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Allott
David I. Allott, Sterling Hts, MI US
| Patent application number | Description | Published |
|---|---|---|
| 20110037292 | Automotive Front Support Beam, Front Carrier, And A Method Of Assembly - An automotive front support beam for use in an automotive front carrier, wherein the automotive front support beam comprises a top piece and a bottom piece, wherein the top piece and the bottom piece are fastened together and enclose a hollow space and wherein the top piece and the bottom piece are molded. | 02-17-2011 |
Mark T. Allott, Mapleton, IL US
| Patent application number | Description | Published |
|---|---|---|
| 20090101595 | Canister Filter System With Drain That Cooperates With Filter Element - A canister filter system includes a base, a canister attachable to the base, and positioned inside the canister a filter element having filter media. A drain engages and forms a seal with the filter element in a closed position. In an open position, the drain allows fluid to be removed from the canister. Because the drain is engaged to and forms a seal with the filter element in the closed position, the drain cannot be closed unless a filter element is present inside the canister. This prevents accidental or intentional use of the filter system without a filter element in place. | 04-23-2009 |
| 20110073537 | Canister Filter System With Drain That Cooperates With Filter Element - A filter element disclosed herein includes a center tube defining a central reservoir and including an interior sidewall. The filter element further includes an end plate and a pocket defining a port extending from the end plate into the central reservoir. The pocket includes an inner wall, an outer wall, and a plurality of projections extending from the outer wall of the pocket toward the interior sidewall of the center tube. | 03-31-2011 |
| 20120000056 | CANISTER FILTER SYSTEM WITH DRAIN THAT COOPERATES WITH FILTER ELEMENT - A filter assembly with a replaceable filter element and a reusable filter housing, which incorporates a locking mechanism to ensure that the filter system will not be operated without a filter element installed. | 01-05-2012 |
| 20120000841 | CANISTER FILTER SYSTEM WITH DRAIN THAT COOPERATES WITH FILTER ELEMENT - A filter assembly with a replaceable filter element and a reusable filter housing, which incorporates a locking mechanism to ensure that the filter system will not be operated without a filter element installed. | 01-05-2012 |
| 20120055454 | Fuel Cap Breather Apparatus - An improved breather apparatus for use on fuel tanks is disclosed. The breather apparatus may include a mounting base including a valve seat and at least one venting cavity, a valve mounted on the valve seat, and a cover operatively associated with the mounting base. The cover may include at least one venting cavity connected to the venting cavity of the mounting base. The breather apparatus may also include an air filter operatively connected to the valve. Methods of assembling and using the disclosed breather apparatus are also disclosed. | 03-08-2012 |
Mark Taylor Allott, Mapleton, IL US
| Patent application number | Description | Published |
|---|---|---|
| 20090199794 | Crankcase ventilation system - A ventilation system for use with an internal combustion engine having a crankcase is disclosed. The ventilation system may have a breather housing connected to ventilate gases from the crankcase, and a filtration canister fluidly connected downstream of the breather housing. The filtration canister may have a filter housing, a filtering medium located within the filter housing to collect oil from the gases, and an oil collection container disposed within the filter housing and being configured to receive at least a portion of the filtering medium. The oil collection container may have a drain port in fluid communication with the crankcase. The filtration canister may also have at least one port configured to discharge the gases from the housing after the gases have passed through the filtering medium. | 08-13-2009 |
Richard Allott, Tilbrook GB
| Patent application number | Description | Published |
|---|---|---|
| 20100015397 | METHOD AND TOOL FOR PATTERNING THIN FILMS ON MOVING SUBSTRATES - A method for forming a regularly repeating pattern in a thin film on a substrate by ablating it directly with radiation form a pulsed laser beam characterised in that the radiation beam is caused to pass through a suitable mask delineating the pattern, the image of the mask pattern being de-magnified onto the surface of the film by a suitable projection lens so that the energy density at the film is sufficiently high so as to cause the film to be removed directly by ablation, the imprinting steps being carried out: in a repetitive series of discrete laser ablation steps using a mask that is stationary with respect to the projection lens and represents only a small area of the total area of the substrate and using a single short pulse of radiation at each step to illuminate the mask, the radiation pulse having such an energy density at the substrate that it is above the threshold value for ablation of the film; and the series of discrete laser ablation steps being repeated over the full area of the surface of a substrate, to give a full pattern comprising a plurality of pixels, by moving the laser beam or substrate in a direction parallel to one axis of the pattern to be formed on the substrate and activating the pulsed laser mask illumination light source at the instant that the substrate or beam has moved over a distance equivalent to a complete number of periods of the repeating pattern on the substrate. | 01-21-2010 |
Richard Allott, Oxford GB
| Patent application number | Description | Published |
|---|---|---|
| 20090098479 | EXPOSURE METHOD AND TOOL - A method for forming a regularly repeating pattern on to a substrate comprising the steps of: applying a resist on a surface of a substrate to be processed; imprinting on the applied resist a pattern formed by exposing it to a beam of ultra violet (‘UV’) light, which has been caused to pass through a suitable mask delineating the pattern and then trough a focusing lens on to the resist, so as to cause chemical changes in the resist which makes it more or less soluble in a suitable developer solution; the imprinting step being carried out: in a repetitive series of discrete exposure steps using a mask held stationery with respect to the beam and the lens that represents only a small area of the total area of the substrate and using a single short pulse of UV radiation at each step to illuminate the mask, the radiation pulse having such an energy density at the substrate that it is below the threshold value for ablation of the resist; and the series of discrete exposure steps being repeated over the full area of the surface of a substrate, to give a full structure comprising a plurality of pixels, by moving the substrate in a direction parallel to one axis of the structure to be formed on the substrate and activating the pulsed mask illumination light source at the instant that the substrate has moved over a distance equivalent to a complete number of periods of the repeating pattern on the substrate; treating the exposed resist with a developer to cause either exposed regions (for positive resists) or unexposed regions (for negative resists) to be dissolved and subsequently washed away by the developer solution to reveal the pattern formed by the remaining resist; treating the substrate with a suitable chemical etching solution, reactive plasma or abrasive particles that removes the substrate in resist free areas; and removing remaining resist from the substrate with a suitable solvent to leave a finished patterned substrate. | 04-16-2009 |
Stephen Allott, Scotts Valley, CA US
| Patent application number | Description | Published |
|---|---|---|
| 20120062285 | DISCRETE TIME POLYPHASE MIXER - Embodiments of a radio frequency (RF) circuit provide translational filtering in accordance with an input impedance response that is an impedance image of a reactive circuit impedance response from a polyphase reactive circuit. The RF circuit may include a first mixer circuit that provides a first frequency offset for the impedance image and a second mixer circuit that provides an additional frequency offset. Accordingly, the second mixer circuit may allow for adjustments to a total frequency offset of the impedance image. The second mixer circuit may also be configured so that the impedance image rejects a negative frequency impedance response of the reactive circuit impedance response. | 03-15-2012 |