of solid content, based on the total weight of the ultra-high solid polyurethane dispersion, and a viscosity of less than 5000 cps at 20 rpm at 21° C. using spindle #4 with Brookfield viscometer. | 04-02-2015 |
Stephanie Andes, Hanau DE
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20130164356 | EFFECT PIGMENTS - The present invention relates to effect pigments which are based on flake-form substrates having a circular form factor of 1.2-2 and are coated with at least one high-refractive-index layer, and to the use thereof, inter alia in paints, coatings, printing inks, plastics and in cosmetic formulations. | 06-27-2013 |
20160068683 | EFFECT PIGMENTS - The present invention relates to effect pigments which are based on flake-form substrates having a circular form factor of 1.2-2 and are coated with at least one high-refractive-index layer, and to the use thereof, inter alia in paints, coatings, printing inks, plastics and in cosmetic formulations. | 03-10-2016 |