Almanza-Workman
A. Marcia Almanza-Workman, Sunnyvale, CA US
Patent application number | Description | Published |
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20080248405 | LIQUID TONER-BASED PATTERN MASK METHOD AND SYSTEM - A liquid toner-based pattern mask system and methods of masking and patterning a substrate employ a polymer-based liquid toner as a pattern mask. The liquid toner is deposited on the substrate in a masking pattern. The pattern mask is lifted off of the substrate after patterning the substrate using a lift-off technique that breaks a bond between the surface of the substrate and the pattern mask. | 10-09-2008 |
Angeles Marcia Almanza-Workman, Sunnyvale, CA US
Patent application number | Description | Published |
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20100078640 | Thin Film Transistor Backplane - A fabrication process for a device such as a backplane for a flat panel display includes depositing thin film layers on a substrate, forming a 3D template overlying the thin film layers, and etching the 3D template and the thin film layers to form gate lines and transistors from the thin film layers. An insulating or passivation layer can then be deposited on the gate lines and the transistors, so that column or data lines can be formed on the insulating layer. | 04-01-2010 |
20110309365 | THIN FILM TRANSISTOR BACKPLANE - A fabrication process for a device such as a backplane for a flat panel display includes depositing thin film layers on a substrate, forming a 3D template overlying the thin film layers, and etching the 3D template and the thin film layers to form gate lines and transistors from the thin film layers. An insulating or passivation layer can then be deposited on the gate lines and the transistors, so that column or data lines can be formed on the insulating layer. | 12-22-2011 |
Angeles Marcia Almanza-Workman, Palo Alto, CA US
Patent application number | Description | Published |
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20080229950 | SEAMLESS IMPRINT ROLLER AND METHOD OF MAKING - This invention provides a structure and method of forming a seamless imprint roller. The method includes providing a translucent cylindrical core. At least one uniform seamless layer of material is deposited about the cylindrical core. This uniform seamless layer of material is then processed to define a translucent three dimensional imprint pattern seamlessly disposed about the core. The pattern includes at least one structure extending from the core and having one or more elevations. The pattern and more specifically the structures are inherently aligned to one another and the cylindrical core. | 09-25-2008 |
Marcia Almanza-Workman, Palo Alto, CA US
Patent application number | Description | Published |
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20160111328 | MULTILEVEL MASK CIRCUIT FABRICATION AND MULTILAYER CIRCUIT - Circuit fabrication uses a multilevel mask to pattern a first conductor layer of a multilayer circuit. The first conductor patterning is to provide electrical isolation between the first conductor layer and a second conductor layer that one of overlies the multilevel mask and underlies the multilevel mask. With the second conductor layer overlying the multilevel mask, the electrical isolation is provided by undercutting the multilevel mask. Alternatively, with the second conductor underlying the multilevel mask, the first conductor includes a bridged gapped conductor and the electrical isolation may be provided by both the bridged gapped conductor and an insulating layer between the second conductor layer and the first conductor layer. | 04-21-2016 |