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Allen, San Jose
Corville O. Allen, San Jose, CA US
| Patent application number | Description | Published |
|---|---|---|
| 20100146347 | SYSTEM AND METHOD FOR FAULT MAPPING OF EXCEPTIONS ACROSS PROGRAMMING MODELS - A system and method for mapping exceptions from a first programming model to a second programming model. The system comprises a first device operating a first programming model and a second device operating a second programming model. The first device sends an instruction to, or invokes the second device to execute an instruction. As a result, a fault occurs during execution of the instruction in the second programming model. An exception based on the fault is raised, and returned to the first device. A fault mapping module receives the exception from the first device. The fault mapping module attempts to determine the type of exception received by comparing an identifier with predetermined identifiers indicating exception type. The fault mapping module interprets the exception to generate an interpreted exception recognizable by the first programming model if the exception is determined to be of a predetermined type. | 06-10-2010 |
Ricardo Allen, San Jose CR
| Patent application number | Description | Published |
|---|---|---|
| 20090172298 | CACHED DIRTY BITS FOR CONTEXT SWITCH CONSISTENCY CHECKS - Embodiments of an invention using cached dirty bits for context switch consistency checks are disclosed. In one embodiment, a processor includes control logic and a cache. The control logic is to cause a consistency check to be performed on a subset of a plurality of state components during a first context switch. The cache is to store a dirty entry for each state component to indicate whether the corresponding state component is included in the subset. | 07-02-2009 |
Robert David Allen, San Jose, CA US
| Patent application number | Description | Published |
|---|---|---|
| 20080227028 | PHOTORESIST TOPCOAT FOR A PHOTOLITHOGRAPHIC PROCESS - A composition that includes functionalized polyhedral oligomeric silsesquioxanes derivatives of the formulas T | 09-18-2008 |
| 20080233517 | Negative Resists Based on Acid-Catalyzed Elimination of Polar Molecules - The present invention provides polymers that are useful in negative resist compositions. Polymers of the present invention comprise (1) a first monomer having a polar functional group; (2) a second monomer; and optionally, (3) a third monomer that imparts at least one characteristic selected from crosslinkable functionality, etch resistance, and solubility modulation. The first monomer provides an acid catalyzed polarity switch upon elimination of the polar functional group, whereas, the second monomer provides aqueous dissolution. The polymers of the present invention may be incorporated into negative resist compositions, which may also include photoacid generators, crosslinking agents, basic compounds, solvents, dissolution accelerators, photobase generators, latent basic compounds, surfactants, adhesion promoters, and anti-foaming agents. | 09-25-2008 |
| 20090011377 | PHOTORESIST TOPCOAT FOR A PHOTOLITHOGRAPHIC PROCESS - A method of forming an image using a topcoat composition. A composition that includes functionalized polyhedral oligomeric silsesquioxanes derivatives of the formulas T | 01-08-2009 |
| 20100216899 | POLYAMIDE MEMBRANES WITH FLUOROALCOHOL FUNCTIONALITY - A polymeric membrane includes an active layer on a support. The active layer includes a polymer with a backbone, and the backbone has attached thereto at least one fluoroalcohol moiety. | 08-26-2010 |
| 20100216967 | INTERFACIAL POLYMERIZATION METHODS FOR MAKING FLUOROALCOHOL-CONTAINING POLYAMIDES - A method including reacting a chemical mixture (A) and a chemical mixture (B) to form a polymeric compound, wherein where (A) and (B) are immiscible with each other, and wherein: | 08-26-2010 |
| 20110008727 | Low Activation Energy Photoresist Composition and Process for Its Use - The present invention relates to a radiation sensitive photoresist composition. The composition comprises a polymer comprising at least two monomers. The first monomer has an acid cleavable tertiary ester group. The second monomer is an acidic monomer. The acid cleavable ester group of the polymer has a surprisingly low activation energy which results in improved resist images in lithographic processes. | 01-13-2011 |
| 20110048787 | PHOTO-PATTERNABLE DIELECTRIC MATERIALS AND FORMULATIONS AND METHODS OF USE - Silsesquioxane polymers, silsesquioxane polymers in negative tone photo-patternable dielectric formulations, methods of forming structures using negative tone photo-patternable dielectric formulations containing silsesquioxane polymers, and structures made from silsesquioxane polymers. | 03-03-2011 |
| 20110120940 | POLYMERIC FILMS MADE FROM POLYHEDRAL OLIGOMERIC SILSESQUIOXANE (POSS) AND A HYDROPHILIC COMONOMER - A composite membrane includes a filtration membrane and a layer on a surface of the filtration membrane. The layer includes a polymer including a polyhedral oligomeric silsesquioxane (POSS) derivative with a hydrophilic moiety attached to at least one vertex thereof. A method for making a composite membrane includes applying to a surface of a filtration membrane a photopolymerizable composition including a POSS compound, a hydrophilic comonomer, and a photoinitiator. The composition is cured to form a hydrophilic layer on the filtration membrane. | 05-26-2011 |
| 20110120941 | COMPOSITE MEMBRANES WITH PERFORMANCE ENHANCING LAYERS - A composite membrane includes a filtration membrane with a surface; and a layer on the surface of the filtration membrane. The layer includes a polymer including a poly(ethylene glycol) moiety cross-linked with an ammonium salt or a precursor of an ammonium salt | 05-26-2011 |
Ronald L. Allen, San Jose, CA US
| Patent application number | Description | Published |
|---|---|---|
| 20080207089 | METHODS AND SYSTEMS FOR MONITORING A PARAMETER OF A MEASUREMENT DEVICE DURING POLISHING, DAMAGE TO A SPECIMEN DURING POLISHING, OR A CHARACTERISTIC OF A POLISHING PAD OR TOOL - Methods and systems for monitoring a parameter of a measurement device during polishing, damage to a specimen during polishing, a characteristic of a polishing pad, or a characteristic of a polishing tool are provided. One method includes scanning a specimen with a measurement device during polishing of a specimen to generate output signals at measurement spots on the specimen. The method also includes determining if the output signals are outside of a range of output signals. Output signals outside of the range may indicate that a parameter of the measurement device is out of control limits. In a different embodiment, output signals outside of the range may indicate damage to the specimen. Another method includes scanning a polishing pad with a measurement device to generate output signals at measurement spots on the polishing pad. The method also includes determining a characteristic of the polishing pad from the output signals. | 08-28-2008 |
| 20080240613 | Digital Microscope Slide Scanning System and Methods - Provided herein are systems methods including a design of a microscope slide scanner for digital pathology applications which provides high quality images and automated batch-mode operation at low cost. The instrument architecture is advantageously based on a convergence of high performance, yet low cost, computing technologies, interfaces and software standards to enable high quality digital microscopy at very low cost. Also provided is a method based in part on a stitching method that allows for dividing an image into a number of overlapping tiles and reconstituting the image with a magnification without substantial loss of accuracy. A scanner is employed in capturing snapshot images. The method allows for overlapping images captured in consecutive snapshots. | 10-02-2008 |